KR20240105432A - 검사 장치 및 막질 검사 방법 - Google Patents

검사 장치 및 막질 검사 방법 Download PDF

Info

Publication number
KR20240105432A
KR20240105432A KR1020247019418A KR20247019418A KR20240105432A KR 20240105432 A KR20240105432 A KR 20240105432A KR 1020247019418 A KR1020247019418 A KR 1020247019418A KR 20247019418 A KR20247019418 A KR 20247019418A KR 20240105432 A KR20240105432 A KR 20240105432A
Authority
KR
South Korea
Prior art keywords
sample
light
signal
charged particle
film quality
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247019418A
Other languages
English (en)
Korean (ko)
Inventor
야스히로 시라사끼
미나미 우찌호
가즈후미 야찌
Original Assignee
주식회사 히타치하이테크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 히타치하이테크 filed Critical 주식회사 히타치하이테크
Publication of KR20240105432A publication Critical patent/KR20240105432A/ko
Pending legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/22Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10Lenses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/22Optical, image processing or photographic arrangements associated with the tube
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/22Optical, image processing or photographic arrangements associated with the tube
    • H01J37/224Luminescent screens or photographic plates for imaging; Apparatus specially adapted therefor, e. g. cameras, TV-cameras, photographic equipment or exposure control; Optical subsystems specially adapted therefor, e. g. microscopes for observing image on luminescent screen
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/244Detectors; Associated components or circuits therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
KR1020247019418A 2022-01-28 2022-01-28 검사 장치 및 막질 검사 방법 Pending KR20240105432A (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/003391 WO2023145015A1 (ja) 2022-01-28 2022-01-28 検査装置および膜質検査方法

Publications (1)

Publication Number Publication Date
KR20240105432A true KR20240105432A (ko) 2024-07-05

Family

ID=87470952

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247019418A Pending KR20240105432A (ko) 2022-01-28 2022-01-28 검사 장치 및 막질 검사 방법

Country Status (5)

Country Link
US (1) US20250046569A1 (https=)
JP (1) JP7686797B2 (https=)
KR (1) KR20240105432A (https=)
TW (1) TWI856467B (https=)
WO (1) WO2023145015A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025253595A1 (ja) * 2024-06-06 2025-12-11 株式会社日立ハイテク 光照射装置、計測装置、および荷電粒子線装置
WO2025262940A1 (ja) * 2024-06-21 2025-12-26 株式会社日立ハイテク 荷電粒子線装置および試料観察方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000357483A (ja) 1999-06-11 2000-12-26 Hitachi Ltd 荷電粒子線画像に基づく検査または計測方法およびその装置並びに荷電粒子線装置
JP2006338881A (ja) 2005-05-31 2006-12-14 Hitachi High-Technologies Corp 電子顕微鏡応用装置および試料検査方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11118738A (ja) * 1997-10-14 1999-04-30 Advantest Corp 微小な測定対象物を高速に分析できる分析装置
JP4795883B2 (ja) * 2006-07-21 2011-10-19 株式会社日立ハイテクノロジーズ パターン検査・計測装置
JP2009043960A (ja) * 2007-08-09 2009-02-26 Panasonic Corp 欠陥画像自動収集方法
JP5325522B2 (ja) * 2008-10-15 2013-10-23 株式会社堀場製作所 複合型観察装置
US10410338B2 (en) * 2013-11-04 2019-09-10 Kla-Tencor Corporation Method and system for correlating optical images with scanning electron microscopy images
JP2017535914A (ja) * 2014-09-17 2017-11-30 オルボテック エルティーディーOrbotech Ltd. 検査、テスト、デバッグ、及び表面の改変のための電子ビーム誘導プラズマ(eBIP)の適用
KR102347057B1 (ko) * 2015-08-12 2022-01-03 케이엘에이 코포레이션 전자 빔 이미지에서의 결함 위치 결정
WO2020234987A1 (ja) * 2019-05-21 2020-11-26 株式会社日立ハイテク 荷電粒子線装置
JP7148467B2 (ja) * 2019-08-30 2022-10-05 株式会社日立ハイテク 荷電粒子線装置
WO2022091180A1 (ja) * 2020-10-26 2022-05-05 株式会社日立ハイテク 荷電粒子線装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000357483A (ja) 1999-06-11 2000-12-26 Hitachi Ltd 荷電粒子線画像に基づく検査または計測方法およびその装置並びに荷電粒子線装置
JP2006338881A (ja) 2005-05-31 2006-12-14 Hitachi High-Technologies Corp 電子顕微鏡応用装置および試料検査方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
D. E. Aspnes, "Third-Derivative Modulation Spectroscopy with Low-Field Electroreflectance" Surface Science 37 (1973) 418-442

Also Published As

Publication number Publication date
WO2023145015A1 (ja) 2023-08-03
TWI856467B (zh) 2024-09-21
US20250046569A1 (en) 2025-02-06
TW202331771A (zh) 2023-08-01
JPWO2023145015A1 (https=) 2023-08-03
JP7686797B2 (ja) 2025-06-02

Similar Documents

Publication Publication Date Title
KR101545419B1 (ko) 이물 검출 장치 및 이물 검출 방법
US20140204194A1 (en) Defect observation method and device therefor
JP6998469B2 (ja) 電子線装置
US8586920B2 (en) Charged particle beam apparatus
US4967152A (en) Apparatus including a focused UV light source for non-contact measurement and alteration of electrical properties of conductors
KR20190104628A (ko) 분광 조성 분석을 위한 웨이퍼 파티클 결함들의 활성화
JPH02119236A (ja) 直線状定フォトン束光電圧測定値から少数担体拡散長を判定するための方法および装置
JP2012032239A (ja) 試料検査装置及び試料検査方法
KR20210027064A (ko) 하전 입자선 장치
US12326410B2 (en) Electron spectroscopy based techniques for determining various chemical and electrical characteristics of samples
TWI856467B (zh) 檢查裝置及膜質檢查方法
JP5009506B2 (ja) 試料の1つ又は複数の特性を決定するための方法とシステム
CN116642863A (zh) 一种实时原位的荧光成像显微镜测试系统及方法
US6784425B1 (en) Energy filter multiplexing
CN115003981A (zh) 组合ocd与光反射的方法及系统
CN116952952B (zh) 固体材料中电子点缺陷的探测方法、探测装置和系统
JP2024163060A (ja) 測定されたeelsスペクトル内のイオン化エッジを確認してイオン化エッジの場所を見つける方法
US20230282526A1 (en) Method and device for measuring the thickness of thin films even on rough substrates
JP2001144155A (ja) 半導体解析装置および解析方法
JP6677943B2 (ja) 顕微分光データ測定装置および方法
US7148478B2 (en) Electrical measurements in samples
Lohr et al. Hybrid approach to reconstruct nanoscale grating dimensions using scattering and fluorescence with soft X-rays
JP3361777B2 (ja) マスク検査方法および検査装置
CN1111728C (zh) 预测量子阱红外探测器响应波长的设备和方法
JP3740530B2 (ja) 全反射局所蛍光x線分析用アライナー

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D21 Rejection of application intended

Free format text: ST27 STATUS EVENT CODE: A-1-2-D10-D21-EXM-PE0902 (AS PROVIDED BY THE NATIONAL OFFICE)

PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11 Administrative time limit extension requested

Free format text: ST27 STATUS EVENT CODE: U-3-3-T10-T11-OTH-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11 Administrative time limit extension requested

Free format text: ST27 STATUS EVENT CODE: U-3-3-T10-T11-OTH-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11 Amendment of application requested

Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P11-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13 Application amended

Free format text: ST27 STATUS EVENT CODE: A-2-2-P10-P13-NAP-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000