KR20200079414A - 수지 조성물, 및 마이크로렌즈 패턴을 구비하는 기판의 제조 방법 - Google Patents

수지 조성물, 및 마이크로렌즈 패턴을 구비하는 기판의 제조 방법 Download PDF

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Publication number
KR20200079414A
KR20200079414A KR1020190145675A KR20190145675A KR20200079414A KR 20200079414 A KR20200079414 A KR 20200079414A KR 1020190145675 A KR1020190145675 A KR 1020190145675A KR 20190145675 A KR20190145675 A KR 20190145675A KR 20200079414 A KR20200079414 A KR 20200079414A
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South Korea
Prior art keywords
resin composition
resin
dot pattern
less
pattern
Prior art date
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KR1020190145675A
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English (en)
Korean (ko)
Inventor
마사토시 마에다
신고 이소보
도모유키 이노우에
Original Assignee
도오꾜오까고오교 가부시끼가이샤
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Publication of KR20200079414A publication Critical patent/KR20200079414A/ko

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0012Arrays characterised by the manufacturing method
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0012Arrays characterised by the manufacturing method
    • G02B3/0018Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L23/00Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
    • C08L23/02Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L23/10Homopolymers or copolymers of propene
    • C08L23/14Copolymers of propene
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/041Lenses
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • G02B3/0006Arrays
    • G02B3/0037Arrays characterized by the distribution or form of lenses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14625Optical elements or arrangements associated with the device
    • H01L27/14627Microlenses

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials For Photolithography (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
KR1020190145675A 2018-12-25 2019-11-14 수지 조성물, 및 마이크로렌즈 패턴을 구비하는 기판의 제조 방법 KR20200079414A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018241744A JP7219607B2 (ja) 2018-12-25 2018-12-25 樹脂組成物、及びマイクロレンズパターンを備える基板の製造方法
JPJP-P-2018-241744 2018-12-25

Publications (1)

Publication Number Publication Date
KR20200079414A true KR20200079414A (ko) 2020-07-03

Family

ID=71141116

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020190145675A KR20200079414A (ko) 2018-12-25 2019-11-14 수지 조성물, 및 마이크로렌즈 패턴을 구비하는 기판의 제조 방법

Country Status (3)

Country Link
JP (1) JP7219607B2 (ja)
KR (1) KR20200079414A (ja)
TW (1) TWI825195B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220136129A (ko) 2021-03-31 2022-10-07 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 접착제층 형성용 조성물, 적층체, 적층체의 제조 방법 및 적층체의 처리 방법
WO2024053579A1 (ja) * 2022-09-08 2024-03-14 東京応化工業株式会社 感光性樹脂組成物

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003098649A (ja) 2001-09-26 2003-04-04 Dainippon Printing Co Ltd 微小な集光レンズの形成方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006251464A (ja) * 2005-03-11 2006-09-21 Tokyo Ohka Kogyo Co Ltd レンズ形成用感光性樹脂組成物
JP2009015245A (ja) * 2007-07-09 2009-01-22 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物およびこれを用いたマイクロレンズ
KR20090005976A (ko) * 2007-07-09 2009-01-14 도쿄 오카 고교 가부시키가이샤 감광성 수지 조성물 및 이를 이용한 마이크로렌즈

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003098649A (ja) 2001-09-26 2003-04-04 Dainippon Printing Co Ltd 微小な集光レンズの形成方法

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Publication number Publication date
JP7219607B2 (ja) 2023-02-08
JP2020100793A (ja) 2020-07-02
TWI825195B (zh) 2023-12-11
TW202039603A (zh) 2020-11-01

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