JP7821274B2 - 荷電粒子線装置 - Google Patents

荷電粒子線装置

Info

Publication number
JP7821274B2
JP7821274B2 JP2024516037A JP2024516037A JP7821274B2 JP 7821274 B2 JP7821274 B2 JP 7821274B2 JP 2024516037 A JP2024516037 A JP 2024516037A JP 2024516037 A JP2024516037 A JP 2024516037A JP 7821274 B2 JP7821274 B2 JP 7821274B2
Authority
JP
Japan
Prior art keywords
electron source
evaporable getter
getter material
extraction electrode
filament
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2024516037A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2023203755A1 (https=
Inventor
圭吾 糟谷
修平 石川
崇 大西
隆 土肥
憲史 谷本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Tech Corp filed Critical Hitachi High Tech Corp
Publication of JPWO2023203755A1 publication Critical patent/JPWO2023203755A1/ja
Application granted granted Critical
Publication of JP7821274B2 publication Critical patent/JP7821274B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/065—Construction of guns or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
    • H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
    • H01J7/18—Means for absorbing or adsorbing gas, e.g. by gettering
    • H01J7/183—Composition or manufacture of getters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06341—Field emission

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2024516037A 2022-04-22 2022-04-22 荷電粒子線装置 Active JP7821274B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/018553 WO2023203755A1 (ja) 2022-04-22 2022-04-22 荷電粒子線装置

Publications (2)

Publication Number Publication Date
JPWO2023203755A1 JPWO2023203755A1 (https=) 2023-10-26
JP7821274B2 true JP7821274B2 (ja) 2026-02-26

Family

ID=88419459

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024516037A Active JP7821274B2 (ja) 2022-04-22 2022-04-22 荷電粒子線装置

Country Status (5)

Country Link
US (1) US20250273422A1 (https=)
JP (1) JP7821274B2 (https=)
KR (1) KR20240152920A (https=)
TW (1) TWI900839B (https=)
WO (1) WO2023203755A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080283745A1 (en) 2007-04-20 2008-11-20 Ict Integrated Circuit Testing Gesellschaft Fuer Halbleiterprueftechnik Mbh Emitter chamber, charged partical apparatus and method for operating same
JP2010010125A (ja) 2008-05-28 2010-01-14 Hitachi High-Technologies Corp 荷電粒子線装置
WO2010146833A1 (ja) 2009-06-16 2010-12-23 株式会社日立ハイテクノロジーズ 荷電粒子線装置
WO2020213109A1 (ja) 2019-04-18 2020-10-22 株式会社日立ハイテク 電子源、及び荷電粒子線装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS642352U (https=) * 1987-06-25 1989-01-09
JP4977399B2 (ja) * 2005-11-10 2012-07-18 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5194133B2 (ja) * 2009-01-15 2013-05-08 株式会社日立ハイテクノロジーズ イオンビーム装置
JP7068117B2 (ja) * 2018-09-18 2022-05-16 株式会社日立ハイテク 荷電粒子線装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080283745A1 (en) 2007-04-20 2008-11-20 Ict Integrated Circuit Testing Gesellschaft Fuer Halbleiterprueftechnik Mbh Emitter chamber, charged partical apparatus and method for operating same
JP2010010125A (ja) 2008-05-28 2010-01-14 Hitachi High-Technologies Corp 荷電粒子線装置
WO2010146833A1 (ja) 2009-06-16 2010-12-23 株式会社日立ハイテクノロジーズ 荷電粒子線装置
WO2020213109A1 (ja) 2019-04-18 2020-10-22 株式会社日立ハイテク 電子源、及び荷電粒子線装置

Also Published As

Publication number Publication date
TWI900839B (zh) 2025-10-11
TW202343514A (zh) 2023-11-01
US20250273422A1 (en) 2025-08-28
WO2023203755A1 (ja) 2023-10-26
KR20240152920A (ko) 2024-10-22
JPWO2023203755A1 (https=) 2023-10-26

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