KR840003851A - 광 저항 조성물 - Google Patents

광 저항 조성물 Download PDF

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Publication number
KR840003851A
KR840003851A KR1019830000718A KR830000718A KR840003851A KR 840003851 A KR840003851 A KR 840003851A KR 1019830000718 A KR1019830000718 A KR 1019830000718A KR 830000718 A KR830000718 A KR 830000718A KR 840003851 A KR840003851 A KR 840003851A
Authority
KR
South Korea
Prior art keywords
soluble
water
polymer
photoresist composition
compound
Prior art date
Application number
KR1019830000718A
Other languages
English (en)
Other versions
KR860000707B1 (ko
Inventor
노리오 고이께
Original Assignee
사바 쇼오이찌
도오교오 시바우라덴기 가부시기가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2593782A external-priority patent/JPS58143340A/ja
Priority claimed from JP2593682A external-priority patent/JPS58143339A/ja
Priority claimed from JP2593582A external-priority patent/JPS58143338A/ja
Application filed by 사바 쇼오이찌, 도오교오 시바우라덴기 가부시기가이샤 filed Critical 사바 쇼오이찌
Publication of KR840003851A publication Critical patent/KR840003851A/ko
Application granted granted Critical
Publication of KR860000707B1 publication Critical patent/KR860000707B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/60—Compositions containing diazo compounds as photosensitive substances with macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

내용 없음

Description

광 저항 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (1)

  1. 수용성, 막 형성 중합체, 중합체-교차 결합수용성 비스 아지도 화합물, 중합체-교차결합, 개선된 부착성 수용성 디아조 화합물로 구성된 감광성 조성물과 하기 구조식의 부착 활성 수용성 폴리아미노 실란 화합물로 구성된 광저항 조성물.
    H2N(CH2CH2NH)nCH2CH2CH2Si(OR1)3
    상기 식에서, R1은 데틸 또는 에틸, n은 2에서 10까지의 정수.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019830000718A 1982-02-22 1983-02-22 포토레지스트(photoresist) 조성물 KR860000707B1 (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP25,936 1982-02-22
JP82-25935 1982-02-22
JP25,937 1982-02-22
JP2593782A JPS58143340A (ja) 1982-02-22 1982-02-22 ホトレジスト組成物
JP25,935 1982-02-22
JP2593682A JPS58143339A (ja) 1982-02-22 1982-02-22 ホトレジスト組成物
JP2593582A JPS58143338A (ja) 1982-02-22 1982-02-22 ホトレジスト組成物

Publications (2)

Publication Number Publication Date
KR840003851A true KR840003851A (ko) 1984-10-04
KR860000707B1 KR860000707B1 (ko) 1986-06-07

Family

ID=27285210

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019830000718A KR860000707B1 (ko) 1982-02-22 1983-02-22 포토레지스트(photoresist) 조성물

Country Status (2)

Country Link
US (1) US4491629A (ko)
KR (1) KR860000707B1 (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60147729A (ja) * 1984-01-12 1985-08-03 Toshiba Corp ホトレジスト組成物
JPS6125854U (ja) * 1984-07-20 1986-02-15 アイシン精機株式会社 エアランバサポ−ト装置
JPS63181234A (ja) * 1987-01-22 1988-07-26 Toshiba Corp カラ−受像管蛍光面の形成方法
US4732858A (en) * 1986-09-17 1988-03-22 Brewer Science, Inc. Adhesion promoting product and process for treating an integrated circuit substrate
US5536994A (en) * 1995-04-19 1996-07-16 Chunghwa Picture Tubes, Ltd. Photoresist for cathode ray tubes
US7285422B1 (en) 1997-01-23 2007-10-23 Sequenom, Inc. Systems and methods for preparing and analyzing low volume analyte array elements
AU2002245047A1 (en) 2000-10-30 2002-07-24 Sequenom, Inc. Method and apparatus for delivery of submicroliter volumes onto a substrate
JP4373260B2 (ja) * 2004-03-29 2009-11-25 一則 片岡 高分子複合体
US20090180931A1 (en) 2007-09-17 2009-07-16 Sequenom, Inc. Integrated robotic sample transfer device
JP2012053404A (ja) * 2010-09-03 2012-03-15 Murakami:Kk 感光性樹脂組成物およびこの感光性樹脂組成物を用いたスクリーン印刷用ステンシル

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2937085A (en) * 1954-01-11 1960-05-17 Ditto Inc Composite photosensitive plate, and method of making printing plate therefrom
US3387975A (en) * 1965-03-10 1968-06-11 Sony Corp Method of making color screen of a cathode ray tube
US3549368A (en) * 1968-07-02 1970-12-22 Ibm Process for improving photoresist adhesion
US3615538A (en) * 1968-08-02 1971-10-26 Printing Dev Inc Photosensitive printing plates
US3679419A (en) * 1969-05-20 1972-07-25 Azoplate Corp Light-sensitive diazo condensate containing reproduction material
JPS5119982B2 (ko) * 1972-01-26 1976-06-22
JPS5137138B2 (ko) * 1972-01-26 1976-10-14
US4099973A (en) * 1973-10-24 1978-07-11 Hitachi, Ltd. Photo-sensitive bis-azide containing composition
JPS5119982A (en) * 1974-08-12 1976-02-17 Nippon Electric Co Denkatensodebaisuno nyuryokukozo
JPS5615534B2 (ko) * 1974-10-25 1981-04-10
JPS6020737B2 (ja) * 1976-11-05 1985-05-23 松下電子工業株式会社 感光性被膜材料
JPS566530A (en) * 1979-06-29 1981-01-23 Hitachi Ltd Multiinput analog switch circuit

Also Published As

Publication number Publication date
US4491629A (en) 1985-01-01
KR860000707B1 (ko) 1986-06-07

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