KR20230063321A - 기화 장치, 기화 장치의 제어 방법, 기화 장치용 프로그램의 기억 매체, 및 유체 제어 장치 - Google Patents

기화 장치, 기화 장치의 제어 방법, 기화 장치용 프로그램의 기억 매체, 및 유체 제어 장치 Download PDF

Info

Publication number
KR20230063321A
KR20230063321A KR1020220139087A KR20220139087A KR20230063321A KR 20230063321 A KR20230063321 A KR 20230063321A KR 1020220139087 A KR1020220139087 A KR 1020220139087A KR 20220139087 A KR20220139087 A KR 20220139087A KR 20230063321 A KR20230063321 A KR 20230063321A
Authority
KR
South Korea
Prior art keywords
integral gain
flow rate
control
liquid material
control valve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020220139087A
Other languages
English (en)
Korean (ko)
Inventor
히데타카 야다
유이치로 아사우미
Original Assignee
가부시키가이샤 호리바 에스텍
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 호리바 에스텍 filed Critical 가부시키가이샤 호리바 에스텍
Publication of KR20230063321A publication Critical patent/KR20230063321A/ko
Pending legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
    • B05B12/08—Arrangements for controlling delivery; Arrangements for controlling the spray area responsive to condition of liquid or other fluent material to be discharged, of ambient medium or of target ; responsive to condition of spray devices or of supply means, e.g. pipes, pumps or their drive means
    • B05B12/085—Arrangements for controlling delivery; Arrangements for controlling the spray area responsive to condition of liquid or other fluent material to be discharged, of ambient medium or of target ; responsive to condition of spray devices or of supply means, e.g. pipes, pumps or their drive means responsive to flow or pressure of liquid or other fluent material to be discharged
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/30—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to control volume of flow, e.g. with adjustable passages
    • B05B1/3013—Lift valves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02—Spray pistols; Apparatus for discharge
    • B05B7/04—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge
    • B05B7/0416—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid
    • B05B7/0483—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with gas and liquid jets intersecting in the mixing chamber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02—Spray pistols; Apparatus for discharge
    • B05B7/12—Spray pistols; Apparatus for discharge designed to control volume of flow, e.g. with adjustable passages
    • B05B7/1209—Spray pistols; Apparatus for discharge designed to control volume of flow, e.g. with adjustable passages the controlling means for each liquid or other fluent material being manual and interdependent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/16—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
    • B05B7/1686—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed involving vaporisation of the material to be sprayed or of an atomising-fluid-generating product
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B11/00—Automatic controllers
    • G05B11/01—Automatic controllers electric
    • G05B11/36—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential
    • G05B11/40—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential for obtaining an integral characteristic
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B11/00—Automatic controllers
    • G05B11/01—Automatic controllers electric
    • G05B11/36—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential
    • G05B11/42—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential for obtaining a characteristic which is both proportional and time-dependent, e.g. P. I., P. I. D.
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0623—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the set value given to the control element

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Flow Control (AREA)
  • Feedback Control In General (AREA)
KR1020220139087A 2021-11-01 2022-10-26 기화 장치, 기화 장치의 제어 방법, 기화 장치용 프로그램의 기억 매체, 및 유체 제어 장치 Pending KR20230063321A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021178560 2021-11-01
JPJP-P-2021-178560 2021-11-01

Publications (1)

Publication Number Publication Date
KR20230063321A true KR20230063321A (ko) 2023-05-09

Family

ID=86146629

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020220139087A Pending KR20230063321A (ko) 2021-11-01 2022-10-26 기화 장치, 기화 장치의 제어 방법, 기화 장치용 프로그램의 기억 매체, 및 유체 제어 장치

Country Status (5)

Country Link
US (1) US12399513B2 (cg-RX-API-DMAC7.html)
JP (1) JP7811165B2 (cg-RX-API-DMAC7.html)
KR (1) KR20230063321A (cg-RX-API-DMAC7.html)
CN (1) CN116069070A (cg-RX-API-DMAC7.html)
TW (1) TW202320172A (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119536102A (zh) * 2025-01-21 2025-02-28 常州高凯电子有限公司 对温度波动不敏感的阀门控制方法、控制器及汽化装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2025003021A (ja) * 2023-06-23 2025-01-09 サーパス工業株式会社 流量調整装置および流量調整装置の制御方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001156055A (ja) 1999-09-14 2001-06-08 Stec Inc 液体材料気化方法および装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8015870B2 (en) * 2007-01-26 2011-09-13 Horiba Stec, Co., Ltd. Flowmeter for measuring a flow rate using a heat exchange principle
CN101903561B (zh) * 2007-12-19 2012-08-22 株式会社堀场Stec 液体材料气化装置
US7905139B2 (en) * 2008-08-25 2011-03-15 Brooks Instrument, Llc Mass flow controller with improved dynamic
US8265795B2 (en) * 2009-11-05 2012-09-11 Horiba Stec, Co., Ltd. Mass flow controller
JP5548292B1 (ja) * 2013-05-30 2014-07-16 株式会社堀場エステック 加熱気化システムおよび加熱気化方法
JP6675865B2 (ja) * 2015-12-11 2020-04-08 株式会社堀場エステック 液体材料気化装置
JP6879782B2 (ja) * 2017-03-06 2021-06-02 株式会社堀場エステック 流体制御装置及び流体制御装置用プログラム
JP7421318B2 (ja) * 2019-11-27 2024-01-24 株式会社堀場エステック 液体材料気化装置、液体材料気化装置の制御方法、及び、液体材料気化装置用プログラム

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001156055A (ja) 1999-09-14 2001-06-08 Stec Inc 液体材料気化方法および装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN119536102A (zh) * 2025-01-21 2025-02-28 常州高凯电子有限公司 对温度波动不敏感的阀门控制方法、控制器及汽化装置

Also Published As

Publication number Publication date
US12399513B2 (en) 2025-08-26
JP2023067758A (ja) 2023-05-16
JP7811165B2 (ja) 2026-02-04
TW202320172A (zh) 2023-05-16
CN116069070A (zh) 2023-05-05
US20230137252A1 (en) 2023-05-04

Similar Documents

Publication Publication Date Title
JP4978928B2 (ja) 温度制御装置
JP5172615B2 (ja) 温度制御装置
CN110382103B (zh) 液体材料汽化供给装置和计算机可读存储介质
CN108570659B (zh) 气体控制系统、成膜装置、存储介质和气体控制方法
JP5868796B2 (ja) 圧力制御装置、流量制御装置、及び、圧力制御装置用プログラム、流量制御装置用プログラム
JP6423792B2 (ja) 流量制御装置及び流量制御プログラム
US10705545B2 (en) Fluid control device and flow rate ratio control device
JP5350824B2 (ja) 液体材料の気化供給システム
KR20140056039A (ko) 유체제어장치
JP7811165B2 (ja) 気化装置、気化装置の制御方法、気化装置用プログラム、及び、流体制御装置
KR20120075378A (ko) 재료가스 제어장치, 재료가스 제어 방법, 재료가스 제어 프로그램 및 재료가스 제어 시스템
JP7068062B2 (ja) 流体制御装置、及び、流量比率制御装置
JP2020013269A (ja) 流量制御装置
US10705544B2 (en) Fluid control unit and program storage media for fluid control unit
US20220163983A1 (en) Fluid control apparatus, fluid control method, and program recording medium in which program for fluid control apparatus is recorded
KR20220027020A (ko) 원료 기화 시스템, 및 이것에 이용되는 농도 제어 모듈
JP2014224307A (ja) 材料ガス濃度制御システム、材料ガス濃度制御装置、及び、制御プログラム
JPWO2017043648A1 (ja) 質量流量制御装置
JP2018059667A (ja) 内部循環型給湯システム
JP7699797B2 (ja) ガス供給システムおよびガス供給方法
JP4957273B2 (ja) 蒸気供給装置
JP2019105338A (ja) 流体制御装置及び流体制御装置用プログラム
JP6681423B2 (ja) 液化ガス気化装置の運転方法
KR100805040B1 (ko) 가변 비례대를 도입한 보일러의 분산형 중유 공급제어방법
CN120653024A (zh) 流体控制装置、流体控制装置用控制单元、流体控制方法和存储介质

Legal Events

Date Code Title Description
PA0109 Patent application

Patent event code: PA01091R01D

Comment text: Patent Application

Patent event date: 20221026

PG1501 Laying open of application