KR20240152920A - 하전 입자선 장치 - Google Patents
하전 입자선 장치 Download PDFInfo
- Publication number
- KR20240152920A KR20240152920A KR1020247031822A KR20247031822A KR20240152920A KR 20240152920 A KR20240152920 A KR 20240152920A KR 1020247031822 A KR1020247031822 A KR 1020247031822A KR 20247031822 A KR20247031822 A KR 20247031822A KR 20240152920 A KR20240152920 A KR 20240152920A
- Authority
- KR
- South Korea
- Prior art keywords
- electron source
- filament
- shield
- single crystal
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/065—Construction of guns or parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
- H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
- H01J7/18—Means for absorbing or adsorbing gas, e.g. by gettering
- H01J7/183—Composition or manufacture of getters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06325—Cold-cathode sources
- H01J2237/06341—Field emission
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2022/018553 WO2023203755A1 (ja) | 2022-04-22 | 2022-04-22 | 荷電粒子線装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20240152920A true KR20240152920A (ko) | 2024-10-22 |
Family
ID=88419459
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020247031822A Pending KR20240152920A (ko) | 2022-04-22 | 2022-04-22 | 하전 입자선 장치 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20250273422A1 (https=) |
| JP (1) | JP7821274B2 (https=) |
| KR (1) | KR20240152920A (https=) |
| TW (1) | TWI900839B (https=) |
| WO (1) | WO2023203755A1 (https=) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010010125A (ja) | 2008-05-28 | 2010-01-14 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS642352U (https=) * | 1987-06-25 | 1989-01-09 | ||
| JP4977399B2 (ja) * | 2005-11-10 | 2012-07-18 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| EP1983548A1 (en) * | 2007-04-20 | 2008-10-22 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Emitter chamber, charged particle apparatus and method for operating same |
| JP5194133B2 (ja) * | 2009-01-15 | 2013-05-08 | 株式会社日立ハイテクノロジーズ | イオンビーム装置 |
| DE112010002551B4 (de) * | 2009-06-16 | 2019-10-31 | Hitachi High-Technologies Corporation | Geladene teilchen abstrahlende vorrichtung |
| JP7068117B2 (ja) * | 2018-09-18 | 2022-05-16 | 株式会社日立ハイテク | 荷電粒子線装置 |
| WO2020213109A1 (ja) * | 2019-04-18 | 2020-10-22 | 株式会社日立ハイテク | 電子源、及び荷電粒子線装置 |
-
2022
- 2022-04-22 JP JP2024516037A patent/JP7821274B2/ja active Active
- 2022-04-22 US US18/856,773 patent/US20250273422A1/en active Pending
- 2022-04-22 KR KR1020247031822A patent/KR20240152920A/ko active Pending
- 2022-04-22 WO PCT/JP2022/018553 patent/WO2023203755A1/ja not_active Ceased
-
2023
- 2023-03-28 TW TW112111815A patent/TWI900839B/zh active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010010125A (ja) | 2008-05-28 | 2010-01-14 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI900839B (zh) | 2025-10-11 |
| TW202343514A (zh) | 2023-11-01 |
| US20250273422A1 (en) | 2025-08-28 |
| JP7821274B2 (ja) | 2026-02-26 |
| WO2023203755A1 (ja) | 2023-10-26 |
| JPWO2023203755A1 (https=) | 2023-10-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| D21 | Rejection of application intended |
Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D21-EXM-PE0902 (AS PROVIDED BY THE NATIONAL OFFICE) |
|
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
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| T11 | Administrative time limit extension requested |
Free format text: ST27 STATUS EVENT CODE: U-3-3-T10-T11-OTH-X000 (AS PROVIDED BY THE NATIONAL OFFICE) |
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| T11-X000 | Administrative time limit extension requested |
St.27 status event code: U-3-3-T10-T11-oth-X000 |
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| T11 | Administrative time limit extension requested |
Free format text: ST27 STATUS EVENT CODE: U-3-3-T10-T11-OTH-X000 (AS PROVIDED BY THE NATIONAL OFFICE) |
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| T11-X000 | Administrative time limit extension requested |
St.27 status event code: U-3-3-T10-T11-oth-X000 |
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| E13 | Pre-grant limitation requested |
Free format text: ST27 STATUS EVENT CODE: A-2-3-E10-E13-LIM-X000 (AS PROVIDED BY THE NATIONAL OFFICE) |
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| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
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| P11 | Amendment of application requested |
Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE) |
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| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
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| P13 | Application amended |
Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P13-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE) |
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| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
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| D22 | Grant of ip right intended |
Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D22-EXM-PE0701 (AS PROVIDED BY THE NATIONAL OFFICE) |
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| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |