KR20140070399A - 테이퍼진 사이드 쉴드 측벽들을 갖는 데이터 라이터 - Google Patents
테이퍼진 사이드 쉴드 측벽들을 갖는 데이터 라이터 Download PDFInfo
- Publication number
- KR20140070399A KR20140070399A KR1020130143035A KR20130143035A KR20140070399A KR 20140070399 A KR20140070399 A KR 20140070399A KR 1020130143035 A KR1020130143035 A KR 1020130143035A KR 20130143035 A KR20130143035 A KR 20130143035A KR 20140070399 A KR20140070399 A KR 20140070399A
- Authority
- KR
- South Korea
- Prior art keywords
- shield
- tip
- write pole
- pole
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000010410 layer Substances 0.000 description 14
- 238000013500 data storage Methods 0.000 description 12
- 238000010586 diagram Methods 0.000 description 11
- 239000000463 material Substances 0.000 description 8
- 238000003860 storage Methods 0.000 description 7
- 230000004907 flux Effects 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000003475 lamination Methods 0.000 description 4
- 230000005415 magnetization Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000002463 transducing effect Effects 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 1
- 230000003542 behavioural effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000007885 magnetic separation Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/187—Structure or manufacture of the surface of the head in physical contact with, or immediately adjacent to the recording medium; Pole pieces; Gap features
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/14—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3906—Details related to the use of magnetic thin film layers or to their effects
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/22—Heat treatment; Thermal decomposition; Chemical vapour deposition
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Hall/Mr Elements (AREA)
- Thin Magnetic Films (AREA)
- Magnetic Heads (AREA)
- Mram Or Spin Memory Techniques (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/689,409 | 2012-11-29 | ||
| US13/689,409 US9034150B2 (en) | 2012-11-29 | 2012-11-29 | Thin film with tuned anisotropy and magnetic moment |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR20150028228A Division KR20150035892A (ko) | 2012-11-29 | 2015-02-27 | 테이퍼진 사이드 쉴드 측벽들을 갖는 데이터 라이터 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20140070399A true KR20140070399A (ko) | 2014-06-10 |
Family
ID=49916807
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020130143035A Ceased KR20140070399A (ko) | 2012-11-29 | 2013-11-22 | 테이퍼진 사이드 쉴드 측벽들을 갖는 데이터 라이터 |
| KR20150028228A Withdrawn KR20150035892A (ko) | 2012-11-29 | 2015-02-27 | 테이퍼진 사이드 쉴드 측벽들을 갖는 데이터 라이터 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR20150028228A Withdrawn KR20150035892A (ko) | 2012-11-29 | 2015-02-27 | 테이퍼진 사이드 쉴드 측벽들을 갖는 데이터 라이터 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9034150B2 (enExample) |
| EP (1) | EP2738137A1 (enExample) |
| JP (1) | JP6046597B2 (enExample) |
| KR (2) | KR20140070399A (enExample) |
| CN (1) | CN103855298B (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9856557B1 (en) | 2016-01-22 | 2018-01-02 | Seagate Technology Llc | Fabrication of a multi-layered magnetic element |
| US10170691B2 (en) * | 2016-01-28 | 2019-01-01 | SK Hynix Inc. | Electronic device and method for fabricating the same |
| US11031032B1 (en) * | 2017-04-03 | 2021-06-08 | Seagate Technology Llc | Cryogenic magnetic alloys with less grain refinement dopants |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62238614A (ja) * | 1986-04-09 | 1987-10-19 | Fujitsu Ltd | 異方性磁性膜の製造方法 |
| US5590389A (en) | 1994-12-23 | 1996-12-31 | Johnson Matthey Electronics, Inc. | Sputtering target with ultra-fine, oriented grains and method of making same |
| US5764567A (en) | 1996-11-27 | 1998-06-09 | International Business Machines Corporation | Magnetic tunnel junction device with nonferromagnetic interface layer for improved magnetic field response |
| JP2924785B2 (ja) | 1996-04-25 | 1999-07-26 | 日本電気株式会社 | 磁気抵抗効果素子薄膜及びその製造方法 |
| US6139951A (en) | 1997-12-12 | 2000-10-31 | Seagate Technology Llc | Magnetic recording medium with low temperature seedlayer for high signal-to-noise ratio |
| JP3677423B2 (ja) | 1999-12-28 | 2005-08-03 | 株式会社東芝 | 熱アシスト磁気記録方法及び熱アシスト磁気記録装置 |
| US6740397B1 (en) | 2000-05-24 | 2004-05-25 | Seagate Technology Llc | Subseedlayers for magnetic recording media |
| US6946039B1 (en) | 2000-11-02 | 2005-09-20 | Honeywell International Inc. | Physical vapor deposition targets, and methods of fabricating metallic materials |
| JP3619769B2 (ja) * | 2000-11-09 | 2005-02-16 | Tdk株式会社 | 磁気抵抗効果素子の製造方法 |
| JP3890893B2 (ja) | 2000-12-28 | 2007-03-07 | 日本電気株式会社 | スピントンネル磁気抵抗効果膜及び素子及びそれを用いた磁気抵抗センサー、及び磁気装置及びその製造方法 |
| JP2003198002A (ja) * | 2001-12-25 | 2003-07-11 | Fujitsu Ltd | 磁気抵抗効果膜および強磁性積層構造体 |
| US6791796B2 (en) | 2002-05-28 | 2004-09-14 | Seagate Technology Llc | Perpendicular writer with laminated main pole |
| JP2004326888A (ja) * | 2003-04-23 | 2004-11-18 | Sony Corp | 磁気記録媒体 |
| US6818961B1 (en) | 2003-06-30 | 2004-11-16 | Freescale Semiconductor, Inc. | Oblique deposition to induce magnetic anisotropy for MRAM cells |
| US7061731B2 (en) | 2003-11-17 | 2006-06-13 | Seagate Technology Llc | High magnetic anisotropy hard magnetic bias element |
| JP4529081B2 (ja) * | 2004-11-30 | 2010-08-25 | Tdk株式会社 | 磁性薄膜 |
| JP4503098B2 (ja) * | 2007-08-29 | 2010-07-14 | キヤノンアネルバ株式会社 | スパッタリングによる成膜方法とその装置 |
| US7914916B2 (en) | 2008-02-04 | 2011-03-29 | Seagate Technology Llc | Thermally stable high anisotropic high magnetic moment films |
| WO2009154009A1 (ja) * | 2008-06-20 | 2009-12-23 | キヤノンアネルバ株式会社 | 磁気抵抗素子の製造方法、スパッタ成膜チャンバー、スパッタ成膜チャンバーを有する磁気抵抗素子の製造装置、プログラム、記憶媒体 |
| US8776542B2 (en) * | 2009-12-25 | 2014-07-15 | Canon Anelva Corporation | Cooling system |
| JP2012140672A (ja) * | 2010-12-28 | 2012-07-26 | Canon Anelva Corp | スパッタリング装置 |
| JP5882934B2 (ja) * | 2012-05-09 | 2016-03-09 | シーゲイト テクノロジー エルエルシー | スパッタリング装置 |
-
2012
- 2012-11-29 US US13/689,409 patent/US9034150B2/en active Active
-
2013
- 2013-11-22 KR KR1020130143035A patent/KR20140070399A/ko not_active Ceased
- 2013-11-27 EP EP20130194711 patent/EP2738137A1/en not_active Ceased
- 2013-11-28 JP JP2013246158A patent/JP6046597B2/ja not_active Expired - Fee Related
- 2013-11-28 CN CN201310625298.0A patent/CN103855298B/zh not_active Expired - Fee Related
-
2015
- 2015-02-27 KR KR20150028228A patent/KR20150035892A/ko not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| US9034150B2 (en) | 2015-05-19 |
| JP2014112677A (ja) | 2014-06-19 |
| US20140147702A1 (en) | 2014-05-29 |
| EP2738137A1 (en) | 2014-06-04 |
| CN103855298B (zh) | 2017-12-22 |
| JP6046597B2 (ja) | 2016-12-21 |
| KR20150035892A (ko) | 2015-04-07 |
| CN103855298A (zh) | 2014-06-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20131122 |
|
| PA0201 | Request for examination | ||
| PG1501 | Laying open of application | ||
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20140829 Patent event code: PE09021S01D |
|
| A107 | Divisional application of patent | ||
| PA0107 | Divisional application |
Comment text: Divisional Application of Patent Patent event date: 20150227 Patent event code: PA01071R01D |
|
| E601 | Decision to refuse application | ||
| PE0601 | Decision on rejection of patent |
Patent event date: 20150323 Comment text: Decision to Refuse Application Patent event code: PE06012S01D Patent event date: 20140829 Comment text: Notification of reason for refusal Patent event code: PE06011S01I |
|
| PC1202 | Submission of document of withdrawal before decision of registration |
Comment text: [Withdrawal of Procedure relating to Patent, etc.] Withdrawal (Abandonment) Patent event code: PC12021R01D Patent event date: 20150623 |
|
| WITB | Written withdrawal of application |