KR20180095608A - 복합 GaN 나노컬럼의 제조 방법 및 그 방법으로부터 제조된 발광 구조 - Google Patents
복합 GaN 나노컬럼의 제조 방법 및 그 방법으로부터 제조된 발광 구조 Download PDFInfo
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- H10H20/818—Bodies characterised by the crystal structures or orientations, e.g. polycrystalline, amorphous or porous within the light-emitting regions
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- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
- C30B29/403—AIII-nitrides
- C30B29/406—Gallium nitride
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- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
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- H10F71/127—The active layers comprising only Group III-V materials, e.g. GaAs or InP
- H10F71/1272—The active layers comprising only Group III-V materials, e.g. GaAs or InP comprising at least three elements, e.g. GaAlAs or InGaAsP
- H10F71/1274—The active layers comprising only Group III-V materials, e.g. GaAs or InP comprising at least three elements, e.g. GaAlAs or InGaAsP comprising nitrides, e.g. InGaN or InGaAlN
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- H10H20/0133—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials with a substrate not being Group III-V materials
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- H10H20/824—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP
- H10H20/825—Materials of the light-emitting regions comprising only Group III-V materials, e.g. GaP containing nitrogen, e.g. GaN
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- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
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- H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
- H10P14/3414—Deposited materials, e.g. layers characterised by the chemical composition being group IIIA-VIA materials
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
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- Inorganic Chemistry (AREA)
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Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562267117P | 2015-12-14 | 2015-12-14 | |
| US62/267,117 | 2015-12-14 | ||
| US15/377,775 US11322652B2 (en) | 2015-12-14 | 2016-12-13 | Methods for producing composite GaN nanocolumns and light emitting structures made from the methods |
| US15/377,775 | 2016-12-13 | ||
| PCT/US2016/066729 WO2017106387A1 (en) | 2015-12-14 | 2016-12-14 | METHODS FOR PRODUCING COMPOSITE GaN NANOCOLUMNS AND LIGHT EMITTING STRUCTURES MADE FROM THE METHODS |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20180095608A true KR20180095608A (ko) | 2018-08-27 |
Family
ID=59020145
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020187020188A Ceased KR20180095608A (ko) | 2015-12-14 | 2016-12-14 | 복합 GaN 나노컬럼의 제조 방법 및 그 방법으로부터 제조된 발광 구조 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11322652B2 (https=) |
| JP (1) | JP6947746B2 (https=) |
| KR (1) | KR20180095608A (https=) |
| CN (1) | CN108604538A (https=) |
| TW (1) | TWI740865B (https=) |
| WO (1) | WO2017106387A1 (https=) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11322652B2 (en) * | 2015-12-14 | 2022-05-03 | Ostendo Technologies, Inc. | Methods for producing composite GaN nanocolumns and light emitting structures made from the methods |
| CN109148654B (zh) * | 2018-08-30 | 2020-04-07 | 芜湖德豪润达光电科技有限公司 | 非极性面ⅲ族氮化物外延结构及其制备方法 |
| US10854646B2 (en) * | 2018-10-19 | 2020-12-01 | Attollo Engineering, LLC | PIN photodetector |
| SG11202100867RA (en) * | 2019-03-12 | 2021-03-30 | Ulvac Inc | Vacuum deposition apparatus |
| US11637219B2 (en) | 2019-04-12 | 2023-04-25 | Google Llc | Monolithic integration of different light emitting structures on a same substrate |
| CN110993755B (zh) * | 2019-12-18 | 2021-09-21 | 天津工业大学 | 电注入三维GaN核壳结构Nano-LED及制造方法 |
| WO2024084634A1 (ja) * | 2022-10-19 | 2024-04-25 | 京セラ株式会社 | 半導体基板、半導体基板の製造方法および製造装置 |
| CN116705889B (zh) * | 2023-06-28 | 2024-02-27 | 北京科技大学 | 梯度应变调控的范德华异质结型光电探测器及其制备方法 |
Family Cites Families (27)
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| WO2003089696A1 (en) * | 2002-04-15 | 2003-10-30 | The Regents Of The University Of California | Dislocation reduction in non-polar gallium nitride thin films |
| KR20060127743A (ko) * | 2005-06-06 | 2006-12-13 | 스미토모덴키고교가부시키가이샤 | 질화물 반도체 기판과 그 제조 방법 |
| JP2007048869A (ja) * | 2005-08-09 | 2007-02-22 | Sony Corp | GaN系半導体発光素子の製造方法 |
| CN101443887B (zh) * | 2006-03-10 | 2011-04-20 | Stc.Unm公司 | Gan纳米线的脉冲式生长及在族ⅲ氮化物半导体衬底材料中的应用和器件 |
| AU2007313096B2 (en) | 2006-03-10 | 2011-11-10 | Unm Rainforest Innovations | Pulsed growth of GaN nanowires and applications in group III nitride semiconductor substrate materials and devices |
| JP5082752B2 (ja) * | 2006-12-21 | 2012-11-28 | 日亜化学工業株式会社 | 半導体発光素子用基板の製造方法及びそれを用いた半導体発光素子 |
| US8964020B2 (en) * | 2007-04-25 | 2015-02-24 | Stc.Unm | Solid-state microscope for selectively imaging a sample |
| US8652947B2 (en) | 2007-09-26 | 2014-02-18 | Wang Nang Wang | Non-polar III-V nitride semiconductor and growth method |
| US7745315B1 (en) | 2007-10-03 | 2010-06-29 | Sandia Corporation | Highly aligned vertical GaN nanowires using submonolayer metal catalysts |
| US8188513B2 (en) * | 2007-10-04 | 2012-05-29 | Stc.Unm | Nanowire and larger GaN based HEMTS |
| CN101685774B (zh) * | 2008-09-24 | 2012-06-13 | 北京邮电大学 | 一种基于界面纳米结构的异质外延生长工艺 |
| US8338818B1 (en) | 2008-12-19 | 2012-12-25 | Stc.Unm | Nanowires, nanowire networks and methods for their formation and use |
| KR20100093872A (ko) * | 2009-02-17 | 2010-08-26 | 삼성엘이디 주식회사 | 질화물 반도체 발광소자 및 그 제조방법 |
| SG186312A1 (en) * | 2010-06-24 | 2013-02-28 | Glo Ab | Substrate with buffer layer for oriented nanowire growth |
| US8409892B2 (en) | 2011-04-14 | 2013-04-02 | Opto Tech Corporation | Method of selective photo-enhanced wet oxidation for nitride layer regrowth on substrates |
| WO2013015810A2 (en) | 2011-07-27 | 2013-01-31 | Hewlett-Packard Development Company, L.P. | Surface enhanced raman spectroscopy employing a nanorod in a surface indentation |
| CN103531447B (zh) * | 2012-07-06 | 2016-03-16 | 中国科学院金属研究所 | 一种降低氮化镓纳米线阵列晶体缺陷密度的方法 |
| EP2912699B1 (en) * | 2012-10-26 | 2019-12-18 | Glo Ab | Method for modifying selected portions of nanowire sized opto-electronic structure |
| US11502219B2 (en) | 2013-03-14 | 2022-11-15 | The Royal Institution For The Advancement Of Learning/Mcgill University | Methods and devices for solid state nanowire devices |
| KR102070209B1 (ko) * | 2013-07-01 | 2020-01-28 | 엘지전자 주식회사 | 성장기판 및 그를 포함하는 발광소자 |
| US9171843B2 (en) | 2013-08-02 | 2015-10-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and fabricating the same |
| US9053890B2 (en) * | 2013-08-02 | 2015-06-09 | University Health Network | Nanostructure field emission cathode structure and method for making |
| US9281442B2 (en) | 2013-12-17 | 2016-03-08 | Glo Ab | III-nitride nanowire LED with strain modified surface active region and method of making thereof |
| KR102140741B1 (ko) * | 2014-02-18 | 2020-08-03 | 엘지전자 주식회사 | 무분극 이종 기판 및 그 제조방법, 이를 이용한 질화물 반도체 발광 소자 |
| FR3019188B1 (fr) * | 2014-03-27 | 2017-11-24 | Commissariat Energie Atomique | Procede de croissance d'un element allonge a partir d'un germe forme dans un creux d'une couche ou d'un plot de nucleation |
| US9773889B2 (en) * | 2014-07-18 | 2017-09-26 | Taiwan Semiconductor Manufacturing Company Limited | Method of semiconductor arrangement formation |
| US11322652B2 (en) * | 2015-12-14 | 2022-05-03 | Ostendo Technologies, Inc. | Methods for producing composite GaN nanocolumns and light emitting structures made from the methods |
-
2016
- 2016-12-13 US US15/377,775 patent/US11322652B2/en active Active
- 2016-12-14 JP JP2018549432A patent/JP6947746B2/ja not_active Expired - Fee Related
- 2016-12-14 TW TW105141477A patent/TWI740865B/zh not_active IP Right Cessation
- 2016-12-14 KR KR1020187020188A patent/KR20180095608A/ko not_active Ceased
- 2016-12-14 WO PCT/US2016/066729 patent/WO2017106387A1/en not_active Ceased
- 2016-12-14 CN CN201680081684.XA patent/CN108604538A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US20170170363A1 (en) | 2017-06-15 |
| WO2017106387A1 (en) | 2017-06-22 |
| TWI740865B (zh) | 2021-10-01 |
| US11322652B2 (en) | 2022-05-03 |
| JP2019502273A (ja) | 2019-01-24 |
| CN108604538A (zh) | 2018-09-28 |
| TW201737317A (zh) | 2017-10-16 |
| JP6947746B2 (ja) | 2021-10-13 |
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