KR20220009875A - 착색 경화성 수지 조성물, 컬러 필터 및 표시 장치 - Google Patents

착색 경화성 수지 조성물, 컬러 필터 및 표시 장치 Download PDF

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Publication number
KR20220009875A
KR20220009875A KR1020210089153A KR20210089153A KR20220009875A KR 20220009875 A KR20220009875 A KR 20220009875A KR 1020210089153 A KR1020210089153 A KR 1020210089153A KR 20210089153 A KR20210089153 A KR 20210089153A KR 20220009875 A KR20220009875 A KR 20220009875A
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KR
South Korea
Prior art keywords
group
compound
substituted
hydrocarbon group
constituting
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Application number
KR1020210089153A
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English (en)
Korean (ko)
Inventor
쇼타 모리와키
마나부 토가이
미츠오 츠치야
Original Assignee
스미또모 가가꾸 가부시키가이샤
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Application filed by 스미또모 가가꾸 가부시키가이샤 filed Critical 스미또모 가가꾸 가부시키가이샤
Publication of KR20220009875A publication Critical patent/KR20220009875A/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
    • C08K5/3432—Six-membered rings
    • C08K5/3437—Six-membered rings condensed with carbocyclic rings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Metallurgy (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
KR1020210089153A 2020-07-16 2021-07-07 착색 경화성 수지 조성물, 컬러 필터 및 표시 장치 KR20220009875A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2020-122443 2020-07-16
JP2020122443A JP7441134B2 (ja) 2020-07-16 2020-07-16 着色硬化性樹脂組成物、カラーフィルタ及び表示装置

Publications (1)

Publication Number Publication Date
KR20220009875A true KR20220009875A (ko) 2022-01-25

Family

ID=79327580

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020210089153A KR20220009875A (ko) 2020-07-16 2021-07-07 착색 경화성 수지 조성물, 컬러 필터 및 표시 장치

Country Status (4)

Country Link
JP (1) JP7441134B2 (zh)
KR (1) KR20220009875A (zh)
CN (1) CN113946098A (zh)
TW (1) TW202216908A (zh)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003167112A (ja) 2001-11-30 2003-06-13 Dainippon Ink & Chem Inc 顔料分散組成物、顔料分散レジスト、およびカラーフィルター

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5493877B2 (ja) 2010-01-06 2014-05-14 凸版印刷株式会社 染料を含有する着色組成物、カラーフィルタ及びその製造方法、それを具備する液晶表示装置並びに有機ｅｌ表示装置
JP5789847B2 (ja) 2011-10-12 2015-10-07 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、およびカラーフィルタ
JP6129728B2 (ja) 2013-09-17 2017-05-17 富士フイルム株式会社 着色硬化性組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、画像表示装置、およびトリアリールメタン化合物
JP6793091B2 (ja) 2017-05-30 2020-12-02 理想科学工業株式会社 調湿基材用水性インクジェットインクセット及び加飾された調湿基材の製造方法
JP2019113612A (ja) 2017-12-21 2019-07-11 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、及びカラーフィルタ
JP7163741B2 (ja) 2018-11-28 2022-11-01 東洋インキＳｃホールディングス株式会社 感光性着色組成物、カラーフィルタおよび液晶表示装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003167112A (ja) 2001-11-30 2003-06-13 Dainippon Ink & Chem Inc 顔料分散組成物、顔料分散レジスト、およびカラーフィルター

Also Published As

Publication number Publication date
JP2022018966A (ja) 2022-01-27
TW202216908A (zh) 2022-05-01
CN113946098A (zh) 2022-01-18
JP7441134B2 (ja) 2024-02-29

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