KR20240021190A - 자성 적층막 및 자기 저항 효과 소자 - Google Patents

자성 적층막 및 자기 저항 효과 소자 Download PDF

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Publication number
KR20240021190A
KR20240021190A KR1020237044389A KR20237044389A KR20240021190A KR 20240021190 A KR20240021190 A KR 20240021190A KR 1020237044389 A KR1020237044389 A KR 1020237044389A KR 20237044389 A KR20237044389 A KR 20237044389A KR 20240021190 A KR20240021190 A KR 20240021190A
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KR
South Korea
Prior art keywords
layer
magnetic
ferromagnetic
laminated film
ferromagnetic layer
Prior art date
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Pending
Application number
KR1020237044389A
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English (en)
Korean (ko)
Inventor
요시아키 사이토
데쓰오 엔도
쇼지 이케다
Original Assignee
고쿠리츠다이가쿠호진 도호쿠다이가쿠
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 고쿠리츠다이가쿠호진 도호쿠다이가쿠 filed Critical 고쿠리츠다이가쿠호진 도호쿠다이가쿠
Publication of KR20240021190A publication Critical patent/KR20240021190A/ko
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/10Magnetoresistive devices
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/161Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/165Auxiliary circuits
    • G11C11/1673Reading or sensing circuits or methods
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/165Auxiliary circuits
    • G11C11/1675Writing or programming circuits or methods
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B61/00Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B61/00Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
    • H10B61/20Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B61/00Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
    • H10B61/20Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors
    • H10B61/22Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors of the field-effect transistor [FET] type
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/40Devices controlled by magnetic fields
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/80Constructional details
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/80Constructional details
    • H10N50/85Materials of the active region
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N52/00Hall-effect devices
    • H10N52/80Constructional details
    • H10N52/85Materials of the active region

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Hall/Mr Elements (AREA)
  • Thin Magnetic Films (AREA)
KR1020237044389A 2021-06-15 2022-06-15 자성 적층막 및 자기 저항 효과 소자 Pending KR20240021190A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2021-099796 2021-06-15
JP2021099796 2021-06-15
PCT/JP2022/024040 WO2022265058A1 (ja) 2021-06-15 2022-06-15 磁性積層膜及び磁気抵抗効果素子

Publications (1)

Publication Number Publication Date
KR20240021190A true KR20240021190A (ko) 2024-02-16

Family

ID=84527559

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237044389A Pending KR20240021190A (ko) 2021-06-15 2022-06-15 자성 적층막 및 자기 저항 효과 소자

Country Status (5)

Country Link
US (1) US20250031581A1 (https=)
JP (1) JPWO2022265058A1 (https=)
KR (1) KR20240021190A (https=)
CN (1) CN117480619A (https=)
WO (1) WO2022265058A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240321333A1 (en) * 2023-03-24 2024-09-26 Samsung Electronics Co., Ltd. Magnetic tunneling junction device capable of magnetic switching without external magnetic field and memory device including the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016021468A1 (ja) 2014-08-08 2016-02-11 国立大学法人東北大学 磁気抵抗効果素子、及び磁気メモリ装置
WO2016159017A1 (ja) 2015-03-31 2016-10-06 国立大学法人東北大学 磁気抵抗効果素子、磁気メモリ装置、製造方法、動作方法、及び集積回路
WO2019159962A1 (ja) 2018-02-13 2019-08-22 国立大学法人東北大学 磁気抵抗効果素子及び磁気メモリ

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9245608B2 (en) * 2011-09-22 2016-01-26 Qualcomm Incorporated Thermally tolerant perpendicular magnetic anisotropy coupled elements for spin-transfer torque switching device
US10461242B2 (en) * 2017-12-30 2019-10-29 Spin Memory, Inc. Antiferromagnetic exchange coupling enhancement in perpendicular magnetic tunnel junction stacks for magnetic random access memory applications
WO2019155957A1 (ja) * 2018-02-06 2019-08-15 国立大学法人東北大学 磁気抵抗効果素子、回路装置及び回路ユニット
JP7211252B2 (ja) * 2018-05-16 2023-01-24 Tdk株式会社 スピン軌道トルク型磁化回転素子、スピン軌道トルク型磁気抵抗効果素子及び磁気メモリ

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016021468A1 (ja) 2014-08-08 2016-02-11 国立大学法人東北大学 磁気抵抗効果素子、及び磁気メモリ装置
WO2016159017A1 (ja) 2015-03-31 2016-10-06 国立大学法人東北大学 磁気抵抗効果素子、磁気メモリ装置、製造方法、動作方法、及び集積回路
WO2019159962A1 (ja) 2018-02-13 2019-08-22 国立大学法人東北大学 磁気抵抗効果素子及び磁気メモリ

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Nature Materials, volume 10, pp.347-351(2011)

Also Published As

Publication number Publication date
JPWO2022265058A1 (https=) 2022-12-22
US20250031581A1 (en) 2025-01-23
CN117480619A (zh) 2024-01-30
WO2022265058A1 (ja) 2022-12-22

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