KR840003702A - 납 또는 납합금으로 피복된 전극 및 그의 제법 - Google Patents

납 또는 납합금으로 피복된 전극 및 그의 제법 Download PDF

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Publication number
KR840003702A
KR840003702A KR1019830000642A KR830000642A KR840003702A KR 840003702 A KR840003702 A KR 840003702A KR 1019830000642 A KR1019830000642 A KR 1019830000642A KR 830000642 A KR830000642 A KR 830000642A KR 840003702 A KR840003702 A KR 840003702A
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KR
South Korea
Prior art keywords
lead
electrode
alloy
conductor
aluminum
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KR1019830000642A
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English (en)
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크리스토퍼밴스, (외4)
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다인 엘 휴지스
다이아몬드 샴락크 코오포레이션
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Application filed by 다인 엘 휴지스, 다이아몬드 샴락크 코오포레이션 filed Critical 다인 엘 휴지스
Publication of KR840003702A publication Critical patent/KR840003702A/ko

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/042—Electrodes formed of a single material
    • C25B11/046—Alloys
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
    • C25C7/02—Electrodes; Connections thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/34—Electroplating: Baths therefor from solutions of lead
    • C25D3/36—Electroplating: Baths therefor from solutions of lead characterised by the organic bath constituents used
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C25D5/38—Pretreatment of metallic surfaces to be electroplated of refractory metals or nickel
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C25D5/42—Pretreatment of metallic surfaces to be electroplated of light metals
    • C25D5/44—Aluminium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/64—Carriers or collectors
    • H01M4/66—Selection of materials
    • H01M4/665—Composites
    • H01M4/667—Composites in the form of layers, e.g. coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00—Electrodes
    • H01M4/02—Electrodes composed of, or comprising, active material
    • H01M4/64—Carriers or collectors
    • H01M4/70—Carriers or collectors characterised by shape or form
    • H01M4/72—Grids
    • H01M4/73—Grids for lead-acid accumulators, e.g. frame plates

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Composite Materials (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

내용 없음

Description

납 또는 납합금으로 피복된 전극 및 그의 제법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (17)

  1. 납 또는 납합금박판이 결합되어 있는 납 또는 납합금 전기도금층으로 피복된 알루미늄, 티타늄, 질코늄, 니오븀, 몰리브덴, 텡스텐, 탄탈륨, 마그네늄합금, 철, 강철, 구리 또는 이들물질의 합금(들)이나 흑연으로 된 전기도체로 구성된 전기분해전극
  2. 제1항에 있어서, 납 또는 납합금의 전기도금층이 전도체상에 직접 도금된 전극.
  3. 제1항 또는 제2항에 있어서, 전기도금층 및/또는 결합판이 납-은, 납-안티몬 또는 납-칼슘합금으로 구성된 전극.
  4. 제1항 또는 제2항 또는 제3항 있어서, 전도체가 알루미늄판으로 구성된 전극.
  5. 제1항 또는 제2항 또는 제3항 있어서, 전도체가 납이나 납합금의 전기도금층으로 피복된 알루미늄의 알밀입자로 구성된 전극
  6. 제1항 내지 제5항중 어느 하나에 이어서 전기촉매물질을 결합된 납이나 납합금판 표면에 사용한 전극.
  7. 제6항에 있어서, 전기촉매 물질이 표면활성 입자밸브 금속으로 구성된 전극.
  8. 제7항에 있어서, 입자밸브 금속이 편평스폰지인 전극.
  9. 제1항 내지 제8항중 어느 하나에 있어서, 전극이 쌍극전극인 전극.
  10. 제9항에 있어서, 전기도금된 납이나 납합금층에 결합된 납 또는 납합금판이 양극면을 이루며, 전도체가 음극면으로 이루거나 음극물질로 피복된 쌍극전극.
  11. 제1항 내지 제10항중 어느 하나의 전극을 만드는데 있어, 납 또는 납합금을 비수성전해질로 부터 직접 전도체상에 전기도금하는 것으로 구성된 전극의 제조방법.
  12. 제11항에 있어서, 열 및 압력을 사용하여 전기도금된 납이나 납합금으로 피복된 전도체상에 납 또는 납합금판을 결합시키는 것으로 구성된 방법.
  13. 제11항 또는 제12항에 있어서, 비수성전해질이 방향족 탄화수소 용매중 납할라이드 및 알루미늄 할라이드로 구성된 방법.
  14. 제13항에 있어서 전도체가 알루미늄, 티타늄, 질코늄, 니오븀 몰리브덴, 텅스텐, 탄탈륨 또는 마그네슘 합금으로 구성되며 납 또는 납합금을 전기도금하기에 앞서 비수성전해질 중에서 우선 양극처리하여 산화물막을 제거하는 것으로 구성된 방법.
  15. 제1항 내지 제9항중 어느 하나의 전극을 양극으로 사용하여 황산함유 전해질로 부터 금속을 전해채취하는 방법.
  16. 제14항에 있어서, 전해채취금속이 아연, 구리, 코발트 또는 니켈인 방법.
  17. 도금될 금속(들) 이온들(및 임의로 알칼리 금속이온들), 알루미늄 할라이드 및 방향족 탄화수소로 구성된 에칭/전기도금 용액중에 기질을 넣은 알루미늄할라이드와 금속(들)을 용성착염이 형성되게끔 용액 중에서 반응시켜 막형성금속 기질로부터 표면산화물을 제거한 후 기질을 음극접속시키고 전해전류를 통해주어 산화물이 제거된 표면상에 금속(들)을 전기도금으로 하는 것으로 구성된 납, 은, 구리, 칼슘, 안티몬, 주석, 카드뮴, 니켈, 아연 및 이들 금속의 합금과 같은 금속을 알루미늄, 티타늄, 질코늄, 니오븀, 몰리브덴, 텅스텐, 탄탈륨 및 그의 합금 군으로부터 선택된 막형성 금속의 기질상에 전기도금 하는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019830000642A 1982-02-18 1983-02-17 납 또는 납합금으로 피복된 전극 및 그의 제법 KR840003702A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP82810075.0 1982-02-18
EP82810075 1982-02-18

Publications (1)

Publication Number Publication Date
KR840003702A true KR840003702A (ko) 1984-09-15

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KR1019830000642A KR840003702A (ko) 1982-02-18 1983-02-17 납 또는 납합금으로 피복된 전극 및 그의 제법

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Country Link
US (2) US4459189A (ko)
EP (1) EP0090435A1 (ko)
JP (1) JPS58161785A (ko)
KR (1) KR840003702A (ko)
AU (1) AU1065683A (ko)
CA (1) CA1232227A (ko)
ES (1) ES519883A0 (ko)
FI (1) FI830535L (ko)
NO (1) NO830560L (ko)
PL (1) PL240654A1 (ko)

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Also Published As

Publication number Publication date
PL240654A1 (en) 1984-03-26
AU1065683A (en) 1983-08-25
FI830535L (fi) 1983-08-19
US4465561A (en) 1984-08-14
NO830560L (no) 1983-08-19
JPS58161785A (ja) 1983-09-26
ES8403170A1 (es) 1984-03-01
CA1232227A (en) 1988-02-02
US4459189A (en) 1984-07-10
FI830535A0 (fi) 1983-02-17
EP0090435A1 (en) 1983-10-05
ES519883A0 (es) 1984-03-01

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