KR20140015406A - 기능성 액체 토출 장치, 기능성 액체 토출 방법 및 임프린팅 시스템 - Google Patents

기능성 액체 토출 장치, 기능성 액체 토출 방법 및 임프린팅 시스템 Download PDF

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Publication number
KR20140015406A
KR20140015406A KR1020137025335A KR20137025335A KR20140015406A KR 20140015406 A KR20140015406 A KR 20140015406A KR 1020137025335 A KR1020137025335 A KR 1020137025335A KR 20137025335 A KR20137025335 A KR 20137025335A KR 20140015406 A KR20140015406 A KR 20140015406A
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KR
South Korea
Prior art keywords
liquid
substrate
functional liquid
viscosity
slope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020137025335A
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English (en)
Korean (ko)
Inventor
겐이치 고다마
구니히코 고다마
다다시 오마츠
Original Assignee
후지필름 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 후지필름 가부시키가이샤 filed Critical 후지필름 가부시키가이샤
Publication of KR20140015406A publication Critical patent/KR20140015406A/ko
Ceased legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/015—Ink jet characterised by the jet generation process
    • B41J2/04—Ink jet characterised by the jet generation process generating single droplets or particles on demand
    • B41J2/045—Ink jet characterised by the jet generation process generating single droplets or particles on demand by pressure, e.g. electromechanical transducers
    • B41J2/04501—Control methods or devices therefor, e.g. driver circuits, control circuits
    • B41J2/04571—Control methods or devices therefor, e.g. driver circuits, control circuits detecting viscosity
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/015—Ink jet characterised by the jet generation process
    • B41J2/04—Ink jet characterised by the jet generation process generating single droplets or particles on demand
    • B41J2/045—Ink jet characterised by the jet generation process generating single droplets or particles on demand by pressure, e.g. electromechanical transducers
    • B41J2/04501—Control methods or devices therefor, e.g. driver circuits, control circuits
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/015—Ink jet characterised by the jet generation process
    • B41J2/04—Ink jet characterised by the jet generation process generating single droplets or particles on demand
    • B41J2/045—Ink jet characterised by the jet generation process generating single droplets or particles on demand by pressure, e.g. electromechanical transducers
    • B41J2/04501—Control methods or devices therefor, e.g. driver circuits, control circuits
    • B41J2/04581—Control methods or devices therefor, e.g. driver circuits, control circuits controlling heads based on piezoelectric elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/015—Ink jet characterised by the jet generation process
    • B41J2/04—Ink jet characterised by the jet generation process generating single droplets or particles on demand
    • B41J2/045—Ink jet characterised by the jet generation process generating single droplets or particles on demand by pressure, e.g. electromechanical transducers
    • B41J2/04501—Control methods or devices therefor, e.g. driver circuits, control circuits
    • B41J2/04591—Width of the driving signal being adjusted
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
KR1020137025335A 2011-03-25 2012-03-23 기능성 액체 토출 장치, 기능성 액체 토출 방법 및 임프린팅 시스템 Ceased KR20140015406A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2011-068531 2011-03-25
JP2011068531 2011-03-25
PCT/JP2012/058504 WO2012133728A1 (en) 2011-03-25 2012-03-23 Functional liquid ejection apparatus, functional liquid ejection method and imprinting system

Publications (1)

Publication Number Publication Date
KR20140015406A true KR20140015406A (ko) 2014-02-06

Family

ID=46931426

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020137025335A Ceased KR20140015406A (ko) 2011-03-25 2012-03-23 기능성 액체 토출 장치, 기능성 액체 토출 방법 및 임프린팅 시스템

Country Status (5)

Country Link
US (1) US20140285550A1 (https=)
EP (1) EP2689450A4 (https=)
JP (1) JP2012216799A (https=)
KR (1) KR20140015406A (https=)
WO (1) WO2012133728A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160007375A (ko) * 2014-07-11 2016-01-20 캐논 가부시끼가이샤 액체 토출 장치, 임프린트 장치 및 물품 제조 방법
KR20160012959A (ko) * 2014-07-25 2016-02-03 캐논 가부시끼가이샤 액체 토출 장치, 임프린트 장치 및 물품 제조 방법

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6748399B2 (ja) * 2012-11-30 2020-09-02 キヤノン株式会社 インプリント方法およびインプリント用硬化性組成物
KR102152817B1 (ko) * 2012-12-11 2020-09-08 다이요 잉키 세이조 가부시키가이샤 광경화성 수지 조성물, 솔더 레지스트 및 프린트 배선판
JP6429792B2 (ja) * 2013-11-22 2018-11-28 綜研化学株式会社 ステップアンドリピート方式のインプリント技術を用いた構造体の製造方法
WO2016084167A1 (ja) 2014-11-26 2016-06-02 ギガフォトン株式会社 加振ユニット、ターゲット供給装置および極端紫外光生成システム
JP6623934B2 (ja) * 2016-05-27 2019-12-25 Jsr株式会社 インプリント用感放射線性組成物及びパターン
JP6960239B2 (ja) * 2017-05-08 2021-11-05 キヤノン株式会社 インプリント装置およびその制御方法
JP7221642B2 (ja) * 2017-10-25 2023-02-14 芝浦機械株式会社 転写装置
CN109709766B (zh) 2017-10-25 2023-06-16 东芝机械株式会社 转印装置
US11927883B2 (en) 2018-03-30 2024-03-12 Canon Kabushiki Kaisha Method and apparatus to reduce variation of physical attribute of droplets using performance characteristic of dispensers
JP7638824B2 (ja) * 2021-08-19 2025-03-04 富士フイルム株式会社 インプリント用硬化性組成物、硬化物、インプリントパターンの製造方法及びデバイスの製造方法

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JP2005193221A (ja) * 2003-02-25 2005-07-21 Seiko Epson Corp 駆動波形決定装置、電気光学装置および電子機器
JP2004361234A (ja) * 2003-06-04 2004-12-24 Seiko Epson Corp 液滴吐出評価試験装置
US7281778B2 (en) * 2004-03-15 2007-10-16 Fujifilm Dimatix, Inc. High frequency droplet ejection device and method
US8491076B2 (en) * 2004-03-15 2013-07-23 Fujifilm Dimatix, Inc. Fluid droplet ejection devices and methods
US7410233B2 (en) * 2004-12-10 2008-08-12 Konica Minolta Holdings, Inc. Liquid droplet ejecting apparatus and a method of driving a liquid droplet ejecting head
JP2006168296A (ja) * 2004-12-20 2006-06-29 Seiko Epson Corp 液滴吐出装置、ヘッド駆動方法および電気光学装置の製造方法
US7513586B2 (en) * 2005-03-31 2009-04-07 Fujifilm Corporation Waveform signal driven liquid ejection apparatus and image forming apparatus
JP2006297176A (ja) * 2005-04-15 2006-11-02 Seiko Epson Corp 液滴吐出装置およびその駆動方法
JP5309436B2 (ja) * 2006-10-16 2013-10-09 日立化成株式会社 樹脂製微細構造物、その製造方法及び重合性樹脂組成物
JP5002422B2 (ja) * 2007-11-14 2012-08-15 株式会社日立ハイテクノロジーズ ナノプリント用樹脂スタンパ
JP2009233976A (ja) * 2008-03-26 2009-10-15 Fujifilm Corp インクジェット記録による印刷物の作製方法
JP5035069B2 (ja) * 2008-03-28 2012-09-26 セイコーエプソン株式会社 液体噴射駆動装置並びにこれを具備する液体噴射ヘッド及び液体噴射装置
JP2010253884A (ja) * 2009-04-28 2010-11-11 Panasonic Corp インクジェットによる液体の吐出方法およびインクジェット装置
JP5440412B2 (ja) * 2009-06-29 2014-03-12 コニカミノルタ株式会社 インクジェット記録装置及び記録ヘッドの駆動方法
JP5428970B2 (ja) * 2009-07-13 2014-02-26 セイコーエプソン株式会社 液体吐出装置、及び、液体吐出方法
JP2011071500A (ja) * 2009-08-31 2011-04-07 Fujifilm Corp パターン転写装置及びパターン形成方法
JP5699427B2 (ja) * 2009-10-05 2015-04-08 セイコーエプソン株式会社 液体噴射装置、及び、液体噴射装置の制御方法
JP5337776B2 (ja) * 2010-09-24 2013-11-06 富士フイルム株式会社 ナノインプリント方法およびそれを利用した基板の加工方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160007375A (ko) * 2014-07-11 2016-01-20 캐논 가부시끼가이샤 액체 토출 장치, 임프린트 장치 및 물품 제조 방법
US10093103B2 (en) 2014-07-11 2018-10-09 Canon Kabushiki Kaisha Liquid discharge apparatus, imprint apparatus, and article manufacturing method
KR20160012959A (ko) * 2014-07-25 2016-02-03 캐논 가부시끼가이샤 액체 토출 장치, 임프린트 장치 및 물품 제조 방법

Also Published As

Publication number Publication date
US20140285550A1 (en) 2014-09-25
EP2689450A4 (en) 2014-09-24
WO2012133728A1 (en) 2012-10-04
JP2012216799A (ja) 2012-11-08
EP2689450A1 (en) 2014-01-29

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