KR830007766A - 가열에 의해 현색되며 가열동안 강염기 방출 활성제 전구물질을 함유하는 디아조 염료 조성물 및 이물질을 사용한 디아조형 염색방법 - Google Patents

가열에 의해 현색되며 가열동안 강염기 방출 활성제 전구물질을 함유하는 디아조 염료 조성물 및 이물질을 사용한 디아조형 염색방법 Download PDF

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Publication number
KR830007766A
KR830007766A KR1019810004683A KR810004683A KR830007766A KR 830007766 A KR830007766 A KR 830007766A KR 1019810004683 A KR1019810004683 A KR 1019810004683A KR 810004683 A KR810004683 A KR 810004683A KR 830007766 A KR830007766 A KR 830007766A
Authority
KR
South Korea
Prior art keywords
group
groups
carbon atoms
diazo
atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1019810004683A
Other languages
English (en)
Korean (ko)
Inventor
쌩뜨르 끌로드
크로쉐모 미쉘
Original Assignee
미쉘 프로몽
롱 쁠랑 시스템
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미쉘 프로몽, 롱 쁠랑 시스템 filed Critical 미쉘 프로몽
Publication of KR830007766A publication Critical patent/KR830007766A/ko
Ceased legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/61Compositions containing diazo compounds as photosensitive substances with non-macromolecular additives
    • G03C1/615Substances generating bases
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/61Compositions containing diazo compounds as photosensitive substances with non-macromolecular additives

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Extraction Or Liquid Replacement (AREA)
  • Saccharide Compounds (AREA)
  • Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
  • Polyurethanes Or Polyureas (AREA)
KR1019810004683A 1980-12-02 1981-12-02 가열에 의해 현색되며 가열동안 강염기 방출 활성제 전구물질을 함유하는 디아조 염료 조성물 및 이물질을 사용한 디아조형 염색방법 Ceased KR830007766A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR80/25958 1980-12-02
FR8025958A FR2495343B1 (fr) 1980-12-02 1980-12-02 Materiaux diazotypes thermodeveloppables contenant un precurseur d'activateur liberant lors du chauffage une base forte. procede de diazotypie mettant en oeuvre ces materiaux

Publications (1)

Publication Number Publication Date
KR830007766A true KR830007766A (ko) 1983-11-07

Family

ID=9248760

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019810004683A Ceased KR830007766A (ko) 1980-12-02 1981-12-02 가열에 의해 현색되며 가열동안 강염기 방출 활성제 전구물질을 함유하는 디아조 염료 조성물 및 이물질을 사용한 디아조형 염색방법

Country Status (21)

Country Link
US (1) US4584256A (enExample)
EP (1) EP0074950B1 (enExample)
JP (1) JPS57501931A (enExample)
KR (1) KR830007766A (enExample)
AT (1) ATE18814T1 (enExample)
AU (1) AU547595B2 (enExample)
BR (1) BR8109006A (enExample)
CA (1) CA1158474A (enExample)
DE (1) DE3174209D1 (enExample)
DK (1) DK345582A (enExample)
FI (1) FI67763C (enExample)
FR (1) FR2495343B1 (enExample)
GR (1) GR75039B (enExample)
HU (1) HU185996B (enExample)
IE (1) IE52254B1 (enExample)
IL (1) IL64419A (enExample)
NO (1) NO822624L (enExample)
PT (1) PT74055B (enExample)
RO (1) RO86617B (enExample)
WO (1) WO1982001944A1 (enExample)
ZA (1) ZA818285B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59195237A (ja) * 1983-04-20 1984-11-06 Fuji Photo Film Co Ltd 熱現像感光材料
EP0555749B1 (en) * 1992-02-14 1999-05-19 Shipley Company Inc. Radiation sensitive compositions and processes
US6080521A (en) * 1998-06-15 2000-06-27 Andrews Paper & Chemical Co., Inc. Universal diazotype precoat for application to base papers with acidic or alkaline sizing
WO2009030887A2 (en) * 2007-09-04 2009-03-12 Biolipox Ab Bis-aromatic compounds useful in the treatment of inflammation
CN116535333B (zh) * 2023-04-06 2025-02-11 华南理工大学 一种酰胺类β晶型成核剂及其制备方法和应用

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL258232A (enExample) * 1959-11-23
US3220846A (en) * 1960-06-27 1965-11-30 Eastman Kodak Co Use of salts of readily decarboxylated acids in thermography, photography, photothermography and thermophotography
NL288596A (enExample) * 1962-02-06
US3367776A (en) * 1964-04-17 1968-02-06 Addressograph Multigraph Heat sensitive diazotype materials
FR1452286A (fr) * 1964-08-17 1966-02-25 Ibm Compositions et éléments photosensibles thermodéveloppables
US3420666A (en) * 1964-10-15 1969-01-07 Gaf Corp Two-component heat developing diazotypes
US3389996A (en) * 1964-10-15 1968-06-25 Gen Aniline & Film Corp Two-component heat developable diazotypes
DE1572048C3 (de) * 1965-09-10 1978-10-26 Hoechst Ag, 6000 Frankfurt Wärmeentwickelbares Diazotypiematerial
NL136527C (enExample) * 1966-11-07
US3625693A (en) * 1966-11-09 1971-12-07 Ricoh Kk Thermally developable diazotype copying materials
NL6905657A (enExample) * 1968-04-22 1969-10-24
GB1292607A (en) * 1968-12-28 1972-10-11 Ricoh Kk Improvements in and relating to heat-developable light-sensitive material
GB1307314A (en) * 1969-06-07 1973-02-21 Ricoh Kk Heat developable diazotype copying materials
JPS5140455A (ja) * 1974-10-03 1976-04-05 Unitika Ltd Taidenboshiseisenishugotai no seizohoho
FR2340567A1 (fr) * 1976-02-05 1977-09-02 Ozalid Group Holdings Ltd Materiau diazotype developpable par la chaleur
JPS538486A (en) * 1976-07-10 1978-01-25 Okura Denki Co Ltd Interruption backup system
US4060420A (en) * 1976-08-06 1977-11-29 Eastman Kodak Company Sulfonylacetate activator-stabilizer precursor
JPS5330322A (en) * 1976-09-02 1978-03-22 Ricoh Co Ltd Heat-type diazo copying material
US4088496A (en) * 1976-12-22 1978-05-09 Eastman Kodak Company Heat developable photographic materials and process

Also Published As

Publication number Publication date
PT74055A (fr) 1981-12-01
ZA818285B (en) 1982-11-24
FI824503A0 (fi) 1982-12-29
JPS57501931A (enExample) 1982-10-28
IL64419A (en) 1984-11-30
FI67763B (fi) 1985-01-31
FI67763C (fi) 1985-05-10
RO86617B (ro) 1985-05-01
EP0074950B1 (fr) 1986-03-26
IL64419A0 (en) 1982-03-31
CA1158474A (fr) 1983-12-13
EP0074950A1 (fr) 1983-03-30
ATE18814T1 (de) 1986-04-15
IE52254B1 (en) 1987-08-19
PT74055B (fr) 1983-04-26
IE812798L (en) 1982-06-02
FR2495343A1 (fr) 1982-06-04
FR2495343B1 (fr) 1987-02-20
DK345582A (da) 1982-08-02
BR8109006A (pt) 1983-04-12
FI824503L (fi) 1982-12-29
DE3174209D1 (en) 1986-04-30
RO86617A (ro) 1985-04-17
AU7807681A (en) 1982-06-17
NO822624L (no) 1982-07-30
WO1982001944A1 (fr) 1982-06-10
GR75039B (enExample) 1984-07-12
AU547595B2 (en) 1985-10-24
HU185996B (en) 1985-04-28
US4584256A (en) 1986-04-22

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PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 19811202

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PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 19861202

Comment text: Request for Examination of Application

Patent event code: PA02011R01I

Patent event date: 19811202

Comment text: Patent Application

PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 19880705

Patent event code: PE09021S01D

PE0601 Decision on rejection of patent

Patent event date: 19880930

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 19880705

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I