CN103243302B - 挡板机构、薄膜沉积装置及薄膜沉积方法 - Google Patents
挡板机构、薄膜沉积装置及薄膜沉积方法 Download PDFInfo
- Publication number
- CN103243302B CN103243302B CN201310190441.8A CN201310190441A CN103243302B CN 103243302 B CN103243302 B CN 103243302B CN 201310190441 A CN201310190441 A CN 201310190441A CN 103243302 B CN103243302 B CN 103243302B
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- CN
- China
- Prior art keywords
- baffle
- perforate
- baffle plate
- substrate
- film deposition
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (13)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310190441.8A CN103243302B (zh) | 2013-05-21 | 2013-05-21 | 挡板机构、薄膜沉积装置及薄膜沉积方法 |
KR20140038637A KR20140136865A (ko) | 2013-05-21 | 2014-04-01 | 배플 기구, 박막 증착 장치 및 박막 증착 방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310190441.8A CN103243302B (zh) | 2013-05-21 | 2013-05-21 | 挡板机构、薄膜沉积装置及薄膜沉积方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103243302A CN103243302A (zh) | 2013-08-14 |
CN103243302B true CN103243302B (zh) | 2015-07-08 |
Family
ID=48923176
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201310190441.8A Active CN103243302B (zh) | 2013-05-21 | 2013-05-21 | 挡板机构、薄膜沉积装置及薄膜沉积方法 |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR20140136865A (zh) |
CN (1) | CN103243302B (zh) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104570164B (zh) * | 2013-10-12 | 2016-08-10 | 江苏格林视通光学有限公司 | 一种新型镀膜机内用镜片托架 |
CN104073776A (zh) * | 2014-07-04 | 2014-10-01 | 深圳市华星光电技术有限公司 | 一种化学气相沉积设备 |
JP6698509B2 (ja) * | 2016-12-14 | 2020-05-27 | 株式会社神戸製鋼所 | ターゲット用シャッタ機構およびそれを備えた成膜装置 |
CN107267919B (zh) * | 2017-06-28 | 2019-08-16 | 武汉华星光电半导体显示技术有限公司 | 蒸镀用的蒸发源装置 |
CN107365962A (zh) * | 2017-08-29 | 2017-11-21 | 京东方科技集团股份有限公司 | 一种限制结构、限制装置及其调节方法和蒸镀系统 |
CN111315917A (zh) * | 2017-11-15 | 2020-06-19 | 应用材料公司 | 用于热处理基板的设备、用于运输柔性基板的设备、以及用于热处理基板的方法 |
CN114127909A (zh) * | 2019-07-25 | 2022-03-01 | 应用材料公司 | 用于在竖直取向上蒸镀oled层堆叠物的系统和方法 |
TWI793810B (zh) * | 2021-10-15 | 2023-02-21 | 天虹科技股份有限公司 | 雙開式遮蔽機構及具有雙開式遮蔽機構的薄膜沉積機台 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101280418A (zh) * | 2008-04-29 | 2008-10-08 | 南京邮电大学 | 具有多层辐射式蒸发源分布结构的多源真空蒸镀装置 |
CN201372308Y (zh) * | 2009-03-19 | 2009-12-30 | 国家纳米科学中心 | 一种用于柔性衬底大面积薄膜制备的真空热蒸镀设备 |
CN102433538A (zh) * | 2010-09-29 | 2012-05-02 | 鸿富锦精密工业(深圳)有限公司 | 溅镀设备 |
CN103014620A (zh) * | 2013-01-04 | 2013-04-03 | 四川虹视显示技术有限公司 | Oled玻璃基板蒸镀机 |
-
2013
- 2013-05-21 CN CN201310190441.8A patent/CN103243302B/zh active Active
-
2014
- 2014-04-01 KR KR20140038637A patent/KR20140136865A/ko not_active Application Discontinuation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101280418A (zh) * | 2008-04-29 | 2008-10-08 | 南京邮电大学 | 具有多层辐射式蒸发源分布结构的多源真空蒸镀装置 |
CN201372308Y (zh) * | 2009-03-19 | 2009-12-30 | 国家纳米科学中心 | 一种用于柔性衬底大面积薄膜制备的真空热蒸镀设备 |
CN102433538A (zh) * | 2010-09-29 | 2012-05-02 | 鸿富锦精密工业(深圳)有限公司 | 溅镀设备 |
CN103014620A (zh) * | 2013-01-04 | 2013-04-03 | 四川虹视显示技术有限公司 | Oled玻璃基板蒸镀机 |
Also Published As
Publication number | Publication date |
---|---|
KR20140136865A (ko) | 2014-12-01 |
CN103243302A (zh) | 2013-08-14 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder |
Address after: 201500, building two, building 100, 1, Jinshan Industrial Road, 208, Shanghai, Jinshan District Patentee after: Shanghai Hehui optoelectronic Co., Ltd Address before: 201500, building two, building 100, 1, Jinshan Industrial Road, 208, Shanghai, Jinshan District Patentee before: EverDisplay Optronics (Shanghai) Ltd. |
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CP01 | Change in the name or title of a patent holder | ||
CP02 | Change in the address of a patent holder |
Address after: 201506, No. nine, No. 1568, Jinshan Industrial Zone, Shanghai, Jinshan District Patentee after: Shanghai Hehui optoelectronic Co., Ltd Address before: 201500, building two, building 100, 1, Jinshan Industrial Road, 208, Shanghai, Jinshan District Patentee before: Shanghai Hehui optoelectronic Co., Ltd |
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CP02 | Change in the address of a patent holder |