KR880011740A - 기록매체 및 그의 제조방법 - Google Patents

기록매체 및 그의 제조방법 Download PDF

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Publication number
KR880011740A
KR880011740A KR1019880002231A KR880002231A KR880011740A KR 880011740 A KR880011740 A KR 880011740A KR 1019880002231 A KR1019880002231 A KR 1019880002231A KR 880002231 A KR880002231 A KR 880002231A KR 880011740 A KR880011740 A KR 880011740A
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KR
South Korea
Prior art keywords
recording medium
recording
layer
recording layer
protective layer
Prior art date
Application number
KR1019880002231A
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English (en)
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KR920005000B1 (ko
Inventor
가즈후미 오가와
히데하루 다무라
Original Assignee
다니이 아끼오
마쯔시다덴기산교 가부시기가이샤
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Application filed by 다니이 아끼오, 마쯔시다덴기산교 가부시기가이샤 filed Critical 다니이 아끼오
Publication of KR880011740A publication Critical patent/KR880011740A/ko
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Publication of KR920005000B1 publication Critical patent/KR920005000B1/ko

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Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/72Protective coatings, e.g. anti-static or antifriction
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/18Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/185Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/64Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/72Protective coatings, e.g. anti-static or antifriction
    • G11B5/725Protective coatings, e.g. anti-static or antifriction containing a lubricant, e.g. organic compounds
    • G11B5/7253Fluorocarbon lubricant
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00Stock material or miscellaneous articles
    • Y10S428/90Magnetic feature

Abstract

내용 없음

Description

기록매체 및 그의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 제1실시예로서 자성 기록매체의 단면도.
제2도는 제1실시예의 기록 매체를 제조하는 방법을 도시한다.
제3도는 제2실시예로서 기록매체의 단면도.

Claims (9)

  1. 상기 기록매체의 기체와 ; 상기 기체에 형성된 산소원자를 함유한 적어도 하나의 기록층과 ; 상기 기록층을 보호하기 위한 상기 기록층위에 형성된 적어도 하나의 보호층으로 구성되는 것을 특징으로 하는 기록매체이며, 상기 보호층은 탄소원자와 플루오로원자의 결합원자를 함유한 단분자막 또는 단분자 퇴적막으로 만들어지며, 상기 산소원자는 상기 결합원자에 화학적으로 결합된다.
  2. 상기 기록매체의 기체와 ; 상기 기체위에 형성된 적어도 하나의 기록층과 ; 상기 기록층을 보호하기 위한 상기 기록층위에 형성된 적어도 하나의 보호층으로 구성되는 것을 특징으로 하는 기록매체이며, 상기 보호층은 중합에 의해 플루오르원자를 함유한 실란계면 활성제로 만들어진다.
  3. 제2항에 있어서, CF3-(CF2)m-(CH2)n-SiCl3(m, n ; 정수)의 화학물질이 상기 실란계면 활성제로서 사용되는 것을 특징으로 하는 기록매체.
  4. 제2항에 있어서, 상기 기록 및 보호층은 상기 기체의 양면 모두에 형성되는 것을 특징으로 하는 기록매체.
  5. 제2항에 있어서, 상기 기체가 광학적으로 투명한 물질로 만들어지는 것을 특징으로 하는 기록매체.
  6. 제2항에 있어서, 상기 기록매체가 자기 기록매체, 광학식 기록매체 또는 기록디스크임을 특징으로 하는 기록매체.
  7. 상기 기록매체의 기체와 ; 상기 기체위에 형성된 적어도 하나의 기록층과 ; 상기 기록층위에 형성된 적어도 하나의 보호층으로 이루어지는 것을 특징으로 하는 기록매체이며, 상기 보호층은 CF3-(CF2)m-(CH2)n-SiCl3(m, n ; 정수)의 화확물질로 이루어지며 상기 제제는 상기 기록층과 중합된다.
  8. 상기 기록매체의 기체위에 기록층을 형성시키고 ; 상기 기록층위에 보호막을 형성시키는 단계들로 구성되는 것을 특징으로 하는 기록매체의 제조방법이며, 상기 보호층은 플루오르원자를 함유하는 실랄계면 활성제로 만들어지며 상기 제제는 서로 중합된고 화학흡착 기술을 사용하여 상기 기록층에 화학적으로 결합된다.
  9. 제8항에 있어서, CF3-(CF2)m-(CH2)n-SiCl3(m, n ; 정수)의 화학물질이 상기 계면활성제로서 사용됨을 특징으로 하는 기록매체의 제조방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019880002231A 1987-03-09 1988-03-04 기록매체 및 그의 제조방법 KR920005000B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP62053301A JPS63220420A (ja) 1987-03-09 1987-03-09 記録媒体およびその製造方法
JP62-53301 1987-03-09
JP53301 1987-03-09

Publications (2)

Publication Number Publication Date
KR880011740A true KR880011740A (ko) 1988-10-31
KR920005000B1 KR920005000B1 (ko) 1992-06-22

Family

ID=12938902

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019880002231A KR920005000B1 (ko) 1987-03-09 1988-03-04 기록매체 및 그의 제조방법

Country Status (5)

Country Link
US (1) US4902585A (ko)
EP (1) EP0282188B1 (ko)
JP (1) JPS63220420A (ko)
KR (1) KR920005000B1 (ko)
DE (1) DE3866262D1 (ko)

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JPH01194124A (ja) * 1988-01-29 1989-08-04 Matsushita Electric Ind Co Ltd 磁気記録媒体保護膜の形成方法
US5328768A (en) 1990-04-03 1994-07-12 Ppg Industries, Inc. Durable water repellant glass surface
JP2912694B2 (ja) * 1990-09-07 1999-06-28 松下電器産業株式会社 記録再生装置
JPH0798026B2 (ja) * 1991-02-06 1995-10-25 松下電器産業株式会社 調理器具およびその製造方法
EP0492417B1 (en) * 1990-12-21 1996-11-20 Matsushita Electric Industrial Co., Ltd. Method of manufacturing chemically adsorbed film
DE69129145T2 (de) 1990-12-25 1998-07-16 Matsushita Electric Ind Co Ltd Transparentes Substrat mit aufgebrachtem monomolekularem Film und Verfahren zu seiner Herstellung
EP0493747B1 (en) * 1990-12-25 1996-07-10 Matsushita Electric Industrial Co., Ltd. Anti-contaminating adsorbed film and method of manufacturing the same
EP0492545B1 (en) * 1990-12-25 1998-03-25 Matsushita Electric Industrial Co., Ltd. Transparent substrate with monomolecular film thereon and method of manufacturing the same
US6503567B2 (en) 1990-12-25 2003-01-07 Matsushita Electric Industrial Co., Ltd. Transparent substrate and method of manufacturing the same
DE69218811T2 (de) * 1991-01-23 1997-07-17 Matsushita Electric Ind Co Ltd Wasser- und ölabweisender adsorbierter Film und Verfahren zu dessen Herstellung
JPH04298817A (ja) * 1991-02-05 1992-10-22 Matsushita Electric Ind Co Ltd 磁気記録媒体
KR0138251B1 (ko) * 1991-02-05 1998-05-15 다니이 아끼오 자기기록매체 및 그 제조방법
CA2060294C (en) * 1991-02-06 2000-01-18 Kazufumi Ogawa Chemically absorbed film and method of manufacturing the same
EP0799688B1 (en) * 1991-04-30 2002-10-02 Matsushita Electric Industrial Co., Ltd Hydrophilic chemically adsorbed film & method of manufacturing the same
DE69220717T2 (de) * 1991-04-30 1997-11-06 Matsushita Electric Ind Co Ltd Chemisch adsorbierte Schicht und Verfahren zu deren Herstellung
JP2741804B2 (ja) * 1991-06-14 1998-04-22 松下電器産業株式会社 コンデンサ及びその製造方法
US5372851A (en) * 1991-12-16 1994-12-13 Matsushita Electric Industrial Co., Ltd. Method of manufacturing a chemically adsorbed film
US5296263A (en) * 1992-01-07 1994-03-22 Matsushita Electric Industrial Co., Ltd. Method of manufacturing a recording medium
JP2741823B2 (ja) * 1992-05-27 1998-04-22 松下電器産業株式会社 表面処理剤及びその使用方法
US5435839A (en) * 1992-12-24 1995-07-25 Matsushita Electric Industrial Co., Ltd. Finishing agents and method of manufacturing the same
EP0606174A1 (fr) * 1993-01-05 1994-07-13 Elf Atochem S.A. Solide muni d'une couche hydrophobe et oléophobe et procédé d'application de ladite couche
US5737229A (en) * 1995-11-07 1998-04-07 The Ohio State University Method of texturing a magnetic recording medium for optimum skewness and kurtosis to reduce friction with a magnetic head
US5851674A (en) * 1997-07-30 1998-12-22 Minnesota Mining And Manufacturing Company Antisoiling coatings for antireflective surfaces and methods of preparation
US6277485B1 (en) 1998-01-27 2001-08-21 3M Innovative Properties Company Antisoiling coatings for antireflective surfaces and methods of preparation
JP6415205B2 (ja) * 2014-09-19 2018-10-31 株式会社イシダ 組合せ計量機

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Also Published As

Publication number Publication date
JPS63220420A (ja) 1988-09-13
EP0282188B1 (en) 1991-11-21
JPH0534729B2 (ko) 1993-05-24
DE3866262D1 (de) 1992-01-02
EP0282188A1 (en) 1988-09-14
KR920005000B1 (ko) 1992-06-22
US4902585A (en) 1990-02-20

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