KR20260033524A - 감광성 조성물, 경화막의 제조 방법, 격벽, 발광 소자 및 표시 장치 - Google Patents

감광성 조성물, 경화막의 제조 방법, 격벽, 발광 소자 및 표시 장치

Info

Publication number
KR20260033524A
KR20260033524A KR1020267000462A KR20267000462A KR20260033524A KR 20260033524 A KR20260033524 A KR 20260033524A KR 1020267000462 A KR1020267000462 A KR 1020267000462A KR 20267000462 A KR20267000462 A KR 20267000462A KR 20260033524 A KR20260033524 A KR 20260033524A
Authority
KR
South Korea
Prior art keywords
group
photosensitive composition
compound
mass
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020267000462A
Other languages
English (en)
Korean (ko)
Inventor
유타 사카이다
유즈루 가네코
Original Assignee
샌트랄 글래스 컴퍼니 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 샌트랄 글래스 컴퍼니 리미티드 filed Critical 샌트랄 글래스 컴퍼니 리미티드
Publication of KR20260033524A publication Critical patent/KR20260033524A/ko
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials For Photolithography (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020267000462A 2023-07-06 2024-07-03 감광성 조성물, 경화막의 제조 방법, 격벽, 발광 소자 및 표시 장치 Pending KR20260033524A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023111634 2023-07-06
JPJP-P-2023-111634 2023-07-06
PCT/JP2024/024008 WO2025009543A1 (ja) 2023-07-06 2024-07-03 感光性組成物、硬化膜の製造方法、隔壁、発光素子および表示装置

Publications (1)

Publication Number Publication Date
KR20260033524A true KR20260033524A (ko) 2026-03-10

Family

ID=94171506

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020267000462A Pending KR20260033524A (ko) 2023-07-06 2024-07-03 감광성 조성물, 경화막의 제조 방법, 격벽, 발광 소자 및 표시 장치

Country Status (5)

Country Link
JP (1) JPWO2025009543A1 (cg-RX-API-DMAC7.html)
KR (1) KR20260033524A (cg-RX-API-DMAC7.html)
CN (1) CN121336149A (cg-RX-API-DMAC7.html)
TW (1) TW202505306A (cg-RX-API-DMAC7.html)
WO (1) WO2025009543A1 (cg-RX-API-DMAC7.html)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60163041A (ja) * 1984-02-03 1985-08-24 Asahi Chem Ind Co Ltd 改良された光重合性組成物
US6482551B1 (en) * 1998-03-24 2002-11-19 Inphase Technologies Optical article and process for forming article
JP2006285174A (ja) * 2004-12-08 2006-10-19 Fuji Photo Film Co Ltd 感光性組成物及び感光性フィルム、並びに、永久パターン及びその形成方法
JP6350287B2 (ja) * 2012-11-28 2018-07-04 旭硝子株式会社 ネガ型感光性樹脂組成物、樹脂硬化膜、隔壁及び光学素子
JP6979254B2 (ja) * 2018-06-05 2021-12-08 東洋ビジュアルソリューションズ株式会社 顔料分散剤、顔料組成物、カラーフィルタ用着色組成物およびカラーフィルタ
JP6736106B1 (ja) * 2019-09-05 2020-08-05 Ｎｓマテリアルズ株式会社 量子ドット含有組成物、及び、前記量子ドット含有組成物を用いた量子ドット含有部材、バックライト装置、表示装置、並びに、液晶表示素子

Also Published As

Publication number Publication date
CN121336149A (zh) 2026-01-13
WO2025009543A1 (ja) 2025-01-09
TW202505306A (zh) 2025-02-01
JPWO2025009543A1 (cg-RX-API-DMAC7.html) 2025-01-09

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