TWI900839B - 帶電粒子線裝置 - Google Patents

帶電粒子線裝置

Info

Publication number
TWI900839B
TWI900839B TW112111815A TW112111815A TWI900839B TW I900839 B TWI900839 B TW I900839B TW 112111815 A TW112111815 A TW 112111815A TW 112111815 A TW112111815 A TW 112111815A TW I900839 B TWI900839 B TW I900839B
Authority
TW
Taiwan
Prior art keywords
electron source
filament
neg
single crystal
extraction electrode
Prior art date
Application number
TW112111815A
Other languages
English (en)
Chinese (zh)
Other versions
TW202343514A (zh
Inventor
糟谷圭吾
石川修平
大西崇
土肥𨺓
谷本憲史
Original Assignee
日商日立全球先端科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日立全球先端科技股份有限公司 filed Critical 日商日立全球先端科技股份有限公司
Publication of TW202343514A publication Critical patent/TW202343514A/zh
Application granted granted Critical
Publication of TWI900839B publication Critical patent/TWI900839B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/065—Construction of guns or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
    • H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
    • H01J7/18—Means for absorbing or adsorbing gas, e.g. by gettering
    • H01J7/183—Composition or manufacture of getters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06341—Field emission

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Sources, Ion Sources (AREA)
TW112111815A 2022-04-22 2023-03-28 帶電粒子線裝置 TWI900839B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
WOPCT/JP2022/018553 2022-04-22
PCT/JP2022/018553 WO2023203755A1 (ja) 2022-04-22 2022-04-22 荷電粒子線装置

Publications (2)

Publication Number Publication Date
TW202343514A TW202343514A (zh) 2023-11-01
TWI900839B true TWI900839B (zh) 2025-10-11

Family

ID=88419459

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112111815A TWI900839B (zh) 2022-04-22 2023-03-28 帶電粒子線裝置

Country Status (5)

Country Link
US (1) US20250273422A1 (https=)
JP (1) JP7821274B2 (https=)
KR (1) KR20240152920A (https=)
TW (1) TWI900839B (https=)
WO (1) WO2023203755A1 (https=)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS642352U (https=) * 1987-06-25 1989-01-09
US20070102650A1 (en) * 2005-11-10 2007-05-10 Souichi Katagiri Charged particle beam apparatus
US20120319003A1 (en) * 2009-01-15 2012-12-20 Hitachi High-Technologies Corporation Ion beam device
US20200090897A1 (en) * 2018-09-18 2020-03-19 Hitachi High-Technologies Corporation Charged particle beam device
TW202040591A (zh) * 2019-04-18 2020-11-01 日商日立全球先端科技股份有限公司 電子源及荷電粒子束裝置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1983548A1 (en) * 2007-04-20 2008-10-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Emitter chamber, charged particle apparatus and method for operating same
JP5514472B2 (ja) 2008-05-28 2014-06-04 株式会社日立ハイテクノロジーズ 荷電粒子線装置
DE112010002551B4 (de) * 2009-06-16 2019-10-31 Hitachi High-Technologies Corporation Geladene teilchen abstrahlende vorrichtung

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS642352U (https=) * 1987-06-25 1989-01-09
US20070102650A1 (en) * 2005-11-10 2007-05-10 Souichi Katagiri Charged particle beam apparatus
US20120319003A1 (en) * 2009-01-15 2012-12-20 Hitachi High-Technologies Corporation Ion beam device
US20200090897A1 (en) * 2018-09-18 2020-03-19 Hitachi High-Technologies Corporation Charged particle beam device
TW202040591A (zh) * 2019-04-18 2020-11-01 日商日立全球先端科技股份有限公司 電子源及荷電粒子束裝置

Also Published As

Publication number Publication date
TW202343514A (zh) 2023-11-01
US20250273422A1 (en) 2025-08-28
JP7821274B2 (ja) 2026-02-26
WO2023203755A1 (ja) 2023-10-26
KR20240152920A (ko) 2024-10-22
JPWO2023203755A1 (https=) 2023-10-26

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