KR20140136865A - 배플 기구, 박막 증착 장치 및 박막 증착 방법 - Google Patents
배플 기구, 박막 증착 장치 및 박막 증착 방법 Download PDFInfo
- Publication number
- KR20140136865A KR20140136865A KR20140038637A KR20140038637A KR20140136865A KR 20140136865 A KR20140136865 A KR 20140136865A KR 20140038637 A KR20140038637 A KR 20140038637A KR 20140038637 A KR20140038637 A KR 20140038637A KR 20140136865 A KR20140136865 A KR 20140136865A
- Authority
- KR
- South Korea
- Prior art keywords
- baffle
- thin film
- film deposition
- substrate
- deposition apparatus
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 18
- 238000000151 deposition Methods 0.000 title claims abstract description 9
- 239000010409 thin film Substances 0.000 title abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 57
- 239000000463 material Substances 0.000 claims abstract description 32
- 230000007423 decrease Effects 0.000 claims abstract description 7
- 238000000427 thin-film deposition Methods 0.000 claims description 39
- 238000001704 evaporation Methods 0.000 claims description 37
- 230000008020 evaporation Effects 0.000 claims description 36
- 230000007246 mechanism Effects 0.000 claims description 32
- 238000007736 thin film deposition technique Methods 0.000 claims description 14
- 230000003247 decreasing effect Effects 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 2
- 229910010272 inorganic material Inorganic materials 0.000 claims description 2
- 239000011147 inorganic material Substances 0.000 claims description 2
- 239000011368 organic material Substances 0.000 claims description 2
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 238000002474 experimental method Methods 0.000 abstract description 6
- 239000010408 film Substances 0.000 description 14
- 238000005516 engineering process Methods 0.000 description 4
- 230000009471 action Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000002207 thermal evaporation Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000011364 vaporized material Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310190441.8A CN103243302B (zh) | 2013-05-21 | 2013-05-21 | 挡板机构、薄膜沉积装置及薄膜沉积方法 |
| CN201310190441.8 | 2013-05-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20140136865A true KR20140136865A (ko) | 2014-12-01 |
Family
ID=48923176
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR20140038637A KR20140136865A (ko) | 2013-05-21 | 2014-04-01 | 배플 기구, 박막 증착 장치 및 박막 증착 방법 |
Country Status (2)
| Country | Link |
|---|---|
| KR (1) | KR20140136865A (zh) |
| CN (1) | CN103243302B (zh) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104570164B (zh) * | 2013-10-12 | 2016-08-10 | 江苏格林视通光学有限公司 | 一种新型镀膜机内用镜片托架 |
| CN104073776A (zh) * | 2014-07-04 | 2014-10-01 | 深圳市华星光电技术有限公司 | 一种化学气相沉积设备 |
| JP6698509B2 (ja) * | 2016-12-14 | 2020-05-27 | 株式会社神戸製鋼所 | ターゲット用シャッタ機構およびそれを備えた成膜装置 |
| CN107267919B (zh) * | 2017-06-28 | 2019-08-16 | 武汉华星光电半导体显示技术有限公司 | 蒸镀用的蒸发源装置 |
| CN107365962A (zh) * | 2017-08-29 | 2017-11-21 | 京东方科技集团股份有限公司 | 一种限制结构、限制装置及其调节方法和蒸镀系统 |
| CN111315917A (zh) * | 2017-11-15 | 2020-06-19 | 应用材料公司 | 用于热处理基板的设备、用于运输柔性基板的设备、以及用于热处理基板的方法 |
| CN114127909A (zh) * | 2019-07-25 | 2022-03-01 | 应用材料公司 | 用于在竖直取向上蒸镀oled层堆叠物的系统和方法 |
| TWI793810B (zh) * | 2021-10-15 | 2023-02-21 | 天虹科技股份有限公司 | 雙開式遮蔽機構及具有雙開式遮蔽機構的薄膜沉積機台 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101280418B (zh) * | 2008-04-29 | 2010-09-01 | 南京邮电大学 | 具有多层辐射式蒸发源分布结构的多源真空蒸镀装置 |
| CN201372308Y (zh) * | 2009-03-19 | 2009-12-30 | 国家纳米科学中心 | 一种用于柔性衬底大面积薄膜制备的真空热蒸镀设备 |
| CN102433538A (zh) * | 2010-09-29 | 2012-05-02 | 鸿富锦精密工业（深圳）有限公司 | 溅镀设备 |
| CN103014620B (zh) * | 2013-01-04 | 2015-04-08 | 四川虹视显示技术有限公司 | Oled玻璃基板蒸镀机 |
-
2013
- 2013-05-21 CN CN201310190441.8A patent/CN103243302B/zh active Active
-
2014
- 2014-04-01 KR KR20140038637A patent/KR20140136865A/ko not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| CN103243302B (zh) | 2015-07-08 |
| CN103243302A (zh) | 2013-08-14 |
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| A201 | Request for examination | ||
| E902 | Notification of reason for refusal | ||
| E601 | Decision to refuse application |