KR20170064567A - 내마모성 코팅 적용 시스템 및 방법 - Google Patents

내마모성 코팅 적용 시스템 및 방법 Download PDF

Info

Publication number
KR20170064567A
KR20170064567A KR1020177015020A KR20177015020A KR20170064567A KR 20170064567 A KR20170064567 A KR 20170064567A KR 1020177015020 A KR1020177015020 A KR 1020177015020A KR 20177015020 A KR20177015020 A KR 20177015020A KR 20170064567 A KR20170064567 A KR 20170064567A
Authority
KR
South Korea
Prior art keywords
plasma
substrate
precursor
atmospheric pressure
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020177015020A
Other languages
English (en)
Korean (ko)
Inventor
리암 에스.씨. 핑리
바산 에스. 순다람
마이클 아르. 시르키스
숀 엠. 페어
Original Assignee
더 보잉 컴파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 더 보잉 컴파니 filed Critical 더 보잉 컴파니
Publication of KR20170064567A publication Critical patent/KR20170064567A/ko
Ceased legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/32—Carbides
    • C23C16/325—Silicon carbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
KR1020177015020A 2009-05-04 2010-04-14 내마모성 코팅 적용 시스템 및 방법 Ceased KR20170064567A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/435,110 US8206794B2 (en) 2009-05-04 2009-05-04 System and method for applying abrasion-resistant coatings
US12/435,110 2009-05-04
PCT/US2010/031095 WO2010129149A1 (en) 2009-05-04 2010-04-14 Coating method

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020117019566A Division KR20120014113A (ko) 2009-05-04 2010-04-14 내마모성 코팅 적용 시스템 및 방법

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020197031078A Division KR20190122273A (ko) 2009-05-04 2010-04-14 내마모성 코팅 적용 시스템 및 방법

Publications (1)

Publication Number Publication Date
KR20170064567A true KR20170064567A (ko) 2017-06-09

Family

ID=42269774

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020177015020A Ceased KR20170064567A (ko) 2009-05-04 2010-04-14 내마모성 코팅 적용 시스템 및 방법
KR1020197031078A Ceased KR20190122273A (ko) 2009-05-04 2010-04-14 내마모성 코팅 적용 시스템 및 방법
KR1020117019566A Ceased KR20120014113A (ko) 2009-05-04 2010-04-14 내마모성 코팅 적용 시스템 및 방법

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020197031078A Ceased KR20190122273A (ko) 2009-05-04 2010-04-14 내마모성 코팅 적용 시스템 및 방법
KR1020117019566A Ceased KR20120014113A (ko) 2009-05-04 2010-04-14 내마모성 코팅 적용 시스템 및 방법

Country Status (6)

Country Link
US (1) US8206794B2 (https=)
EP (1) EP2430211A1 (https=)
JP (2) JP5728469B2 (https=)
KR (3) KR20170064567A (https=)
CN (1) CN102414341A (https=)
WO (1) WO2010129149A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2747921B1 (en) * 2011-08-26 2017-11-01 Exatec, LLC. Organic resin laminate, methods of making and using the same, and articles comprising the same
US20130115867A1 (en) * 2011-11-08 2013-05-09 General Electric Company Enclosure system and method for applying coating
US10787591B2 (en) * 2012-04-30 2020-09-29 The Boeing Company Composites including silicon-oxy-carbide layers and methods of making the same
JP5956074B2 (ja) 2012-08-29 2016-07-20 カーディアック ペースメイカーズ， インコーポレイテッド 医療用リードのための向上した低摩擦コーティングおよび製造方法
US9139908B2 (en) * 2013-12-12 2015-09-22 The Boeing Company Gradient thin films
EP3992330A1 (en) * 2020-10-29 2022-05-04 PartiX Powder coating method

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4770940A (en) * 1984-09-10 1988-09-13 Ovonic Synthetic Materials Company Glow discharge method of applying a carbon coating onto a substrate and coating applied thereby
US4927704A (en) * 1987-08-24 1990-05-22 General Electric Company Abrasion-resistant plastic articles and method for making them
US5344712A (en) 1990-06-29 1994-09-06 Ppg Industries, Inc. Abrasion resistant siloxane coatings containing ceria
US5433786A (en) * 1993-08-27 1995-07-18 The Dow Chemical Company Apparatus for plasma enhanced chemical vapor deposition comprising shower head electrode with magnet disposed therein
FR2711556B1 (fr) 1993-10-29 1995-12-15 Atohaas Holding Cv Procédé de dépôt d'une couche mince sur la surface d'un substrat en matière plastique.
US5508368A (en) 1994-03-03 1996-04-16 Diamonex, Incorporated Ion beam process for deposition of highly abrasion-resistant coatings
JPH10119336A (ja) * 1996-10-23 1998-05-12 Alps Electric Co Ltd サーマルヘッド及びその製造方法
US6010967A (en) * 1998-05-22 2000-01-04 Micron Technology, Inc. Plasma etching methods
EP1077479A1 (en) * 1999-08-17 2001-02-21 Applied Materials, Inc. Post-deposition treatment to enchance properties of Si-O-C low K film
US6495208B1 (en) * 1999-09-09 2002-12-17 Virginia Tech Intellectual Properties, Inc. Near-room temperature CVD synthesis of organic polymer/oxide dielectric nanocomposites
DE10131156A1 (de) 2001-06-29 2003-01-16 Fraunhofer Ges Forschung Arikel mit plasmapolymerer Beschichtung und Verfahren zu dessen Herstellung
TW200409669A (en) * 2002-04-10 2004-06-16 Dow Corning Ireland Ltd Protective coating composition
FR2843408B1 (fr) * 2002-08-06 2005-04-08 Saint Gobain Procede de formation d'un revetement sur un vitrage en matiere plastique
JP2005536635A (ja) * 2002-08-26 2005-12-02 シグマ・ラボラトリーズ・オブ・アリゾナ・インコーポレーテツド 大気圧グロー放電により生成された遮断被膜
US7468311B2 (en) * 2003-09-30 2008-12-23 Tokyo Electron Limited Deposition of silicon-containing films from hexachlorodisilane
BRPI0417284A (pt) * 2003-12-16 2007-04-10 Sun Chemical Corp método de formação de um substrato revestido e substrato revestido
CN1965104A (zh) * 2004-03-09 2007-05-16 埃克阿泰克有限责任公司 膨胀式热等离子沉积系统
US7030041B2 (en) * 2004-03-15 2006-04-18 Applied Materials Inc. Adhesion improvement for low k dielectrics
GB0410749D0 (en) * 2004-05-14 2004-06-16 Dow Corning Ireland Ltd Coating apparatus
US20060063015A1 (en) * 2004-09-23 2006-03-23 3M Innovative Properties Company Protected polymeric film
WO2006049865A1 (en) * 2004-10-29 2006-05-11 Dow Global Technologies Inc. Improved deposition rate plasma enhanced chemical vapor process
CA2582286A1 (en) * 2004-10-29 2006-05-11 Dow Global Technologies Inc. Abrasion resistant coatings by plasma enhanced chemical vapor deposition
JP2006175583A (ja) 2004-11-29 2006-07-06 Chemitoronics Co Ltd マイクロ構造体の製造方法
US8216679B2 (en) * 2005-07-27 2012-07-10 Exatec Llc Glazing system for vehicle tops and windows
US8313812B2 (en) 2005-11-30 2012-11-20 The Boeing Company Durable transparent coatings for aircraft passenger windows
US20070196633A1 (en) 2005-11-30 2007-08-23 Coak Craig E Durable transparent coatings for polymeric substrates
JP2007216435A (ja) * 2006-02-14 2007-08-30 Tomoegawa Paper Co Ltd ガスバリアフィルム基板、電極付きガスバリアフィルム基板、及びそれらを用いた表示素子
JP4968883B2 (ja) * 2006-03-30 2012-07-04 日本碍子株式会社 リモート式プラズマ処理装置
KR100914354B1 (ko) * 2006-06-05 2009-08-28 어플라이드 머티어리얼스, 인코포레이티드 Ｐｅｃｖｄ막에 대한 1차 웨이퍼 효과 제거
WO2008047549A1 (fr) * 2006-10-12 2008-04-24 Konica Minolta Holdings, Inc. Substrat de film conducteur transparent et procédé de formation d'un film conducteur transparent à base d'oxyde de titane destiné à être utilisé avec celui-ci
US7410916B2 (en) * 2006-11-21 2008-08-12 Applied Materials, Inc. Method of improving initiation layer for low-k dielectric film by digital liquid flow meter
JP5222940B2 (ja) * 2007-05-01 2013-06-26 エグザテック・リミテッド・ライアビリティー・カンパニー プラズマコーティングのエッジヒーリング及び現場修復
WO2008144658A1 (en) * 2007-05-17 2008-11-27 Exatec, Llc Apparatus and method for depositing multiple coating materials in a common plasma coating zone
GB0717430D0 (en) * 2007-09-10 2007-10-24 Dow Corning Ireland Ltd Atmospheric pressure plasma

Also Published As

Publication number Publication date
EP2430211A1 (en) 2012-03-21
US8206794B2 (en) 2012-06-26
JP5728469B2 (ja) 2015-06-03
KR20120014113A (ko) 2012-02-16
KR20190122273A (ko) 2019-10-29
WO2010129149A1 (en) 2010-11-11
JP2015163738A (ja) 2015-09-10
US20100279027A1 (en) 2010-11-04
CN102414341A (zh) 2012-04-11
JP6022629B2 (ja) 2016-11-09
JP2012526190A (ja) 2012-10-25

Similar Documents

Publication Publication Date Title
JP6022629B2 (ja) コーティング方法
JP5716663B2 (ja) 防汚性積層体
US6083313A (en) Hardcoats for flat panel display substrates
US8685544B2 (en) Durable UV blocking transparent coating
JP6107819B2 (ja) ガスバリア性フィルム、およびこれを用いる電子デバイス
KR100299403B1 (ko) 물품보호막및이를제공하는방법
RU2666198C1 (ru) Градиентные тонкие пленки
US20210206690A1 (en) Surface treatment method and surface-treated article
JPH0781023B2 (ja) 耐摩耗性ポリカーボネート物品の製造法
Supiot et al. Growth and modification of organosilicon films in PECVD and remote afterglow reactors
WO2012081555A1 (ja) ガスバリア積層体及びガスバリア積層体の製造方法
JP5861644B2 (ja) ガスバリア性フィルムの製造方法、及びガスバリア性フィルム
JPWO2009066630A1 (ja) 撥水または防汚性物品、それを用いて構成された建築用窓ガラス、車両用窓ガラス、ディスプレイ部材、光学部品
US20090311539A1 (en) Wear-resistant coating for polymeric transparencies
JP5359529B2 (ja) 撥水性物品の製造方法及び撥水性物品
EP1109947A1 (en) Hardcoats for flat panel display substrates
CN112111712A (zh) 大气常压低温等离子体镀制抗刮疏水层的方法
EP3281998B1 (en) Antifouling treatment composition, treatment apparatus, treatment method and treated article
WO2006075490A1 (ja) 透明ガスバリアフィルム
WO2006002429A2 (en) Chamberless plasma deposition of coatings
JP2010024367A (ja) 撥水性物品、建築用窓ガラス及び車両用窓ガラス
Ndalama et al. Surface modification of polyimide composites by RF plasma and UV/ozone treatments
JP2010173294A (ja) 防汚性積層体
WO2021185444A1 (en) Vacuum processing system for a flexible substrate, method of depositing a layer stack on a flexible substrate, and layer system
Jan et al. Characterization of Silicon Oxide Films Deposited from a Permanent‐Magnet Helicon Plasma Source

Legal Events

Date Code Title Description
A107 Divisional application of patent
A201 Request for examination
PA0104 Divisional application for international application

St.27 status event code: A-0-1-A10-A18-div-PA0104

St.27 status event code: A-0-1-A10-A16-div-PA0104

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

A302 Request for accelerated examination
PA0302 Request for accelerated examination

St.27 status event code: A-1-2-D10-D17-exm-PA0302

St.27 status event code: A-1-2-D10-D16-exm-PA0302

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T13-X000 Administrative time limit extension granted

St.27 status event code: U-3-3-T10-T13-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T13-X000 Administrative time limit extension granted

St.27 status event code: U-3-3-T10-T13-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T13-X000 Administrative time limit extension granted

St.27 status event code: U-3-3-T10-T13-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T13-X000 Administrative time limit extension granted

St.27 status event code: U-3-3-T10-T13-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T13-X000 Administrative time limit extension granted

St.27 status event code: U-3-3-T10-T13-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T13-X000 Administrative time limit extension granted

St.27 status event code: U-3-3-T10-T13-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T13-X000 Administrative time limit extension granted

St.27 status event code: U-3-3-T10-T13-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T13-X000 Administrative time limit extension granted

St.27 status event code: U-3-3-T10-T13-oth-X000

AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E601 Decision to refuse application
PE0601 Decision on rejection of patent

St.27 status event code: N-2-6-B10-B15-exm-PE0601

X091 Application refused [patent]
T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T13-X000 Administrative time limit extension granted

St.27 status event code: U-3-3-T10-T13-oth-X000

T13-X000 Administrative time limit extension granted

St.27 status event code: U-3-3-T10-T13-oth-X000

AMND Amendment
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PX0901 Re-examination

St.27 status event code: A-2-3-E10-E12-rex-PX0901

PX0601 Decision of rejection after re-examination

St.27 status event code: N-2-6-B10-B17-rex-PX0601

X601 Decision of rejection after re-examination
A107 Divisional application of patent
PA0104 Divisional application for international application

St.27 status event code: A-0-1-A10-A18-div-PA0104

St.27 status event code: A-0-1-A10-A16-div-PA0104

R18 Changes to party contact information recorded

Free format text: ST27 STATUS EVENT CODE: A-3-3-R10-R18-OTH-X000 (AS PROVIDED BY THE NATIONAL OFFICE)

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000