JPWO2023145015A1 - - Google Patents
Info
- Publication number
- JPWO2023145015A1 JPWO2023145015A1 JP2023576531A JP2023576531A JPWO2023145015A1 JP WO2023145015 A1 JPWO2023145015 A1 JP WO2023145015A1 JP 2023576531 A JP2023576531 A JP 2023576531A JP 2023576531 A JP2023576531 A JP 2023576531A JP WO2023145015 A1 JPWO2023145015 A1 JP WO2023145015A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
- H01J37/224—Luminescent screens or photographic plates for imaging; Apparatus specially adapted therefor, e. g. cameras, TV-cameras, photographic equipment or exposure control; Optical subsystems specially adapted therefor, e. g. microscopes for observing image on luminescent screen
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2022/003391 WO2023145015A1 (ja) | 2022-01-28 | 2022-01-28 | 検査装置および膜質検査方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2023145015A1 true JPWO2023145015A1 (https=) | 2023-08-03 |
| JP7686797B2 JP7686797B2 (ja) | 2025-06-02 |
Family
ID=87470952
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023576531A Active JP7686797B2 (ja) | 2022-01-28 | 2022-01-28 | 検査装置および膜質検査方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20250046569A1 (https=) |
| JP (1) | JP7686797B2 (https=) |
| KR (1) | KR20240105432A (https=) |
| TW (1) | TWI856467B (https=) |
| WO (1) | WO2023145015A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2025253595A1 (ja) * | 2024-06-06 | 2025-12-11 | 株式会社日立ハイテク | 光照射装置、計測装置、および荷電粒子線装置 |
| WO2025262940A1 (ja) * | 2024-06-21 | 2025-12-26 | 株式会社日立ハイテク | 荷電粒子線装置および試料観察方法 |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11118738A (ja) * | 1997-10-14 | 1999-04-30 | Advantest Corp | 微小な測定対象物を高速に分析できる分析装置 |
| JP2000357483A (ja) * | 1999-06-11 | 2000-12-26 | Hitachi Ltd | 荷電粒子線画像に基づく検査または計測方法およびその装置並びに荷電粒子線装置 |
| JP2008027737A (ja) * | 2006-07-21 | 2008-02-07 | Hitachi High-Technologies Corp | パターン検査・計測装置 |
| JP2009043960A (ja) * | 2007-08-09 | 2009-02-26 | Panasonic Corp | 欠陥画像自動収集方法 |
| JP2010097768A (ja) * | 2008-10-15 | 2010-04-30 | Topcon Corp | 複合型観察装置 |
| US20150125065A1 (en) * | 2013-11-04 | 2015-05-07 | Kla-Tencor Corporation | Method and System for Correlating Optical Images with Scanning Electron Microscopy Images |
| US20170047195A1 (en) * | 2015-08-12 | 2017-02-16 | Kla-Tencor Corporation | Determining a Position of a Defect in an Electron Beam Image |
| JP2017535914A (ja) * | 2014-09-17 | 2017-11-30 | オルボテック エルティーディーＯｒｂｏｔｅｃｈ Ｌｔｄ． | 検査、テスト、デバッグ、及び表面の改変のための電子ビーム誘導プラズマ（ｅＢＩＰ）の適用 |
| JP7108788B2 (ja) * | 2019-05-21 | 2022-07-28 | 株式会社日立ハイテク | 荷電粒子線装置 |
| JP7377375B2 (ja) * | 2020-10-26 | 2023-11-09 | 株式会社日立ハイテク | 荷電粒子線装置 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4828162B2 (ja) | 2005-05-31 | 2011-11-30 | 株式会社日立ハイテクノロジーズ | 電子顕微鏡応用装置および試料検査方法 |
| JP7148467B2 (ja) * | 2019-08-30 | 2022-10-05 | 株式会社日立ハイテク | 荷電粒子線装置 |
-
2022
- 2022-01-28 WO PCT/JP2022/003391 patent/WO2023145015A1/ja not_active Ceased
- 2022-01-28 US US18/722,800 patent/US20250046569A1/en active Pending
- 2022-01-28 JP JP2023576531A patent/JP7686797B2/ja active Active
- 2022-01-28 KR KR1020247019418A patent/KR20240105432A/ko active Pending
- 2022-12-28 TW TW111150350A patent/TWI856467B/zh active
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11118738A (ja) * | 1997-10-14 | 1999-04-30 | Advantest Corp | 微小な測定対象物を高速に分析できる分析装置 |
| JP2000357483A (ja) * | 1999-06-11 | 2000-12-26 | Hitachi Ltd | 荷電粒子線画像に基づく検査または計測方法およびその装置並びに荷電粒子線装置 |
| JP2008027737A (ja) * | 2006-07-21 | 2008-02-07 | Hitachi High-Technologies Corp | パターン検査・計測装置 |
| JP2009043960A (ja) * | 2007-08-09 | 2009-02-26 | Panasonic Corp | 欠陥画像自動収集方法 |
| JP2010097768A (ja) * | 2008-10-15 | 2010-04-30 | Topcon Corp | 複合型観察装置 |
| US20150125065A1 (en) * | 2013-11-04 | 2015-05-07 | Kla-Tencor Corporation | Method and System for Correlating Optical Images with Scanning Electron Microscopy Images |
| JP2017535914A (ja) * | 2014-09-17 | 2017-11-30 | オルボテック エルティーディーＯｒｂｏｔｅｃｈ Ｌｔｄ． | 検査、テスト、デバッグ、及び表面の改変のための電子ビーム誘導プラズマ（ｅＢＩＰ）の適用 |
| US20170047195A1 (en) * | 2015-08-12 | 2017-02-16 | Kla-Tencor Corporation | Determining a Position of a Defect in an Electron Beam Image |
| JP7108788B2 (ja) * | 2019-05-21 | 2022-07-28 | 株式会社日立ハイテク | 荷電粒子線装置 |
| JP7377375B2 (ja) * | 2020-10-26 | 2023-11-09 | 株式会社日立ハイテク | 荷電粒子線装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2023145015A1 (ja) | 2023-08-03 |
| TWI856467B (zh) | 2024-09-21 |
| US20250046569A1 (en) | 2025-02-06 |
| TW202331771A (zh) | 2023-08-01 |
| KR20240105432A (ko) | 2024-07-05 |
| JP7686797B2 (ja) | 2025-06-02 |
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