KR20240105432A - 검사 장치 및 막질 검사 방법 - Google Patents
검사 장치 및 막질 검사 방법 Download PDFInfo
- Publication number
- KR20240105432A KR20240105432A KR1020247019418A KR20247019418A KR20240105432A KR 20240105432 A KR20240105432 A KR 20240105432A KR 1020247019418 A KR1020247019418 A KR 1020247019418A KR 20247019418 A KR20247019418 A KR 20247019418A KR 20240105432 A KR20240105432 A KR 20240105432A
- Authority
- KR
- South Korea
- Prior art keywords
- sample
- light
- signal
- charged particle
- film quality
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/224—Luminescent screens or photographic plates for imaging; Apparatus specially adapted therefor, e. g. cameras, TV-cameras, photographic equipment or exposure control; Optical subsystems specially adapted therefor, e. g. microscopes for observing image on luminescent screen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2022/003391 WO2023145015A1 (ja) | 2022-01-28 | 2022-01-28 | 検査装置および膜質検査方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20240105432A true KR20240105432A (ko) | 2024-07-05 |
Family
ID=87470952
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020247019418A Pending KR20240105432A (ko) | 2022-01-28 | 2022-01-28 | 검사 장치 및 막질 검사 방법 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20250046569A1 (https=) |
| JP (1) | JP7686797B2 (https=) |
| KR (1) | KR20240105432A (https=) |
| TW (1) | TWI856467B (https=) |
| WO (1) | WO2023145015A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025253595A1 (ja) * | 2024-06-06 | 2025-12-11 | 株式会社日立ハイテク | 光照射装置、計測装置、および荷電粒子線装置 |
| WO2025262940A1 (ja) * | 2024-06-21 | 2025-12-26 | 株式会社日立ハイテク | 荷電粒子線装置および試料観察方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000357483A (ja) | 1999-06-11 | 2000-12-26 | Hitachi Ltd | 荷電粒子線画像に基づく検査または計測方法およびその装置並びに荷電粒子線装置 |
| JP2006338881A (ja) | 2005-05-31 | 2006-12-14 | Hitachi High-Technologies Corp | 電子顕微鏡応用装置および試料検査方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11118738A (ja) * | 1997-10-14 | 1999-04-30 | Advantest Corp | 微小な測定対象物を高速に分析できる分析装置 |
| JP4795883B2 (ja) * | 2006-07-21 | 2011-10-19 | 株式会社日立ハイテクノロジーズ | パターン検査・計測装置 |
| JP2009043960A (ja) * | 2007-08-09 | 2009-02-26 | Panasonic Corp | 欠陥画像自動収集方法 |
| JP5325522B2 (ja) * | 2008-10-15 | 2013-10-23 | 株式会社堀場製作所 | 複合型観察装置 |
| US10410338B2 (en) * | 2013-11-04 | 2019-09-10 | Kla-Tencor Corporation | Method and system for correlating optical images with scanning electron microscopy images |
| JP2017535914A (ja) * | 2014-09-17 | 2017-11-30 | オルボテック エルティーディーOrbotech Ltd. | 検査、テスト、デバッグ、及び表面の改変のための電子ビーム誘導プラズマ(eBIP)の適用 |
| KR102347057B1 (ko) * | 2015-08-12 | 2022-01-03 | 케이엘에이 코포레이션 | 전자 빔 이미지에서의 결함 위치 결정 |
| WO2020234987A1 (ja) * | 2019-05-21 | 2020-11-26 | 株式会社日立ハイテク | 荷電粒子線装置 |
| JP7148467B2 (ja) * | 2019-08-30 | 2022-10-05 | 株式会社日立ハイテク | 荷電粒子線装置 |
| WO2022091180A1 (ja) * | 2020-10-26 | 2022-05-05 | 株式会社日立ハイテク | 荷電粒子線装置 |
-
2022
- 2022-01-28 WO PCT/JP2022/003391 patent/WO2023145015A1/ja not_active Ceased
- 2022-01-28 US US18/722,800 patent/US20250046569A1/en active Pending
- 2022-01-28 JP JP2023576531A patent/JP7686797B2/ja active Active
- 2022-01-28 KR KR1020247019418A patent/KR20240105432A/ko active Pending
- 2022-12-28 TW TW111150350A patent/TWI856467B/zh active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000357483A (ja) | 1999-06-11 | 2000-12-26 | Hitachi Ltd | 荷電粒子線画像に基づく検査または計測方法およびその装置並びに荷電粒子線装置 |
| JP2006338881A (ja) | 2005-05-31 | 2006-12-14 | Hitachi High-Technologies Corp | 電子顕微鏡応用装置および試料検査方法 |
Non-Patent Citations (1)
| Title |
|---|
| D. E. Aspnes, "Third-Derivative Modulation Spectroscopy with Low-Field Electroreflectance" Surface Science 37 (1973) 418-442 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2023145015A1 (ja) | 2023-08-03 |
| TWI856467B (zh) | 2024-09-21 |
| US20250046569A1 (en) | 2025-02-06 |
| TW202331771A (zh) | 2023-08-01 |
| JPWO2023145015A1 (https=) | 2023-08-03 |
| JP7686797B2 (ja) | 2025-06-02 |
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St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
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| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
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| D13-X000 | Search requested |
St.27 status event code: A-1-2-D10-D13-srh-X000 |
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| D21 | Rejection of application intended |
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