KR20200028483A - 마스크 및 이의 제조 방법 - Google Patents

마스크 및 이의 제조 방법 Download PDF

Info

Publication number
KR20200028483A
KR20200028483A KR1020207005442A KR20207005442A KR20200028483A KR 20200028483 A KR20200028483 A KR 20200028483A KR 1020207005442 A KR1020207005442 A KR 1020207005442A KR 20207005442 A KR20207005442 A KR 20207005442A KR 20200028483 A KR20200028483 A KR 20200028483A
Authority
KR
South Korea
Prior art keywords
area
region
pixel opening
size
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020207005442A
Other languages
English (en)
Korean (ko)
Inventor
웨일리 리
Original Assignee
쿤산 고-비젼녹스 옵토-일렉트로닉스 씨오., 엘티디.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 쿤산 고-비젼녹스 옵토-일렉트로닉스 씨오., 엘티디. filed Critical 쿤산 고-비젼녹스 옵토-일렉트로닉스 씨오., 엘티디.
Publication of KR20200028483A publication Critical patent/KR20200028483A/ko
Ceased legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • H01L51/0011—
    • H01L51/56—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
KR1020207005442A 2018-03-30 2018-08-21 마스크 및 이의 제조 방법 Ceased KR20200028483A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN201810277643.9 2018-03-30
CN201810277643.9A CN108456846A (zh) 2018-03-30 2018-03-30 掩膜板及其制备方法
PCT/CN2018/101549 WO2019184205A1 (zh) 2018-03-30 2018-08-21 掩膜板及其制备方法

Publications (1)

Publication Number Publication Date
KR20200028483A true KR20200028483A (ko) 2020-03-16

Family

ID=63237826

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020207005442A Ceased KR20200028483A (ko) 2018-03-30 2018-08-21 마스크 및 이의 제조 방법

Country Status (7)

Country Link
US (1) US20190345599A1 (enExample)
EP (1) EP3640365A4 (enExample)
JP (1) JP6977140B2 (enExample)
KR (1) KR20200028483A (enExample)
CN (2) CN116024523A (enExample)
TW (1) TWI726240B (enExample)
WO (1) WO2019184205A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210138210A (ko) * 2020-05-11 2021-11-19 삼성디스플레이 주식회사 마스크 검사 장치 및 이를 이용한 마스크 검사 방법

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109487206B (zh) * 2018-12-11 2020-08-11 武汉华星光电半导体显示技术有限公司 掩膜版及采用该掩膜版的掩膜装置
CN110760790A (zh) * 2019-02-28 2020-02-07 云谷（固安）科技有限公司 掩膜板及掩膜组件
CN110760791A (zh) * 2019-02-28 2020-02-07 云谷（固安）科技有限公司 掩膜板及掩膜组件
CN109913805B (zh) * 2019-03-27 2021-01-26 京东方科技集团股份有限公司 一种掩膜版
JP7749925B2 (ja) * 2020-03-13 2025-10-07 大日本印刷株式会社 有機デバイスの製造装置の蒸着室の評価方法
CN116657099A (zh) * 2023-05-31 2023-08-29 京东方科技集团股份有限公司 遮挡用金属掩膜板、张网组件、掩膜板以及显示面板

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4608874B2 (ja) * 2003-12-02 2011-01-12 ソニー株式会社 蒸着マスクおよびその製造方法
JP4915312B2 (ja) * 2007-08-08 2012-04-11 ソニー株式会社 蒸着用マスクの製造方法
CN202530150U (zh) * 2012-01-16 2012-11-14 昆山允升吉光电科技有限公司 蒸镀掩模板
CN103014618A (zh) * 2012-12-25 2013-04-03 唐军 蒸镀用掩模板及其制造方法
US20160043319A1 (en) * 2013-04-22 2016-02-11 Applied Materials, Inc. Actively-aligned fine metal mask
KR102106331B1 (ko) * 2013-07-08 2020-05-06 삼성디스플레이 주식회사 마스크 조립체 및 이의 제조 방법
KR102106336B1 (ko) * 2013-07-08 2020-06-03 삼성디스플레이 주식회사 증착용 마스크
CN104593721B (zh) * 2013-10-30 2017-08-08 昆山国显光电有限公司 一种蒸镀用精密金属掩膜板的张网方法及其获得的掩膜板
KR102237428B1 (ko) * 2014-02-14 2021-04-08 삼성디스플레이 주식회사 마스크 프레임 조립체 및 그 제조방법
US10022748B2 (en) * 2014-09-12 2018-07-17 Toshiba Memory Corporation Stencil mask, stencil mask manufacturing method, and imprinting method
CN104630705A (zh) * 2015-03-13 2015-05-20 合肥鑫晟光电科技有限公司 一种掩膜板及其制备方法
KR102541449B1 (ko) * 2015-12-22 2023-06-09 삼성디스플레이 주식회사 박막 증착용 마스크 어셈블리
JP6465075B2 (ja) * 2016-05-26 2019-02-06 大日本印刷株式会社 蒸着マスク、フレーム付き蒸着マスク、有機半導体素子の製造方法、及びに有機ｅｌディスプレイの製造方法
KR102366019B1 (ko) * 2016-06-28 2022-02-23 다이니폰 인사츠 가부시키가이샤 증착 마스크, 유기 반도체 소자의 제조 방법 및 유기 el 디스플레이의 제조 방법
CN205844737U (zh) * 2016-07-29 2016-12-28 昆山国显光电有限公司 掩膜板
US20180040855A1 (en) * 2016-08-04 2018-02-08 Hon Hai Precision Industry Co., Ltd. Deposition mask for making oled display panel
CN206512267U (zh) * 2016-10-28 2017-09-22 京东方科技集团股份有限公司 一种掩模片及掩模板
CN106502044B (zh) * 2017-01-10 2020-01-24 昆山国显光电有限公司 掩膜板及其制造方法
JP6304412B2 (ja) * 2017-02-06 2018-04-04 大日本印刷株式会社 金属フレーム付き蒸着マスクの製造方法、有機半導体素子の製造方法、パターンの形成方法
CN107435131B (zh) * 2017-09-29 2019-08-02 上海天马微电子有限公司 掩膜装置、蒸镀设备以及掩膜装置制备方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210138210A (ko) * 2020-05-11 2021-11-19 삼성디스플레이 주식회사 마스크 검사 장치 및 이를 이용한 마스크 검사 방법

Also Published As

Publication number Publication date
US20190345599A1 (en) 2019-11-14
CN108456846A (zh) 2018-08-28
EP3640365A4 (en) 2020-08-19
CN116024523A (zh) 2023-04-28
TW201843864A (zh) 2018-12-16
TWI726240B (zh) 2021-05-01
JP6977140B2 (ja) 2021-12-08
WO2019184205A1 (zh) 2019-10-03
JP2020526670A (ja) 2020-08-31
EP3640365A1 (en) 2020-04-22

Similar Documents

Publication Publication Date Title
KR20200028483A (ko) 마스크 및 이의 제조 방법
US8701592B2 (en) Mask frame assembly, method of manufacturing the same, and method of manufacturing organic light-emitting display device using the mask frame assembly
US8852346B2 (en) Mask frame assembly for thin layer deposition and organic light emitting display device
US8402917B2 (en) Mask frame assembly for thin film deposition and associated methods
US10886343B2 (en) Pixel defining layer and method for manufacturing the same, display panel and method for manufacturing the same, and display device
US10604833B2 (en) Metal mask plate and fabrication method thereof
US8404125B2 (en) Metal processing method, manfacturing method of metal mask and manufacturing method of organic light emitting display device
US10886344B2 (en) Display substrate, manufacturing method thereof, and display device
US20190043930A1 (en) Oled display panel, method for manufacturing the same and oled display device
US10305049B2 (en) OLED substrate and manufacture method thereof
KR101865926B1 (ko) 유기전계 발광 표시장치용 쉐도우 마스크 제조방법
JP6594615B2 (ja) 蒸着用マスク及びそれを用いた有機ｅｌ表示装置の製造方法、並びに、蒸着用マスクの製造方法
US20150102329A1 (en) Mask for depositing thin film, method of manufacturing organic light emitting diode display using the same, and organic light emitting diode display using the same
CN111192905A (zh) 有机发光二极体显示器件及其制造方法
KR20160127221A (ko) 마스크 프레임 조립체, 그 제조 방법 및 표시 장치의 제조 방법
US11322562B2 (en) Organic light-emitting diode display panel and method of fabricating organic light-emitting diode display panel
KR101328821B1 (ko) 새도우마스크, 그 제조 방법 및 이를 이용한유기전계발광표시장치의 제조 방법
KR20130129544A (ko) 새도우 마스크 및 이를 이용한 유기발광 다이오드 표시장치의 제조방법
KR20100030247A (ko) 표시장치의 제조장치 및 그 제조방법
JP2006185746A (ja) 表示装置の製造装置
WO2020194632A1 (ja) 蒸着マスクおよびその製造方法
KR20080000405A (ko) 유기전계발광표시장치 및 그 제조방법
JP2008159445A (ja) 有機電界発光表示装置及びその製造方法

Legal Events

Date Code Title Description
A201 Request for examination
AMND Amendment
PA0105 International application

Patent event date: 20200225

Patent event code: PA01051R01D

Comment text: International Patent Application

PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20200225

Comment text: Request for Examination of Application

PG1501 Laying open of application
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20210412

Patent event code: PE09021S01D

AMND Amendment
E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

Comment text: Notification of reason for refusal

Patent event date: 20211026

Patent event code: PE09021S01D

AMND Amendment
E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 20220420

Comment text: Decision to Refuse Application

Patent event code: PE06012S01D

Patent event date: 20211026

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I

Patent event date: 20210412

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I

AMND Amendment
PX0901 Re-examination

Patent event code: PX09011S01I

Patent event date: 20220420

Comment text: Decision to Refuse Application

Patent event code: PX09012R01I

Patent event date: 20211206

Comment text: Amendment to Specification, etc.

Patent event code: PX09012R01I

Patent event date: 20210528

Comment text: Amendment to Specification, etc.

Patent event code: PX09012R01I

Patent event date: 20200225

Comment text: Amendment to Specification, etc.

PX0601 Decision of rejection after re-examination

Comment text: Decision to Refuse Application

Patent event code: PX06014S01D

Patent event date: 20220721

Comment text: Amendment to Specification, etc.

Patent event code: PX06012R01I

Patent event date: 20220630

Comment text: Decision to Refuse Application

Patent event code: PX06011S01I

Patent event date: 20220420

Comment text: Amendment to Specification, etc.

Patent event code: PX06012R01I

Patent event date: 20211206

Comment text: Notification of reason for refusal

Patent event code: PX06013S01I

Patent event date: 20211026

Comment text: Amendment to Specification, etc.

Patent event code: PX06012R01I

Patent event date: 20210528

Comment text: Notification of reason for refusal

Patent event code: PX06013S01I

Patent event date: 20210412

Comment text: Amendment to Specification, etc.

Patent event code: PX06012R01I

Patent event date: 20200225

X601 Decision of rejection after re-examination
J201 Request for trial against refusal decision
PJ0201 Trial against decision of rejection

Patent event date: 20220930

Comment text: Request for Trial against Decision on Refusal

Patent event code: PJ02012R01D

Patent event date: 20220721

Comment text: Decision to Refuse Application

Patent event code: PJ02011S01I

Patent event date: 20220420

Comment text: Decision to Refuse Application

Patent event code: PJ02011S01I

Appeal kind category: Appeal against decision to decline refusal

Appeal identifier: 2022101001790

Request date: 20220930

J301 Trial decision

Free format text: TRIAL NUMBER: 2022101001790; TRIAL DECISION FOR APPEAL AGAINST DECISION TO DECLINE REFUSAL REQUESTED 20220930

Effective date: 20230330

PJ1301 Trial decision

Patent event code: PJ13011S01D

Patent event date: 20230330

Comment text: Trial Decision on Objection to Decision on Refusal

Appeal kind category: Appeal against decision to decline refusal

Request date: 20220930

Decision date: 20230330

Appeal identifier: 2022101001790