KR20140046458A - 래핑 캐리어 및 그 사용 방법 - Google Patents

래핑 캐리어 및 그 사용 방법 Download PDF

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Publication number
KR20140046458A
KR20140046458A KR1020147003124A KR20147003124A KR20140046458A KR 20140046458 A KR20140046458 A KR 20140046458A KR 1020147003124 A KR1020147003124 A KR 1020147003124A KR 20147003124 A KR20147003124 A KR 20147003124A KR 20140046458 A KR20140046458 A KR 20140046458A
Authority
KR
South Korea
Prior art keywords
layer
carrier
base
wrapping
outer polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020147003124A
Other languages
English (en)
Korean (ko)
Inventor
에릭 씨 코드
빈센트 디 로메로
개리 엠 팔름그렌
Original Assignee
쓰리엠 이노베이티브 프로퍼티즈 컴파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 쓰리엠 이노베이티브 프로퍼티즈 컴파니 filed Critical 쓰리엠 이노베이티브 프로퍼티즈 컴파니
Publication of KR20140046458A publication Critical patent/KR20140046458A/ko
Withdrawn legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/28—Work carriers for double side lapping of plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/10—Single-purpose machines or devices
    • B24B7/16—Single-purpose machines or devices for grinding end-faces, e.g. of gauges, rollers, nuts, piston rings
    • B24B7/17—Single-purpose machines or devices for grinding end-faces, e.g. of gauges, rollers, nuts, piston rings for simultaneously grinding opposite and parallel end faces, e.g. double disc grinders

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
KR1020147003124A 2011-07-11 2012-07-09 래핑 캐리어 및 그 사용 방법 Withdrawn KR20140046458A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201161506253P 2011-07-11 2011-07-11
US61/506,253 2011-07-11
US13/489,132 US20130017765A1 (en) 2011-07-11 2012-06-05 Lapping carrier and method of using the same
US13/489,132 2012-06-05
PCT/US2012/045926 WO2013009685A1 (en) 2011-07-11 2012-07-09 Lapping carrier and method of using the same

Publications (1)

Publication Number Publication Date
KR20140046458A true KR20140046458A (ko) 2014-04-18

Family

ID=46548849

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147003124A Withdrawn KR20140046458A (ko) 2011-07-11 2012-07-09 래핑 캐리어 및 그 사용 방법

Country Status (6)

Country Link
US (1) US20130017765A1 (enExample)
JP (1) JP2014522737A (enExample)
KR (1) KR20140046458A (enExample)
CN (1) CN103648716A (enExample)
TW (1) TW201309418A (enExample)
WO (1) WO2013009685A1 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10058970B2 (en) 2014-05-02 2018-08-28 3M Innovative Properties Company Interrupted structured abrasive article and methods of polishing a workpiece
JP5834331B1 (ja) * 2014-05-08 2015-12-16 冨士ベークライト株式会社 研磨キャリア及びその製造方法
CN105881198A (zh) * 2014-12-29 2016-08-24 天津西美科技有限公司 一种抛光模板用吸附垫片
CN105128448A (zh) * 2015-09-28 2015-12-09 无锡贺邦金属制品有限公司 高耐磨金属制品
JP6424809B2 (ja) * 2015-12-11 2018-11-21 信越半導体株式会社 ウェーハの両面研磨方法
WO2017142805A1 (en) * 2016-02-16 2017-08-24 3M Innovative Properties Company Polishing systems and methods of making and using same
US10556317B2 (en) 2016-03-03 2020-02-11 P.R. Hoffman Machine Products Inc. Polishing machine wafer holder
EP3707218A1 (en) * 2017-11-08 2020-09-16 3M Innovative Properties Company Adhesive primer for flexographic plate mounting tape
CN110000696A (zh) * 2017-12-29 2019-07-12 比亚迪股份有限公司 耐磨治具及其制备方法
US20200171623A1 (en) * 2018-11-30 2020-06-04 Taiwan Semiconductor Manufacturing Co., Ltd. Wafer backside cleaning apparatus and method of cleaning wafer backside
JP7205423B2 (ja) * 2018-12-17 2023-01-17 Ａｇｃ株式会社 ガラス基板の保持用膜体、及びガラス基板の研磨方法
WO2020225750A1 (en) * 2019-05-07 2020-11-12 3M Innovative Properties Company Adhesive primer for flexographic plate mounting tape
CN113146465B (zh) * 2021-04-06 2023-03-21 安徽禾臣新材料有限公司 一种薄型晶片双面研磨用吸附垫及生产方法
CN115990825A (zh) * 2022-12-27 2023-04-21 西安奕斯伟材料科技股份有限公司 一种硅片双面抛光用的载具、双面抛光装置及硅片

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0373265A (ja) * 1989-05-02 1991-03-28 Sekisui Chem Co Ltd 被研磨物保持用キャリヤ及びその製造方法
US5193316A (en) * 1991-10-29 1993-03-16 Texas Instruments Incorporated Semiconductor wafer polishing using a hydrostatic medium
US5882245A (en) * 1997-02-28 1999-03-16 Advanced Ceramics Research, Inc. Polymer carrier gears for polishing of flat objects
US6030280A (en) * 1997-07-23 2000-02-29 Speedfam Corporation Apparatus for holding workpieces during lapping, honing, and polishing
JPH1158223A (ja) * 1997-08-12 1999-03-02 Nitto Shinko Kk 研磨治具及びその製造方法
US6419555B1 (en) 1999-06-03 2002-07-16 Brian D. Goers Process and apparatus for polishing a workpiece
US6709981B2 (en) * 2000-08-16 2004-03-23 Memc Electronic Materials, Inc. Method and apparatus for processing a semiconductor wafer using novel final polishing method
JP2002371262A (ja) * 2001-06-14 2002-12-26 Nitto Denko Corp ウエハ加工用粘着シート用粘着剤およびウエハ加工用粘着シート
US20040040656A1 (en) * 2002-08-28 2004-03-04 Hengel Raymond J. Method and apparatus for CMP retaining ring
US20040261945A1 (en) * 2002-10-02 2004-12-30 Ensinger Kunststofftechnoligie Gbr Retaining ring for holding semiconductor wafers in a chemical mechanical polishing apparatus
US7008308B2 (en) * 2003-05-20 2006-03-07 Memc Electronic Materials, Inc. Wafer carrier
US7186629B2 (en) * 2003-11-19 2007-03-06 Advanced Materials Sciences, Inc. Protecting thin semiconductor wafers during back-grinding in high-volume production
JP4897238B2 (ja) * 2005-05-17 2012-03-14 東洋ゴム工業株式会社 研磨パッド
US8137157B2 (en) * 2006-11-21 2012-03-20 3M Innovative Properties Company Lapping carrier and method
DE102007056628B4 (de) * 2007-03-19 2019-03-14 Siltronic Ag Verfahren und Vorrichtung zum gleichzeitigen Schleifen mehrerer Halbleiterscheiben
US8642112B2 (en) * 2008-07-16 2014-02-04 Zimmer, Inc. Thermally treated ceramic coating for implants
CN102325629A (zh) 2008-12-31 2012-01-18 3M创新有限公司 用于研磨的涂布的载体及制备和使用方法

Also Published As

Publication number Publication date
TW201309418A (zh) 2013-03-01
CN103648716A (zh) 2014-03-19
US20130017765A1 (en) 2013-01-17
JP2014522737A (ja) 2014-09-08
WO2013009685A1 (en) 2013-01-17

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Legal Events

Date Code Title Description
PA0105 International application

Patent event date: 20140206

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid