KR20240063867A - 감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자, 및 화상 표시 장치 - Google Patents

감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자, 및 화상 표시 장치 Download PDF

Info

Publication number
KR20240063867A
KR20240063867A KR1020247005934A KR20247005934A KR20240063867A KR 20240063867 A KR20240063867 A KR 20240063867A KR 1020247005934 A KR1020247005934 A KR 1020247005934A KR 20247005934 A KR20247005934 A KR 20247005934A KR 20240063867 A KR20240063867 A KR 20240063867A
Authority
KR
South Korea
Prior art keywords
group
preferable
mass
less
monomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247005934A
Other languages
English (en)
Korean (ko)
Inventor
에리코 도시미츠
아스카 기무라
요시히데 사토
히사토시 구라
Original Assignee
미쯔비시 케미컬 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미쯔비시 케미컬 주식회사 filed Critical 미쯔비시 케미컬 주식회사
Publication of KR20240063867A publication Critical patent/KR20240063867A/ko
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020247005934A 2021-10-01 2022-09-29 감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자, 및 화상 표시 장치 Pending KR20240063867A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2021-162453 2021-10-01
JP2021162453 2021-10-01
PCT/JP2022/036476 WO2023054597A1 (ja) 2021-10-01 2022-09-29 感光性樹脂組成物、硬化物、隔壁、有機電界発光素子、及び画像表示装置

Publications (1)

Publication Number Publication Date
KR20240063867A true KR20240063867A (ko) 2024-05-10

Family

ID=85782912

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247005934A Pending KR20240063867A (ko) 2021-10-01 2022-09-29 감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자, 및 화상 표시 장치

Country Status (5)

Country Link
JP (1) JPWO2023054597A1 (https=)
KR (1) KR20240063867A (https=)
CN (1) CN118020026A (https=)
TW (1) TW202323307A (https=)
WO (1) WO2023054597A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024190597A1 (ja) * 2023-03-10 2024-09-19 セントラル硝子株式会社 硬化性樹脂材料、撥液剤組成物、感光性樹脂組成物及び隔壁材料

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011089052A (ja) 2009-10-23 2011-05-06 Dic Corp 含フッ素硬化性樹脂、活性エネルギー線硬化型塗料組成物及びその硬化物
WO2019146680A1 (ja) 2018-01-26 2019-08-01 三菱ケミカル株式会社 感光性樹脂組成物、隔壁、有機電界発光素子、画像表示装置及び照明

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050071978A (ko) * 2004-01-05 2005-07-08 주식회사 동진쎄미켐 ＫｒＦ 포토레지스트용 유기 반사 방지막 조성물
JP2011099974A (ja) * 2009-11-05 2011-05-19 Fujifilm Corp 着色感光性組成物、カラーフィルタ、及び液晶表示装置
JP5606868B2 (ja) * 2010-10-22 2014-10-15 富士フイルム株式会社 光重合性組成物、カラーフィルタ、その製造方法、及び、固体撮像素子
JP2017207532A (ja) * 2016-05-16 2017-11-24 東洋合成工業株式会社 レジスト組成物及びそれを用いたデバイスの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011089052A (ja) 2009-10-23 2011-05-06 Dic Corp 含フッ素硬化性樹脂、活性エネルギー線硬化型塗料組成物及びその硬化物
WO2019146680A1 (ja) 2018-01-26 2019-08-01 三菱ケミカル株式会社 感光性樹脂組成物、隔壁、有機電界発光素子、画像表示装置及び照明

Also Published As

Publication number Publication date
CN118020026A (zh) 2024-05-10
WO2023054597A1 (ja) 2023-04-06
JPWO2023054597A1 (https=) 2023-04-06
TW202323307A (zh) 2023-06-16

Similar Documents

Publication Publication Date Title
JP7294146B2 (ja) 着色感光性樹脂組成物、隔壁、有機電界発光素子、画像表示装置及び照明
JP7205089B2 (ja) 感光性樹脂組成物、隔壁、有機電界発光素子、画像表示装置及び照明
JP7099319B2 (ja) 有機電界発光素子隔壁形成用感光性樹脂組成物、隔壁、有機電界発光素子、画像表示装置及び照明
CN111566560B (zh) 感光性树脂组合物、间隔壁、有机场致发光元件、图像显示装置及照明
KR20230142473A (ko) 감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광소자, 컬러 필터 및 화상 표시 장치
JP6183044B2 (ja) 硬化性組成物、硬化膜及び表示素子
JP7040089B2 (ja) 隔壁形成用感光性樹脂組成物、隔壁、有機電界発光素子、画像表示装置及び照明
KR20240063867A (ko) 감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자, 및 화상 표시 장치
WO2022264909A1 (ja) 感光性樹脂組成物、硬化物、隔壁、有機電界発光素子、カラーフィルター、画像表示装置、及び硬化物の形成方法
KR102820135B1 (ko) 감광성 수지 조성물, 격벽, 유기 전계 발광 소자, 및 화상 표시 장치
JP7236209B2 (ja) 隔壁形成用感光性樹脂組成物、隔壁、有機電界発光素子、画像表示装置及び照明
TWI918892B (zh) 著色感光性樹脂組合物、硬化物、阻隔壁、有機電致發光元件、包含發光性奈米結晶粒子之彩色濾光器及圖像顯示裝置
WO2025187597A1 (ja) 感光性樹脂組成物、硬化物、隔壁、有機電界発光素子、及び画像表示装置
KR20230164671A (ko) 착색 감광성 수지 조성물, 경화물, 격벽, 유기 전계 발광 소자, 발광성 나노 결정 입자를 포함하는 컬러 필터 및 화상 표시 장치
WO2025192335A1 (ja) 感光性樹脂組成物、硬化物、隔壁、有機電界発光素子、カラーフィルター、画像表示装置、及び硬化物の形成方法
WO2025084352A1 (ja) 感光性着色組成物、硬化物、隔壁、有機電界発光素子、カラーフィルター、及び画像表示装置
KR20230166082A (ko) 착색 감광성 수지 조성물, 경화물, 격벽, 컬러 필터 및 화상 표시 장치
KR20240167819A (ko) 화합물, 중합성 조성물, 경화물, 컬러 필터, 격벽 및 화상 표시 장치
CN117136333A (zh) 着色感光性树脂组合物、固化物、间隔壁、滤色片及图像显示装置
JP2018018036A (ja) 隔壁形成用感光性樹脂組成物、隔壁、有機電界発光素子、画像表示装置及び照明

Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20240221

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application