KR20190062374A - 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치 - Google Patents
감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치 Download PDFInfo
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- KR20190062374A KR20190062374A KR1020197001343A KR20197001343A KR20190062374A KR 20190062374 A KR20190062374 A KR 20190062374A KR 1020197001343 A KR1020197001343 A KR 1020197001343A KR 20197001343 A KR20197001343 A KR 20197001343A KR 20190062374 A KR20190062374 A KR 20190062374A
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- 0 CC(*CCC1=O)C2C=CC=C[C@@]2C1=C(C(*1)=C2CC2)C(CC2OC3O)=C1C=C2C3=C(C(C)C=CC=CCN1)C1=O Chemical compound CC(*CCC1=O)C2C=CC=C[C@@]2C1=C(C(*1)=C2CC2)C(CC2OC3O)=C1C=C2C3=C(C(C)C=CC=CCN1)C1=O 0.000 description 5
- CFFWOTJYFLALSZ-UHFFFAOYSA-N C1=C[I]=CC2=C1C=[I]C=C2 Chemical compound C1=C[I]=CC2=C1C=[I]C=C2 CFFWOTJYFLALSZ-UHFFFAOYSA-N 0.000 description 1
- HAFKMCWOTGJCGE-UHFFFAOYSA-N C=CC(OCC(OC(C(CC=CC1)C1C(O)=O)=O)Oc1ccccc1)=O Chemical compound C=CC(OCC(OC(C(CC=CC1)C1C(O)=O)=O)Oc1ccccc1)=O HAFKMCWOTGJCGE-UHFFFAOYSA-N 0.000 description 1
- YHKRBBZGSKIRCT-UHFFFAOYSA-N CC(C)(c(cc1)ccc1OCC(COC(CCC(OCC(COCC(COC(C=C)=O)(COC(C=C)=O)OC(C=C)=O)(COC(C=C)=O)OC(C=C)=O)=O)=O)OC(C(CC=CC1)C1C(O)=O)=O)c(cc1)ccc1OCC(COC(CCC(OC(COCC(COC(C=C)=O)(OC(C=C)=O)OC(C=C)=O)(COC(C=C)=O)OC(C=C)=O)=O)=O)OC(C(CC=CC1)C1C(O)=O)=O Chemical compound CC(C)(c(cc1)ccc1OCC(COC(CCC(OCC(COCC(COC(C=C)=O)(COC(C=C)=O)OC(C=C)=O)(COC(C=C)=O)OC(C=C)=O)=O)=O)OC(C(CC=CC1)C1C(O)=O)=O)c(cc1)ccc1OCC(COC(CCC(OC(COCC(COC(C=C)=O)(OC(C=C)=O)OC(C=C)=O)(COC(C=C)=O)OC(C=C)=O)=O)=O)OC(C(CC=CC1)C1C(O)=O)=O YHKRBBZGSKIRCT-UHFFFAOYSA-N 0.000 description 1
- SOEGWNPZRRIYRM-UHFFFAOYSA-N c(cc1)cc2c1C=[I]C=C2 Chemical compound c(cc1)cc2c1C=[I]C=C2 SOEGWNPZRRIYRM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2016-202697 | 2016-10-14 | ||
| JP2016202697 | 2016-10-14 | ||
| JPJP-P-2017-172544 | 2017-09-07 | ||
| JP2017172544 | 2017-09-07 | ||
| PCT/JP2017/037013 WO2018070477A1 (ja) | 2016-10-14 | 2017-10-12 | 感光性着色組成物、硬化物、着色スペーサー、画像表示装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20190062374A true KR20190062374A (ko) | 2019-06-05 |
Family
ID=61906436
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020197001343A KR20190062374A (ko) | 2016-10-14 | 2017-10-12 | 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치 |
Country Status (5)
| Country | Link |
|---|---|
| JP (2) | JP7031598B2 (ja) |
| KR (1) | KR20190062374A (ja) |
| CN (1) | CN109923475B (ja) |
| TW (1) | TW201827476A (ja) |
| WO (1) | WO2018070477A1 (ja) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111133344A (zh) * | 2017-09-26 | 2020-05-08 | 大阪有机化学工业株式会社 | 光间隔体形成用感光性树脂组合物、光间隔体的形成方法、带光间隔体的基板、及滤色器 |
| JPWO2020066438A1 (ja) * | 2018-09-26 | 2021-08-30 | 富士フイルム株式会社 | 着色感光性樹脂組成物、膜、カラーフィルタ、カラーフィルタの製造方法、構造体、固体撮像素子及び画像表示装置 |
| CN113168094A (zh) * | 2018-12-18 | 2021-07-23 | 三菱化学株式会社 | 感光性着色树脂组合物、固化物、着色间隔物及图像显示装置 |
| JP7359559B2 (ja) * | 2019-03-29 | 2023-10-11 | 日鉄ケミカル＆マテリアル株式会社 | 遮光膜及びそれを得るための感光性樹脂組成物、遮光膜の製造方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08234212A (ja) | 1995-02-28 | 1996-09-13 | Casio Comput Co Ltd | 液晶表示素子 |
| JP2002174812A (ja) | 2000-09-29 | 2002-06-21 | Dainippon Printing Co Ltd | 感光性樹脂組成物および液晶ディスプレイ用カラーフィルタ |
| JP2006312704A (ja) | 2005-04-07 | 2006-11-16 | Mitsubishi Chemicals Corp | エチレン性不飽和基及びカルボキシル基含有化合物、硬化性組成物、カラーフィルタ及び液晶表示装置 |
| WO2013115268A1 (ja) | 2012-01-31 | 2013-08-08 | 三菱化学株式会社 | 着色感光性組成物、ブラックフォトスペーサー、及びカラーフィルター |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2998880B2 (ja) * | 1993-09-28 | 2000-01-17 | 凸版印刷株式会社 | 感光性着色組成物、カラーフィルタ及びカラーフィルタの製造方法 |
| JP4213909B2 (ja) | 2002-05-13 | 2009-01-28 | 富士フイルム株式会社 | 光硬化性組成物、光硬化性着色組成物、及びカラーフィルター |
| JP2006139137A (ja) | 2004-11-12 | 2006-06-01 | Toagosei Co Ltd | 感光性樹脂組成物 |
| CN101548203B (zh) * | 2007-06-11 | 2012-03-07 | 三菱化学株式会社 | 滤色器用感光性着色树脂组合物、滤色器、液晶显示装置以及有机电致发光显示屏 |
| JP2009092924A (ja) | 2007-10-09 | 2009-04-30 | Fujifilm Corp | 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法 |
| JP2012018246A (ja) * | 2010-07-07 | 2012-01-26 | Mitsubishi Chemicals Corp | 着色感光性樹脂組成物、硬化物及び液晶表示装置 |
| JP5998546B2 (ja) | 2012-03-13 | 2016-09-28 | 三菱化学株式会社 | カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置 |
| JP6543968B2 (ja) * | 2015-03-06 | 2019-07-17 | 三菱ケミカル株式会社 | 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置 |
| KR102491215B1 (ko) * | 2015-03-11 | 2023-01-20 | 미쯔비시 케미컬 주식회사 | 착색 스페이서 형성용 감광성 착색 조성물, 경화물, 착색 스페이서, 화상 표시 장치 |
-
2017
- 2017-10-12 WO PCT/JP2017/037013 patent/WO2018070477A1/ja active Application Filing
- 2017-10-12 JP JP2018545051A patent/JP7031598B2/ja active Active
- 2017-10-12 CN CN201780056237.3A patent/CN109923475B/zh active Active
- 2017-10-12 KR KR1020197001343A patent/KR20190062374A/ko unknown
- 2017-10-13 TW TW106135054A patent/TW201827476A/zh unknown
-
2022
- 2022-02-22 JP JP2022026189A patent/JP2022078139A/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08234212A (ja) | 1995-02-28 | 1996-09-13 | Casio Comput Co Ltd | 液晶表示素子 |
| JP2002174812A (ja) | 2000-09-29 | 2002-06-21 | Dainippon Printing Co Ltd | 感光性樹脂組成物および液晶ディスプレイ用カラーフィルタ |
| JP2006312704A (ja) | 2005-04-07 | 2006-11-16 | Mitsubishi Chemicals Corp | エチレン性不飽和基及びカルボキシル基含有化合物、硬化性組成物、カラーフィルタ及び液晶表示装置 |
| WO2013115268A1 (ja) | 2012-01-31 | 2013-08-08 | 三菱化学株式会社 | 着色感光性組成物、ブラックフォトスペーサー、及びカラーフィルター |
Also Published As
| Publication number | Publication date |
|---|---|
| CN109923475B (zh) | 2022-12-02 |
| JP2022078139A (ja) | 2022-05-24 |
| TW201827476A (zh) | 2018-08-01 |
| JPWO2018070477A1 (ja) | 2019-08-08 |
| WO2018070477A1 (ja) | 2018-04-19 |
| JP7031598B2 (ja) | 2022-03-08 |
| CN109923475A (zh) | 2019-06-21 |
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