DE68928200T2 - Muster-korrekturverfahren - Google Patents

Muster-korrekturverfahren

Info

Publication number
DE68928200T2
DE68928200T2 DE68928200T DE68928200T DE68928200T2 DE 68928200 T2 DE68928200 T2 DE 68928200T2 DE 68928200 T DE68928200 T DE 68928200T DE 68928200 T DE68928200 T DE 68928200T DE 68928200 T2 DE68928200 T2 DE 68928200T2
Authority
DE
Germany
Prior art keywords
correction process
sample correction
sample
correction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68928200T
Other languages
English (en)
Other versions
DE68928200D1 (de
Inventor
Tadahiro Furukawa
Toshiaki Kikuchi
Hitoshi Konno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyodo Printing Co Ltd
Original Assignee
Kyodo Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyodo Printing Co Ltd filed Critical Kyodo Printing Co Ltd
Application granted granted Critical
Publication of DE68928200D1 publication Critical patent/DE68928200D1/de
Publication of DE68928200T2 publication Critical patent/DE68928200T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
DE68928200T 1988-11-08 1989-10-11 Muster-korrekturverfahren Expired - Fee Related DE68928200T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP28208388 1988-11-08
PCT/JP1989/001041 WO1990005326A1 (en) 1988-11-08 1989-10-11 Pattern correction method

Publications (2)

Publication Number Publication Date
DE68928200D1 DE68928200D1 (de) 1997-09-04
DE68928200T2 true DE68928200T2 (de) 1997-11-13

Family

ID=17647904

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68928200T Expired - Fee Related DE68928200T2 (de) 1988-11-08 1989-10-11 Muster-korrekturverfahren

Country Status (7)

Country Link
EP (1) EP0396768B1 (de)
JP (1) JP2794199B2 (de)
KR (1) KR0149497B1 (de)
AU (1) AU612286B2 (de)
CA (1) CA2001910A1 (de)
DE (1) DE68928200T2 (de)
WO (1) WO1990005326A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08114711A (ja) * 1994-10-13 1996-05-07 Shinto Paint Co Ltd 平坦性が損なわれたカラーフィルターの修正方法、修正されたカラーフィルターおよびそのカラーフィルターを有する多色表示装置
JP4930740B2 (ja) * 2001-02-26 2012-05-16 大日本印刷株式会社 カラーフィルタの欠陥修正方法
JP4118082B2 (ja) * 2002-05-08 2008-07-16 株式会社きもと フォトマスク用保護膜修正方法
JP2006258873A (ja) * 2005-03-15 2006-09-28 Toppan Printing Co Ltd カラーフィルターの修正方法およびカラーフィルター
JP4617236B2 (ja) * 2005-10-03 2011-01-19 シャープ株式会社 カラーフィルターの修正方法
KR101536767B1 (ko) * 2014-05-29 2015-07-15 주식회사 루미스탈 반도체 기판의 표면 상에 존재하는 결함의 선택적 커버링 방법

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4200668A (en) * 1978-09-05 1980-04-29 Western Electric Company, Inc. Method of repairing a defective photomask
JPS61122605A (ja) * 1984-11-20 1986-06-10 Canon Inc カラ−フイルタ−の修復方法
JPS63313158A (ja) * 1987-06-16 1988-12-21 Nec Corp レチクルの修正方法

Also Published As

Publication number Publication date
EP0396768A4 (en) 1991-07-17
JP2794199B2 (ja) 1998-09-03
EP0396768B1 (de) 1997-07-23
KR900702562A (ko) 1990-12-07
JPH02262603A (ja) 1990-10-25
AU4349189A (en) 1990-05-28
WO1990005326A1 (en) 1990-05-17
KR0149497B1 (ko) 1998-12-01
CA2001910A1 (en) 1990-05-08
AU612286B2 (en) 1991-07-04
DE68928200D1 (de) 1997-09-04
EP0396768A1 (de) 1990-11-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee