KR20220136416A - 반도체 소자 및 반도체 장치 - Google Patents

반도체 소자 및 반도체 장치 Download PDF

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Publication number
KR20220136416A
KR20220136416A KR1020227030569A KR20227030569A KR20220136416A KR 20220136416 A KR20220136416 A KR 20220136416A KR 1020227030569 A KR1020227030569 A KR 1020227030569A KR 20227030569 A KR20227030569 A KR 20227030569A KR 20220136416 A KR20220136416 A KR 20220136416A
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South Korea
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semiconductor
semiconductor device
oxide
layer
substrate
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KR1020227030569A
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Korean (ko)
Inventor
유스케 마츠바라
오사무 이마후지
히로유키 안도
히데키 타케하라
타카시 시노헤
미츠루 오키가와
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가부시키가이샤 플로스피아
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    • H01L29/872—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00—Diodes
    • H10D8/60—Schottky-barrier diodes 
    • H01L23/12—
    • H01L23/36—
    • H01L23/495—
    • H01L29/47—
    • H01L29/66969—
    • H01L29/7869—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/674—Thin-film transistors [TFT] characterised by the active materials
    • H10D30/6755—Oxide semiconductors, e.g. zinc oxide, copper aluminium oxide or cadmium stannate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/875—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being semiconductor metal oxide, e.g. InGaZnO
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/011—Manufacture or treatment of electrodes ohmically coupled to a semiconductor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/64—Electrodes comprising a Schottky barrier to a semiconductor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00—Subject matter not provided for in other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W40/00—Arrangements for thermal protection or thermal control
    • H10W40/10—Arrangements for heating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/40—Leadframes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/65—Lateral DMOS [LDMOS] FETs
    • H10D30/657—Lateral DMOS [LDMOS] FETs having substrates comprising insulating layers, e.g. SOI-LDMOS transistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/117—Shapes of semiconductor bodies
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/111—Field plates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W40/00—Arrangements for thermal protection or thermal control
    • H10W40/40—Arrangements for thermal protection or thermal control involving heat exchange by flowing fluids
    • H10W40/47—Arrangements for thermal protection or thermal control involving heat exchange by flowing fluids by flowing liquids, e.g. forced water cooling
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/40—Leadframes
    • H10W70/461—Leadframes specially adapted for cooling
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/40—Leadframes
    • H10W70/481—Leadframes for devices being provided for in groups H10D8/00 - H10D48/00
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/851—Dispositions of multiple connectors or interconnections
    • H10W72/853—On the same surface
    • H10W72/871—Bond wires and strap connectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/756—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/761—Package configurations characterised by the relative positions of pads or connectors relative to package parts of strap connectors
    • H10W90/763—Package configurations characterised by the relative positions of pads or connectors relative to package parts of strap connectors between laterally-adjacent chips
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/811—Multiple chips on leadframes

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  • Electrodes Of Semiconductors (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Bipolar Transistors (AREA)
KR1020227030569A 2020-02-07 2021-02-05 반도체 소자 및 반도체 장치 Ceased KR20220136416A (ko)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2020019326 2020-02-07
JPJP-P-2020-019329 2020-02-07
JPJP-P-2020-019328 2020-02-07
JPJP-P-2020-019326 2020-02-07
JP2020019328 2020-02-07
JP2020019329 2020-02-07
PCT/JP2021/004412 WO2021157720A1 (ja) 2020-02-07 2021-02-05 半導体素子および半導体装置

Publications (1)

Publication Number Publication Date
KR20220136416A true KR20220136416A (ko) 2022-10-07

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KR1020227030569A Ceased KR20220136416A (ko) 2020-02-07 2021-02-05 반도체 소자 및 반도체 장치

Country Status (6)

Country Link
US (1) US12453108B2 (https=)
JP (1) JP7807628B2 (https=)
KR (1) KR20220136416A (https=)
CN (1) CN115053354A (https=)
TW (1) TW202147529A (https=)
WO (1) WO2021157720A1 (https=)

Families Citing this family (5)

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Publication number Priority date Publication date Assignee Title
CN116982153A (zh) * 2021-03-17 2023-10-31 三菱电机株式会社 半导体装置以及半导体装置的制造方法
CN118743031A (zh) * 2022-01-31 2024-10-01 株式会社Flosfia 层叠结构体、半导体元件和半导体装置
CN118613921A (zh) * 2022-01-31 2024-09-06 株式会社Flosfia 层叠结构体、半导体元件和半导体装置
US12469763B2 (en) * 2022-08-19 2025-11-11 Taiwan Semiconductor Manufacturing Co., Ltd. Package with improved heat dissipation efficiency and method for forming the same
DE102022004377A1 (de) * 2022-11-23 2024-05-23 Azur Space Solar Power Gmbh Diodenanordnung

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005260101A (ja) 2004-03-12 2005-09-22 Univ Waseda Ｇａ２Ｏ３系半導体素子
JP2009081468A (ja) 2009-01-19 2009-04-16 Univ Waseda Ｇａ２Ｏ３系半導体素子及びＧａ２Ｏ３系半導体素子の製造方法
JP2013012760A (ja) 2012-08-23 2013-01-17 Waseda Univ Ｇａ２Ｏ３系半導体素子

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Publication number Priority date Publication date Assignee Title
JP4631681B2 (ja) 2005-12-05 2011-02-16 日立電線株式会社 窒化物系半導体基板及び半導体装置
JP4910889B2 (ja) * 2007-05-31 2012-04-04 株式会社デンソー 半導体装置
CN101978517A (zh) * 2008-03-19 2011-02-16 史泰克公司 金属芯热电冷却和动力产生装置
CN102473599B (zh) * 2010-05-18 2014-08-20 松下电器产业株式会社 半导体芯片及其制造方法
TW201438078A (zh) 2013-03-18 2014-10-01 聖太科技有限公司 晶圓製程的切割方法
JP6647521B2 (ja) * 2014-10-09 2020-02-14 株式会社Flosfia 導電性積層構造体の製造方法
CN107068773B (zh) * 2015-12-18 2021-06-01 株式会社Flosfia 半导体装置
JP6906217B2 (ja) * 2015-12-18 2021-07-21 株式会社Flosfia 半導体装置
TWI726964B (zh) * 2015-12-25 2021-05-11 日商出光興產股份有限公司 積層體
JP6976858B2 (ja) 2015-12-25 2021-12-08 出光興産株式会社 積層体
JP2017118014A (ja) * 2015-12-25 2017-06-29 出光興産株式会社 積層体、半導体素子及び電気機器
CN106997873A (zh) * 2016-10-27 2017-08-01 上海大学 一种封装结构及封装方法
JP7163631B2 (ja) * 2017-07-05 2022-11-01 三菱マテリアル株式会社 熱電変換モジュール、及び、熱電変換モジュールの製造方法
JP7315137B2 (ja) * 2018-12-26 2023-07-26 株式会社Flosfia 結晶性酸化物膜
JP7530615B2 (ja) * 2020-01-10 2024-08-08 株式会社Flosfia 結晶、半導体素子および半導体装置

Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
JP2005260101A (ja) 2004-03-12 2005-09-22 Univ Waseda Ｇａ２Ｏ３系半導体素子
JP2009081468A (ja) 2009-01-19 2009-04-16 Univ Waseda Ｇａ２Ｏ３系半導体素子及びＧａ２Ｏ３系半導体素子の製造方法
JP2013012760A (ja) 2012-08-23 2013-01-17 Waseda Univ Ｇａ２Ｏ３系半導体素子

Non-Patent Citations (2)

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Title
Jun Liang Zhao et al, "UV and Visible Electroluminescence From a Sn:Ga2O3/n+-Si Heterojunction by Metal-Organic Chemical Vapor Deposition", IEEE TRANSACTIONS ON ELECTRON DEVICES, VOL. 58, NO.5 MAY 2011
Kohei Sasaki et al, "Si-Ion Implantation Doping in β-Ga2O3 and Its Application to Fabrication of Low-Resistance Ohmic Contacts", Applied Physics Express 6 (2013) 086502

Also Published As

Publication number Publication date
TW202147529A (zh) 2021-12-16
US20220384663A1 (en) 2022-12-01
WO2021157720A1 (ja) 2021-08-12
US12453108B2 (en) 2025-10-21
JP7807628B2 (ja) 2026-01-28
JPWO2021157720A1 (https=) 2021-08-12
CN115053354A (zh) 2022-09-13

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