KR20190113621A - 쿠마린 화합물 및 이것을 포함한 안료 조성물, 그리고 그들의 용도 - Google Patents

쿠마린 화합물 및 이것을 포함한 안료 조성물, 그리고 그들의 용도 Download PDF

Info

Publication number
KR20190113621A
KR20190113621A KR1020190034203A KR20190034203A KR20190113621A KR 20190113621 A KR20190113621 A KR 20190113621A KR 1020190034203 A KR1020190034203 A KR 1020190034203A KR 20190034203 A KR20190034203 A KR 20190034203A KR 20190113621 A KR20190113621 A KR 20190113621A
Authority
KR
South Korea
Prior art keywords
pigment
group
pigment composition
compound
hydrogen atom
Prior art date
Application number
KR1020190034203A
Other languages
English (en)
Korean (ko)
Other versions
KR102685512B1 (ko
Inventor
타카시 요시모토
리에 다케우치
히로시 가메야
Original Assignee
닛뽄 가야쿠 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 닛뽄 가야쿠 가부시키가이샤 filed Critical 닛뽄 가야쿠 가부시키가이샤
Publication of KR20190113621A publication Critical patent/KR20190113621A/ko
Application granted granted Critical
Publication of KR102685512B1 publication Critical patent/KR102685512B1/ko

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D405/00Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/04Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00Other synthetic dyes of known constitution
    • C09B57/02Coumarine dyes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0033Blends of pigments; Mixtured crystals; Solid solutions
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/0097Dye preparations of special physical nature; Tablets, films, extrusion, microcapsules, sheets, pads, bags with dyes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/32Inkjet printing inks characterised by colouring agents
    • C09D11/328Inkjet printing inks characterised by colouring agents characterised by dyes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/36Inkjet printing inks based on non-aqueous solvents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/38Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00Other synthetic dyes of known constitution
    • C09B57/004Diketopyrrolopyrrole dyes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Optical Filters (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
  • Plural Heterocyclic Compounds (AREA)
KR1020190034203A 2018-03-28 2019-03-26 안료 조성물 및 그의 용도 KR102685512B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018061222 2018-03-28
JPJP-P-2018-061222 2018-03-28

Publications (2)

Publication Number Publication Date
KR20190113621A true KR20190113621A (ko) 2019-10-08
KR102685512B1 KR102685512B1 (ko) 2024-07-15

Family

ID=68112835

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020190034203A KR102685512B1 (ko) 2018-03-28 2019-03-26 안료 조성물 및 그의 용도

Country Status (4)

Country Link
JP (1) JP7261609B2 (ja)
KR (1) KR102685512B1 (ja)
CN (1) CN110317196A (ja)
TW (1) TWI797294B (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7283655B2 (ja) * 2019-03-18 2023-05-30 山陽色素株式会社 水性インク用水系染料分散体及び水性インク

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS504019B1 (ja) 1969-11-15 1975-02-13
JPS55108466A (en) 1979-02-10 1980-08-20 Basf Ag Pigment prepared matter
JPS63172772A (ja) 1986-12-29 1988-07-16 チバ―ガイギ アクチエンゲゼルシヤフト C.i.ピグメントレッド177を基剤とした新規組成物
JPH0412466A (ja) 1990-05-01 1992-01-17 Ishikawajima Harima Heavy Ind Co Ltd 溶融炭酸塩型燃料電池の発電装置
JPH08259832A (ja) * 1995-03-17 1996-10-08 Taoka Chem Co Ltd インクジェット捺染用インク及びそれを用いる布帛の捺染方法
JP3916787B2 (ja) 1998-12-28 2007-05-23 ポリプラスチックス株式会社 ポリアセタール共重合体の製造方法
JP2015091947A (ja) 2013-10-03 2015-05-14 住友化学株式会社 着色剤分散液
JP2017165896A (ja) * 2016-03-17 2017-09-21 日本化薬株式会社 クマリン化合物又はそれらの塩、並びにこれを含んだ顔料組成物

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2065552A1 (de) * 1970-06-20 1974-03-07 Bayer Ag Oxazolyl-essigsaeurederivate
US6793723B2 (en) * 2001-05-10 2004-09-21 Pitney Bowes Inc. Homogeneous photosensitive optically variable ink compositions for ink jet printing
TWI588142B (zh) * 2012-07-31 2017-06-21 住友化學股份有限公司 著色硬化性樹脂組合物
JP2017171721A (ja) * 2016-03-22 2017-09-28 日本化薬株式会社 クマリン化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP7095603B2 (ja) * 2017-02-14 2022-07-05 コニカミノルタ株式会社 蛍光標識法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS504019B1 (ja) 1969-11-15 1975-02-13
JPS55108466A (en) 1979-02-10 1980-08-20 Basf Ag Pigment prepared matter
JPS63172772A (ja) 1986-12-29 1988-07-16 チバ―ガイギ アクチエンゲゼルシヤフト C.i.ピグメントレッド177を基剤とした新規組成物
JPH0412466A (ja) 1990-05-01 1992-01-17 Ishikawajima Harima Heavy Ind Co Ltd 溶融炭酸塩型燃料電池の発電装置
JPH08259832A (ja) * 1995-03-17 1996-10-08 Taoka Chem Co Ltd インクジェット捺染用インク及びそれを用いる布帛の捺染方法
JP3916787B2 (ja) 1998-12-28 2007-05-23 ポリプラスチックス株式会社 ポリアセタール共重合体の製造方法
JP2015091947A (ja) 2013-10-03 2015-05-14 住友化学株式会社 着色剤分散液
JP2017165896A (ja) * 2016-03-17 2017-09-21 日本化薬株式会社 クマリン化合物又はそれらの塩、並びにこれを含んだ顔料組成物

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Dyes and Pigments, 47(1-2), 79-89; 2000

Also Published As

Publication number Publication date
JP2019172968A (ja) 2019-10-10
TW201942118A (zh) 2019-11-01
JP7261609B2 (ja) 2023-04-20
KR102685512B1 (ko) 2024-07-15
CN110317196A (zh) 2019-10-11
TWI797294B (zh) 2023-04-01

Similar Documents

Publication Publication Date Title
JP6956033B2 (ja) ベンゾアゾール化合物、並びにこれを含んだ顔料組成物
JP2017165896A (ja) クマリン化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP2017202997A (ja) ベンゾイミダゾロン化合物又はそれらの塩、並びにこれを含んだ顔料組成物
KR20190113621A (ko) 쿠마린 화합물 및 이것을 포함한 안료 조성물, 그리고 그들의 용도
JP6821490B2 (ja) クマリン化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP2018168243A (ja) クマリン化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP6884622B2 (ja) ベンゾアゾール化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP2017171795A (ja) キノリン化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP2017171719A (ja) キノリン化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP7156770B2 (ja) キサンテン化合物、及びこれを含んだ顔料組成物
JP2017171761A (ja) クマリン化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP2017171721A (ja) クマリン化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP2017165897A (ja) クマリン化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP2017190387A (ja) ベンゾイミダゾロン化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP6798920B2 (ja) ウラシル化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP2017202998A (ja) ベンゾイミダゾロン化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP6798921B2 (ja) ウラシル化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP6782656B2 (ja) ベンゾイミダゾロン化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP6793589B2 (ja) ウラシル化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP6851878B2 (ja) アゾ化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP6875902B2 (ja) アゾ化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP6875903B2 (ja) アゾ化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP2017171763A (ja) クマリン化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP2017202995A (ja) ベンゾイミダゾロン化合物又はそれらの塩、並びにこれを含んだ顔料組成物
JP2017202994A (ja) ベンゾイミダゾロン化合物又はそれらの塩、並びにこれを含んだ顔料組成物

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant