KR20200136803A - 가열 장치, 증발원 장치, 성막 장치, 성막 방법, 및 전자 디바이스의 제조 방법 - Google Patents

가열 장치, 증발원 장치, 성막 장치, 성막 방법, 및 전자 디바이스의 제조 방법 Download PDF

Info

Publication number
KR20200136803A
KR20200136803A KR1020190170668A KR20190170668A KR20200136803A KR 20200136803 A KR20200136803 A KR 20200136803A KR 1020190170668 A KR1020190170668 A KR 1020190170668A KR 20190170668 A KR20190170668 A KR 20190170668A KR 20200136803 A KR20200136803 A KR 20200136803A
Authority
KR
South Korea
Prior art keywords
heater
region
container
heating
heat
Prior art date
Application number
KR1020190170668A
Other languages
English (en)
Korean (ko)
Inventor
유키 스가와라
요시아키 카자마
Original Assignee
캐논 톡키 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 톡키 가부시키가이샤 filed Critical 캐논 톡키 가부시키가이샤
Publication of KR20200136803A publication Critical patent/KR20200136803A/ko

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • H01L51/001—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
KR1020190170668A 2019-05-28 2019-12-19 가열 장치, 증발원 장치, 성막 장치, 성막 방법, 및 전자 디바이스의 제조 방법 KR20200136803A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2019-099567 2019-05-28
JP2019099567A JP7241604B2 (ja) 2019-05-28 2019-05-28 加熱装置、蒸発源装置、成膜装置、成膜方法および電子デバイスの製造方法

Publications (1)

Publication Number Publication Date
KR20200136803A true KR20200136803A (ko) 2020-12-08

Family

ID=73506198

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020190170668A KR20200136803A (ko) 2019-05-28 2019-12-19 가열 장치, 증발원 장치, 성막 장치, 성막 방법, 및 전자 디바이스의 제조 방법

Country Status (3)

Country Link
JP (1) JP7241604B2 (zh)
KR (1) KR20200136803A (zh)
CN (1) CN112011760A (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102319130B1 (ko) 2020-03-11 2021-10-29 티오에스주식회사 가변 온도조절 장치를 구비한 금속-산화물 전자빔 증발원
CN114182208B (zh) * 2021-12-10 2024-01-23 深圳市华星光电半导体显示技术有限公司 蒸镀源及蒸镀设备

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019031705A (ja) 2017-08-07 2019-02-28 キヤノントッキ株式会社 蒸発源装置およびその制御方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011162846A (ja) 2010-02-10 2011-08-25 Mitsubishi Heavy Ind Ltd 真空蒸発源
CN102268642A (zh) * 2011-07-22 2011-12-07 上海奕瑞光电子科技有限公司 电阻加热式蒸发源
JP5557817B2 (ja) * 2011-09-30 2014-07-23 株式会社日立ハイテクノロジーズ 蒸発源および成膜装置
JP2014070227A (ja) * 2012-09-27 2014-04-21 Hitachi High-Technologies Corp 成膜装置とその蒸発源の温度制御方法及び温度制御装置
JP2014072005A (ja) * 2012-09-28 2014-04-21 Hitachi High-Technologies Corp 蒸発源、真空蒸着装置及び有機ｅｌ表示装置製造方法
JP6223675B2 (ja) 2012-11-29 2017-11-01 株式会社オプトラン 真空蒸着源及びそれを用いた真空蒸着方法
CN103757590B (zh) * 2013-12-31 2016-04-20 深圳市华星光电技术有限公司 一种镀膜机坩埚设备
JP6488928B2 (ja) 2015-07-15 2019-03-27 アイシン精機株式会社 蒸着装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019031705A (ja) 2017-08-07 2019-02-28 キヤノントッキ株式会社 蒸発源装置およびその制御方法

Also Published As

Publication number Publication date
CN112011760A (zh) 2020-12-01
JP7241604B2 (ja) 2023-03-17
JP2020193368A (ja) 2020-12-03

Similar Documents

Publication Publication Date Title
US9279177B2 (en) Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method
US20110146575A1 (en) Evaporation source and deposition apparatus having the same
KR102057783B1 (ko) 증발원 장치 및 그 제어 방법
JP2019081949A (ja) 蒸発源装置、成膜装置、成膜方法、および、電子デバイスの製造方法
TW200814392A (en) Deposition apparatus
KR20200136803A (ko) 가열 장치, 증발원 장치, 성막 장치, 성막 방법, 및 전자 디바이스의 제조 방법
KR102590304B1 (ko) 증발원 장치, 증착 장치 및 증착 시스템
KR102638573B1 (ko) 증발원 장치 및 증착 장치
KR20200136802A (ko) 가열 장치, 증발원 장치, 성막 장치, 성막 방법, 및 전자 디바이스의 제조 방법
JP6576009B2 (ja) 蒸発源容器及び蒸発源装置
JP7202971B2 (ja) 蒸発源装置、成膜装置、成膜方法および電子デバイスの製造方法
JP6556802B2 (ja) 真空装置、蒸着装置及びゲートバルブ
KR20220102121A (ko) 증발원 장치, 성막 장치, 성막 방법 및 전자 디바이스의 제조 방법
KR20140136650A (ko) 박막 증착 방법
JP7088891B2 (ja) 蒸発源装置及び蒸着装置
KR102549982B1 (ko) 증발원 장치, 증착 장치, 및 증발원 장치의 제어 방법
KR20060040827A (ko) 증착 방법 및 이를 위한 증착 장치
KR20080061668A (ko) 유기 박막 증착 장치
KR101909210B1 (ko) 박막증착장치의 증발원 및 그를 가지는 박막증착장치