KR900007434B1 - 패턴 검사 장치 - Google Patents

패턴 검사 장치 Download PDF

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Publication number
KR900007434B1
KR900007434B1 KR1019860002753A KR860002753A KR900007434B1 KR 900007434 B1 KR900007434 B1 KR 900007434B1 KR 1019860002753 A KR1019860002753 A KR 1019860002753A KR 860002753 A KR860002753 A KR 860002753A KR 900007434 B1 KR900007434 B1 KR 900007434B1
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KR
South Korea
Prior art keywords
signal
pattern
memory
memory means
cutting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
KR1019860002753A
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English (en)
Korean (ko)
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KR860008597A (ko
Inventor
도시미쯔 하마다
미네오 노모또
고소 나까하따
Original Assignee
가부시끼가이샤 히다찌세이사꾸쇼
미다 가쓰시게
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시끼가이샤 히다찌세이사꾸쇼, 미다 가쓰시게 filed Critical 가부시끼가이샤 히다찌세이사꾸쇼
Publication of KR860008597A publication Critical patent/KR860008597A/ko
Application granted granted Critical
Publication of KR900007434B1 publication Critical patent/KR900007434B1/ko
Expired legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/001—Industrial image inspection using an image reference approach
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/27—Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Quality & Reliability (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Image Processing (AREA)
  • Image Analysis (AREA)
  • Closed-Circuit Television Systems (AREA)
KR1019860002753A 1985-04-12 1986-04-11 패턴 검사 장치 Expired KR900007434B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP60076389A JP2602201B2 (ja) 1985-04-12 1985-04-12 被検査パターンの欠陥検査方法
JP76389 1985-04-12
JP60-76389 1985-04-12

Publications (2)

Publication Number Publication Date
KR860008597A KR860008597A (ko) 1986-11-17
KR900007434B1 true KR900007434B1 (ko) 1990-10-08

Family

ID=13603968

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019860002753A Expired KR900007434B1 (ko) 1985-04-12 1986-04-11 패턴 검사 장치

Country Status (4)

Country Link
US (1) US4776023A (https=)
JP (1) JP2602201B2 (https=)
KR (1) KR900007434B1 (https=)
DE (1) DE3612233A1 (https=)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5093797A (en) * 1987-01-13 1992-03-03 Omron Tateisi Electronics Co. Apparatus for inspecting packaged electronic device
US5001764A (en) * 1988-03-25 1991-03-19 Texas Instruments Incorporated Guardbands for pattern inspector
US4984282A (en) * 1988-03-25 1991-01-08 Texas Instruments Incorporated Parallel processing of reference and guardband data
US5046110A (en) * 1988-03-25 1991-09-03 Texas Instruments Incorporated Comparator error filtering for pattern inspector
US5073952A (en) * 1988-09-07 1991-12-17 Sigmax Kabushiki Kaisha Pattern recognition device
JPH02148180A (ja) * 1988-11-29 1990-06-07 Nippon Seiko Kk パターン検査方法及び装置
US5185812A (en) * 1990-02-14 1993-02-09 Kabushiki Kaisha Toshiba Optical pattern inspection system
GB9006803D0 (en) * 1990-03-27 1990-05-23 Thurne Eng Co Ltd Boundary recognition
US6320977B1 (en) * 1990-04-04 2001-11-20 Matsushita Electric Industrial Co., Ltd Method and apparatus for positional detection using pattern matching process
US5157762A (en) * 1990-04-10 1992-10-20 Gerber Systems Corporation Method and apparatus for providing a three state data base for use with automatic optical inspection systems
US5276459A (en) * 1990-04-27 1994-01-04 Canon Kabushiki Kaisha Recording apparatus for performing uniform density image recording utilizing plural types of recording heads
JP3040433B2 (ja) * 1990-06-11 2000-05-15 キヤノン株式会社 補正データ作成方法
US5365596A (en) * 1992-12-17 1994-11-15 Philip Morris Incorporated Methods and apparatus for automatic image inspection of continuously moving objects
US5867609A (en) * 1995-12-07 1999-02-02 Nec Research Institute, Inc. Method for computing correlation operations on partially occluded data
JPH09184715A (ja) * 1995-12-28 1997-07-15 Hitachi Ltd パターン形状検査装置
JPH09222312A (ja) * 1996-02-16 1997-08-26 Mitsui Mining & Smelting Co Ltd パターン検査装置および方法
US6266452B1 (en) 1999-03-18 2001-07-24 Nec Research Institute, Inc. Image registration method
US20050170056A1 (en) * 1999-04-08 2005-08-04 Weber Maschinenbau Gmbh & Co. Kg Method for the slicing of food products
US6707936B1 (en) * 1999-04-16 2004-03-16 Texas Instruments Incorporated Method and apparatus for predicting device yield from a semiconductor wafer
US7052483B2 (en) * 2000-12-19 2006-05-30 Animas Corporation Transcutaneous inserter for low-profile infusion sets
US6950547B2 (en) * 2001-02-12 2005-09-27 3M Innovative Properties Company Web inspection method and device
US6997089B2 (en) * 2002-06-25 2006-02-14 Formax, Inc. Optical grading system for slicer apparatus
US7483167B2 (en) * 2003-08-27 2009-01-27 Marvell International Ltd. Image forming apparatus for identifying undesirable toner placement
KR101203325B1 (ko) * 2003-12-31 2012-11-20 쓰리엠 이노베이티브 프로퍼티즈 컴파니 시트-기반 물품에 대한 재고품 제어
JP2007517232A (ja) * 2003-12-31 2007-06-28 スリーエム イノベイティブ プロパティズ カンパニー ウェブに基づく物品の歩留まりの最大化
US7623699B2 (en) 2004-04-19 2009-11-24 3M Innovative Properties Company Apparatus and method for the automated marking of defects on webs of material
DE102004036229A1 (de) * 2004-07-26 2006-02-16 Giesecke & Devrient Gmbh Verfahren für die Prüfung von Banknoten
US8265354B2 (en) * 2004-08-24 2012-09-11 Siemens Medical Solutions Usa, Inc. Feature-based composing for 3D MR angiography images
US7697169B2 (en) * 2004-10-29 2010-04-13 Marvell International Technology Ltd. Laser print apparatus with toner explosion compensation
US7443627B1 (en) 2006-03-07 2008-10-28 Marvell International Ltd. Lowest power mode for a mobile drive
US7542821B2 (en) * 2007-07-26 2009-06-02 3M Innovative Properties Company Multi-unit process spatial synchronization of image inspection systems
US20090028417A1 (en) * 2007-07-26 2009-01-29 3M Innovative Properties Company Fiducial marking for multi-unit process spatial synchronization
US8175739B2 (en) * 2007-07-26 2012-05-08 3M Innovative Properties Company Multi-unit process spatial synchronization
US7797133B2 (en) * 2008-09-10 2010-09-14 3M Innovative Properties Company Multi-roller registered repeat defect detection of a web process line
CN103091332B (zh) * 2013-01-16 2014-09-24 浙江科技学院 一种基于机器视觉的u型粉管的检测方法及其检测系统

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5637586B2 (https=) * 1973-07-02 1981-09-01
JPS5419366A (en) * 1977-07-14 1979-02-14 Nippon Jidoseigyo Ltd Device for inspecting fault of pattern
JPS5915381B2 (ja) * 1978-10-16 1984-04-09 日本電信電話株式会社 パタ−ン検査法
JPS5616160U (https=) * 1979-07-13 1981-02-12
JPS5924361A (ja) * 1982-07-29 1984-02-08 Sharp Corp 日付の表示方式
JPS5951536A (ja) * 1982-09-14 1984-03-26 Fujitsu Ltd パタ−ン認識方法及びその装置
GB2129546B (en) * 1982-11-02 1985-09-25 Cambridge Instr Ltd Image comparison
JPS59157505A (ja) * 1983-02-28 1984-09-06 Hitachi Ltd パタ−ン検査装置
JPS59158162U (ja) * 1983-04-09 1984-10-23 住友電気工業株式会社 加熱ロ−ラ
US4614430A (en) * 1983-04-28 1986-09-30 Hitachi Ltd. Method of detecting pattern defect and its apparatus
JPH061370B2 (ja) * 1983-11-24 1994-01-05 株式会社東芝 マスク欠陥検査装置
US4648053A (en) * 1984-10-30 1987-03-03 Kollmorgen Technologies, Corp. High speed optical inspection system
US4668982A (en) * 1985-06-17 1987-05-26 The Perkin-Elmer Corporation Misregistration/distortion correction scheme

Also Published As

Publication number Publication date
JP2602201B2 (ja) 1997-04-23
US4776023A (en) 1988-10-04
DE3612233A1 (de) 1986-10-16
DE3612233C2 (https=) 1988-09-22
KR860008597A (ko) 1986-11-17
JPS61236285A (ja) 1986-10-21

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