KR20160124175A - 탄성파 소자 및 이것을 이용한 래더 필터 - Google Patents

탄성파 소자 및 이것을 이용한 래더 필터 Download PDF

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Publication number
KR20160124175A
KR20160124175A KR1020167025532A KR20167025532A KR20160124175A KR 20160124175 A KR20160124175 A KR 20160124175A KR 1020167025532 A KR1020167025532 A KR 1020167025532A KR 20167025532 A KR20167025532 A KR 20167025532A KR 20160124175 A KR20160124175 A KR 20160124175A
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KR
South Korea
Prior art keywords
connection wiring
electrode
piezoelectric body
wiring
reinforcing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020167025532A
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English (en)
Korean (ko)
Inventor
요스께 하마오까
미쯔노리 미야나리
히로유끼 나까무라
히데까즈 나까니시
Original Assignee
스카이워크스 필터 솔루션즈 재팬 씨오., 엘티디.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 스카이워크스 필터 솔루션즈 재팬 씨오., 엘티디. filed Critical 스카이워크스 필터 솔루션즈 재팬 씨오., 엘티디.
Publication of KR20160124175A publication Critical patent/KR20160124175A/ko
Withdrawn legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H01L41/0472—
    • H01L41/107—
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02818—Means for compensation or elimination of undesirable effects
    • H03H9/02944—Means for compensation or elimination of undesirable effects of ohmic loss
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02992—Details of bus bars, contact pads or other electrical connections for finger electrodes
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/64—Filters using surface acoustic waves
    • H03H9/6423—Means for obtaining a particular transfer characteristic
    • H03H9/6433—Coupled resonator filters
    • H03H9/644—Coupled resonator filters having two acoustic tracks
    • H03H9/6456—Coupled resonator filters having two acoustic tracks being electrically coupled
    • H03H9/6459—Coupled resonator filters having two acoustic tracks being electrically coupled via one connecting electrode
    • H03H9/6463—Coupled resonator filters having two acoustic tracks being electrically coupled via one connecting electrode the tracks being electrically cascaded
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/64—Filters using surface acoustic waves
    • H03H9/6423—Means for obtaining a particular transfer characteristic
    • H03H9/6433—Coupled resonator filters
    • H03H9/6483—Ladder SAW filters
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/40—Piezoelectric or electrostrictive devices with electrical input and electrical output, e.g. functioning as transformers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/87—Electrodes or interconnections, e.g. leads or terminals
    • H10N30/872—Interconnections, e.g. connection electrodes of multilayer piezoelectric or electrostrictive devices
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
    • H03H9/58—Multiple crystal filters
    • H03H9/60—Electric coupling means therefor
    • H03H9/605—Electric coupling means therefor consisting of a ladder configuration

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  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
KR1020167025532A 2014-02-18 2015-02-17 탄성파 소자 및 이것을 이용한 래더 필터 Withdrawn KR20160124175A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2014-028059 2014-02-18
JP2014028059 2014-02-18
PCT/JP2015/000718 WO2015125460A1 (en) 2014-02-18 2015-02-17 Acoustic wave elements and ladder filters using same

Publications (1)

Publication Number Publication Date
KR20160124175A true KR20160124175A (ko) 2016-10-26

Family

ID=52706226

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020167025532A Withdrawn KR20160124175A (ko) 2014-02-18 2015-02-17 탄성파 소자 및 이것을 이용한 래더 필터

Country Status (5)

Country Link
US (2) US9614495B2 (enExample)
JP (2) JP6342017B2 (enExample)
KR (1) KR20160124175A (enExample)
CN (1) CN106031031B (enExample)
WO (1) WO2015125460A1 (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107852148B (zh) * 2015-08-31 2021-05-25 京瓷株式会社 声表面波元件
US11463037B2 (en) * 2020-09-10 2022-10-04 Delta Electronics, Inc. Motor control system and method of controlling the same
US12500570B2 (en) 2021-09-29 2025-12-16 Skyworks Solutions, Inc. Shear horizontal mode acoustic wave device with multilayer interdigital transducer electrode
US12506464B2 (en) 2021-12-06 2025-12-23 Skyworks Solutions, Inc. Multi-band surface acoustic wave filters
US12648470B2 (en) 2022-03-30 2026-06-02 Skyworks Solutions, Inc. Package with integrated device die at least disposed within carrier

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011071912A (ja) 2009-09-28 2011-04-07 Taiyo Yuden Co Ltd 弾性波フィルタ

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US5738931A (en) * 1994-09-16 1998-04-14 Kabushiki Kaisha Toshiba Electronic device and magnetic device
JPH1022767A (ja) * 1996-07-09 1998-01-23 Oki Electric Ind Co Ltd 表面弾性波フィルタ及びその製造方法
US7612470B2 (en) * 1999-01-12 2009-11-03 Microsemi Corp.—Analog Mixed Signal Group Ltd. System for providing power over Ethernet through a patch panel
JP3925133B2 (ja) * 2000-12-26 2007-06-06 株式会社村田製作所 弾性表面波装置の製造方法及び弾性表面波装置
JP2003087080A (ja) * 2001-07-06 2003-03-20 Murata Mfg Co Ltd 弾性表面波素子及びその製造方法
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JP2004129238A (ja) * 2002-09-10 2004-04-22 Matsushita Electric Ind Co Ltd 帯域阻止型フィルタ、フィルタ装置、アンテナ共用器、通信機器
JP3764450B2 (ja) * 2003-07-28 2006-04-05 Ｔｄｋ株式会社 表面弾性波素子、表面弾性波装置、表面弾性波デュプレクサ、及び表面弾性波素子の製造方法
JP2006074223A (ja) * 2004-08-31 2006-03-16 Murata Mfg Co Ltd 電子部品およびその製造方法
JP5023749B2 (ja) * 2007-03-16 2012-09-12 パナソニック株式会社 弾性表面波フィルタ
JP4973732B2 (ja) * 2007-07-30 2012-07-11 株式会社村田製作所 弾性波装置
US8433195B2 (en) * 2007-08-30 2013-04-30 Calix, Inc. Optical network interface devices and methods
JP4775978B2 (ja) * 2007-10-30 2011-09-21 太陽誘電株式会社 弾性波素子、デュープレクサ、通信モジュール、および通信装置
JP2011030208A (ja) * 2009-07-03 2011-02-10 Panasonic Corp 弾性波フィルタ及びこれを用いたデュプレクサ
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JP5402841B2 (ja) * 2010-06-14 2014-01-29 株式会社村田製作所 弾性表面波デバイス
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Also Published As

Publication number Publication date
US10389326B2 (en) 2019-08-20
US9614495B2 (en) 2017-04-04
JP6342017B2 (ja) 2018-06-13
JP2018170765A (ja) 2018-11-01
WO2015125460A1 (en) 2015-08-27
JP2017506866A (ja) 2017-03-09
CN106031031B (zh) 2019-03-08
CN106031031A (zh) 2016-10-12
US20170170797A1 (en) 2017-06-15
JP6513262B2 (ja) 2019-05-15
US20150236238A1 (en) 2015-08-20

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Date Code Title Description
PA0105 International application

Patent event date: 20160913

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination