KR20220107217A - 비-티올 질소 기반 소수성 중합체 브러시 재료 및 기판 표면 개질을 위한 이의 용도 - Google Patents

비-티올 질소 기반 소수성 중합체 브러시 재료 및 기판 표면 개질을 위한 이의 용도 Download PDF

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KR20220107217A
KR20220107217A KR1020227020820A KR20227020820A KR20220107217A KR 20220107217 A KR20220107217 A KR 20220107217A KR 1020227020820 A KR1020227020820 A KR 1020227020820A KR 20227020820 A KR20227020820 A KR 20227020820A KR 20220107217 A KR20220107217 A KR 20220107217A
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alkyl
alkylene
linear
cyclic
branched
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Korean (ko)
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두라이라즈 바스카란
엠디 에스 라만
사친 보베이드
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메르크 파텐트 게엠베하
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    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02Monomers containing only one unsaturated aliphatic radical
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    • C08F120/00Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F120/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
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    • C08F212/04Monomers containing only one unsaturated aliphatic radical containing one ring
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    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
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    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
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    • C08F297/00Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer
    • C08F297/02Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type
    • C08F297/026Macromolecular compounds obtained by successively polymerising different monomer systems using a catalyst of the ionic or coordination type without deactivating the intermediate polymer using a catalyst of the anionic type polymerising acrylic acid, methacrylic acid or derivatives thereof
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    • C08F8/00Chemical modification by after-treatment
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    • C09D125/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
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    • C09D125/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
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    • C09D133/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
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    • C09D133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
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    • C09D133/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
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    • C09D153/00Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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    • C08F8/00Chemical modification by after-treatment
    • C08F8/30Introducing nitrogen atoms or nitrogen-containing groups

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  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
KR1020227020820A 2019-11-26 2020-11-24 비-티올 질소 기반 소수성 중합체 브러시 재료 및 기판 표면 개질을 위한 이의 용도 Pending KR20220107217A (ko)

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Application Number Priority Date Filing Date Title
US201962940378P 2019-11-26 2019-11-26
US62/940,378 2019-11-26
PCT/EP2020/083135 WO2021105086A1 (en) 2019-11-26 2020-11-24 Non-thiol nitrogen based hydrophobic polymer brush materials and use thereof for modification of substrate surfaces

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KR20220107217A true KR20220107217A (ko) 2022-08-02

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US (1) US12486344B2 (https=)
EP (1) EP4065617A1 (https=)
JP (1) JP7820296B2 (https=)
KR (1) KR20220107217A (https=)
CN (1) CN114729076B (https=)
TW (1) TWI887304B (https=)
WO (1) WO2021105086A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7820296B2 (ja) 2019-11-26 2026-02-25 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング 非チオールタイプ窒素系疎水性ポリマーブラシ材料及び基材表面の改質のためのそれの使用
CN118302461A (zh) * 2021-11-12 2024-07-05 默克专利股份有限公司 用于具有含聚(苯乙烯)和聚(甲基丙烯酸甲酯)链段的嵌段共聚物的自组装的具有可调极性的中性刷
WO2024038035A2 (en) * 2022-08-17 2024-02-22 Merck Patent Gmbh Polymer brushes with chain-ends functionalized with metal coordinating two hetero elements for selective surface modification
CN115819823B (zh) * 2022-11-18 2023-10-27 中国人民解放军海军工程大学 水润滑丁腈橡胶表面高分子刷的制备方法、产品及应用

Family Cites Families (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5512582B1 (https=) 1971-05-28 1980-04-02
JPS51129475A (en) * 1975-03-25 1976-11-11 Toyo Soda Mfg Co Ltd A process for polymerizing monomers
US4104455A (en) 1975-03-25 1978-08-01 Toyo Soda Manufacturing Co., Ltd. Polymerization of monomer
JPS5547036Y2 (https=) 1975-04-08 1980-11-05
JPS5657826A (en) 1979-10-18 1981-05-20 Teijin Ltd Polyether sulfone containing azido group and its preparation
GB2092164B (en) 1980-12-17 1984-12-05 Hitachi Ltd Loght or radiation-sensitive polymer composition
US4656116A (en) 1983-10-12 1987-04-07 Ciba-Geigy Corporation Radiation-sensitive coating composition
JPS61189693A (ja) 1985-02-19 1986-08-23 旭硝子株式会社 電子部品の防湿コ−テイング方法
JPS61254944A (ja) 1985-05-08 1986-11-12 Japan Synthetic Rubber Co Ltd 放射線感応性重合体組成物
US4830953A (en) 1986-08-18 1989-05-16 Ciba-Geigy Corporation Radiation-sensitive coating composition with polyazide and polyimide and process of photo-crosslinking the coating
US5550007A (en) 1993-05-28 1996-08-27 Lucent Technologies Inc. Surface-imaging technique for lithographic processes for device fabrication
JP3687988B2 (ja) 1993-09-03 2005-08-24 日立化成工業株式会社 i線ステッパ用感光性樹脂組成物
WO1995021030A1 (en) 1994-02-07 1995-08-10 The Government Of The United States Of America, Represented By The Secretary Of The Navy Efficient chemistry for selective modification and metallization of substrates
WO1996031805A1 (en) 1995-04-03 1996-10-10 The Dow Chemical Company Photodefineable compositions
US5807937A (en) * 1995-11-15 1998-09-15 Carnegie Mellon University Processes based on atom (or group) transfer radical polymerization and novel (co) polymers having useful structures and properties
US5821456A (en) 1996-05-01 1998-10-13 Motorola, Inc. Microelectronic assembly including a decomposable encapsulant, and method for forming and reworking same
US6582882B2 (en) 2001-04-04 2003-06-24 Kodak Polychrome Graphics Llc Imageable element comprising graft polymer
US6872500B2 (en) 2003-08-26 2005-03-29 Eastman Kodak Company Method of patterning an electroconductive layer on a support
KR101217899B1 (ko) 2003-11-17 2013-01-02 스미또모 가가꾸 가부시키가이샤 가교결합성 치환 플루오렌 화합물 및 그에 기초한 콘쥬게이트 올리고머 또는 중합체
CN101087862B (zh) * 2004-09-02 2011-10-26 澳大利亚聚合物有限公司 包含聚合物取代基的光致变色化合物及其制备方法和用途
US7429445B1 (en) 2007-03-07 2008-09-30 Eastman Kodak Company Negative-working imageable elements and methods of use
KR100938565B1 (ko) 2007-05-16 2010-01-25 고려대학교 산학협력단 광가교 및 열가교성 표면개질용 랜덤공중합체 및 이를이용한 led의 제조방법
US20080311520A1 (en) 2007-06-13 2008-12-18 Jianfei Yu On-press developable negative-working imageable elements and methods of use
US20090186299A1 (en) 2008-01-17 2009-07-23 Ting Tao Methods for imaging and processing negative-working imageable elements
CN101775088A (zh) 2009-01-13 2010-07-14 清华大学 叠氮基或端炔基修饰的聚苯乙烯树脂及其制备方法
WO2011116217A1 (en) 2010-03-18 2011-09-22 Board Of Regents The University Of Texas System Surface treatments for alignment of block copolymers
CN101851306B (zh) 2010-06-21 2011-11-16 哈尔滨工程大学 聚苯乙烯大分子配体的合成方法
JP5694109B2 (ja) 2011-09-26 2015-04-01 株式会社東芝 パターン形成方法
EP2733533B1 (en) * 2012-11-14 2018-02-28 IMEC vzw Etching method using block-copolymers
KR102118692B1 (ko) 2013-02-18 2020-06-09 삼성전자주식회사 블록 코폴리머 층의 패턴 형성 방법 및 패턴화된 폴리머 구조물
WO2014195271A1 (en) 2013-06-05 2014-12-11 Atotech Deutschland Gmbh Novel adhesion promoting agents for bonding dielectric material to metal layers
US9181449B2 (en) 2013-12-16 2015-11-10 Az Electronic Materials (Luxembourg) S.A.R.L. Underlayer composition for promoting self assembly and method of making and using
WO2015093611A1 (ja) * 2013-12-20 2015-06-25 株式会社堀場エステック 連続反応装置及びこれを用いる連続重合方法
US9371444B2 (en) 2014-05-16 2016-06-21 Samsung Sdi Co., Ltd. Hardmask composition and method of forming patterns using the hardmask composition
JP6872484B2 (ja) 2014-12-23 2021-05-19 エーエスエムエル ネザーランズ ビー.ブイ. レジスト組成物、レジストパターン形成方法、レジスト組成物の製造方法、ペロブスカイト材料のリソグラフィプロセスへの使用およびレジスト組成物で被覆された基板
US9738765B2 (en) 2015-02-19 2017-08-22 International Business Machines Corporation Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers
TWI612379B (zh) 2015-02-26 2018-01-21 Rohm And Haas Electronic Materials Llc 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI588200B (zh) 2015-02-26 2017-06-21 羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI669337B (zh) 2015-02-26 2019-08-21 美商羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
TWI627219B (zh) 2015-02-26 2018-06-21 羅門哈斯電子材料有限公司 用於定向自組裝的共聚物調配物、其製造方法以及包括其的物件
US9879152B2 (en) * 2015-10-21 2018-01-30 International Business Machines Corporation Block copolymers for directed self-assembly applications
JP6796416B2 (ja) * 2016-07-08 2020-12-09 東京応化工業株式会社 レジストパターン形成方法
US10691019B2 (en) 2016-10-07 2020-06-23 Jsr Corporation Pattern-forming method and composition
US10734239B2 (en) * 2017-03-01 2020-08-04 Brewer Science, Inc. High-chi block copolymers with tunable glass transition temperatures for directed self-assembly
CN106947107B (zh) 2017-03-24 2019-08-09 西北工业大学 孔壁上接枝有阿霉素的超支化聚苯乙烯多孔膜的制备方法
JP7820296B2 (ja) 2019-11-26 2026-02-25 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング 非チオールタイプ窒素系疎水性ポリマーブラシ材料及び基材表面の改質のためのそれの使用

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CN114729076B (zh) 2024-09-20
US12486344B2 (en) 2025-12-02
TW202136330A (zh) 2021-10-01
TWI887304B (zh) 2025-06-21
JP2023502763A (ja) 2023-01-25
WO2021105086A1 (en) 2021-06-03
CN114729076A (zh) 2022-07-08
EP4065617A1 (en) 2022-10-05
JP7820296B2 (ja) 2026-02-25

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