JP7686797B2 - 検査装置および膜質検査方法 - Google Patents

検査装置および膜質検査方法 Download PDF

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Publication number
JP7686797B2
JP7686797B2 JP2023576531A JP2023576531A JP7686797B2 JP 7686797 B2 JP7686797 B2 JP 7686797B2 JP 2023576531 A JP2023576531 A JP 2023576531A JP 2023576531 A JP2023576531 A JP 2023576531A JP 7686797 B2 JP7686797 B2 JP 7686797B2
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Japan
Prior art keywords
sample
light
signal
charged particle
control electrode
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Japanese (ja)
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JPWO2023145015A1 (https=
Inventor
保宏 白崎
美南 内保
一史 谷内
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Hitachi High Tech Corp
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Hitachi High Tech Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H01J37/224—Luminescent screens or photographic plates for imaging; Apparatus specially adapted therefor, e. g. cameras, TV-cameras, photographic equipment or exposure control; Optical subsystems specially adapted therefor, e. g. microscopes for observing image on luminescent screen
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2023576531A 2022-01-28 2022-01-28 検査装置および膜質検査方法 Active JP7686797B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/003391 WO2023145015A1 (ja) 2022-01-28 2022-01-28 検査装置および膜質検査方法

Publications (2)

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JPWO2023145015A1 JPWO2023145015A1 (https=) 2023-08-03
JP7686797B2 true JP7686797B2 (ja) 2025-06-02

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JP2023576531A Active JP7686797B2 (ja) 2022-01-28 2022-01-28 検査装置および膜質検査方法

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US (1) US20250046569A1 (https=)
JP (1) JP7686797B2 (https=)
KR (1) KR20240105432A (https=)
TW (1) TWI856467B (https=)
WO (1) WO2023145015A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025253595A1 (ja) * 2024-06-06 2025-12-11 株式会社日立ハイテク 光照射装置、計測装置、および荷電粒子線装置
WO2025262940A1 (ja) * 2024-06-21 2025-12-26 株式会社日立ハイテク 荷電粒子線装置および試料観察方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000357483A (ja) 1999-06-11 2000-12-26 Hitachi Ltd 荷電粒子線画像に基づく検査または計測方法およびその装置並びに荷電粒子線装置
JP2008027737A (ja) 2006-07-21 2008-02-07 Hitachi High-Technologies Corp パターン検査・計測装置
JP2009043960A (ja) 2007-08-09 2009-02-26 Panasonic Corp 欠陥画像自動収集方法
JP2010097768A (ja) 2008-10-15 2010-04-30 Topcon Corp 複合型観察装置
JP7108788B2 (ja) 2019-05-21 2022-07-28 株式会社日立ハイテク 荷電粒子線装置
JP7377375B2 (ja) 2020-10-26 2023-11-09 株式会社日立ハイテク 荷電粒子線装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11118738A (ja) * 1997-10-14 1999-04-30 Advantest Corp 微小な測定対象物を高速に分析できる分析装置
JP4828162B2 (ja) 2005-05-31 2011-11-30 株式会社日立ハイテクノロジーズ 電子顕微鏡応用装置および試料検査方法
US10410338B2 (en) * 2013-11-04 2019-09-10 Kla-Tencor Corporation Method and system for correlating optical images with scanning electron microscopy images
JP2017535914A (ja) * 2014-09-17 2017-11-30 オルボテック エルティーディーＯｒｂｏｔｅｃｈ Ｌｔｄ． 検査、テスト、デバッグ、及び表面の改変のための電子ビーム誘導プラズマ（ｅＢＩＰ）の適用
KR102347057B1 (ko) * 2015-08-12 2022-01-03 케이엘에이 코포레이션 전자 빔 이미지에서의 결함 위치 결정
JP7148467B2 (ja) * 2019-08-30 2022-10-05 株式会社日立ハイテク 荷電粒子線装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000357483A (ja) 1999-06-11 2000-12-26 Hitachi Ltd 荷電粒子線画像に基づく検査または計測方法およびその装置並びに荷電粒子線装置
JP2008027737A (ja) 2006-07-21 2008-02-07 Hitachi High-Technologies Corp パターン検査・計測装置
JP2009043960A (ja) 2007-08-09 2009-02-26 Panasonic Corp 欠陥画像自動収集方法
JP2010097768A (ja) 2008-10-15 2010-04-30 Topcon Corp 複合型観察装置
JP7108788B2 (ja) 2019-05-21 2022-07-28 株式会社日立ハイテク 荷電粒子線装置
JP7377375B2 (ja) 2020-10-26 2023-11-09 株式会社日立ハイテク 荷電粒子線装置

Also Published As

Publication number Publication date
WO2023145015A1 (ja) 2023-08-03
TWI856467B (zh) 2024-09-21
US20250046569A1 (en) 2025-02-06
TW202331771A (zh) 2023-08-01
JPWO2023145015A1 (https=) 2023-08-03
KR20240105432A (ko) 2024-07-05

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