KR20130121905A - 증발 유닛 및 진공 코팅 장치 - Google Patents

증발 유닛 및 진공 코팅 장치 Download PDF

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Publication number
KR20130121905A
KR20130121905A KR1020137016997A KR20137016997A KR20130121905A KR 20130121905 A KR20130121905 A KR 20130121905A KR 1020137016997 A KR1020137016997 A KR 1020137016997A KR 20137016997 A KR20137016997 A KR 20137016997A KR 20130121905 A KR20130121905 A KR 20130121905A
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KR
South Korea
Prior art keywords
coating
evaporation
drum
evaporator
evaporators
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
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KR1020137016997A
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English (en)
Korean (ko)
Inventor
슈테판 하인
게르트 호프만
Original Assignee
어플라이드 머티어리얼스, 인코포레이티드
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Application filed by 어플라이드 머티어리얼스, 인코포레이티드 filed Critical 어플라이드 머티어리얼스, 인코포레이티드
Publication of KR20130121905A publication Critical patent/KR20130121905A/ko
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR1020137016997A 2010-12-01 2010-12-01 증발 유닛 및 진공 코팅 장치 Ceased KR20130121905A (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2010/068661 WO2012072132A1 (en) 2010-12-01 2010-12-01 Evaporation unit and vacuum coating apparatus

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020177037777A Division KR20180002912A (ko) 2010-12-01 2010-12-01 증발 유닛 및 진공 코팅 장치

Publications (1)

Publication Number Publication Date
KR20130121905A true KR20130121905A (ko) 2013-11-06

Family

ID=44310090

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020137016997A Ceased KR20130121905A (ko) 2010-12-01 2010-12-01 증발 유닛 및 진공 코팅 장치
KR1020177037777A Ceased KR20180002912A (ko) 2010-12-01 2010-12-01 증발 유닛 및 진공 코팅 장치

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020177037777A Ceased KR20180002912A (ko) 2010-12-01 2010-12-01 증발 유닛 및 진공 코팅 장치

Country Status (6)

Country Link
US (1) US20140030435A1 (enExample)
EP (1) EP2646594A1 (enExample)
JP (1) JP2013544322A (enExample)
KR (2) KR20130121905A (enExample)
CN (1) CN103249861B (enExample)
WO (1) WO2012072132A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160102059A (ko) * 2013-12-23 2016-08-26 어플라이드 머티어리얼스, 인코포레이티드 진공 프로세스 동안 기판을 유지하기 위한 유지 배열체, 기판 상에 층을 증착시키기 위한 장치, 및 유지 배열체를 컨베잉하기 위한 방법
KR20160118251A (ko) * 2014-02-04 2016-10-11 어플라이드 머티어리얼스, 인코포레이티드 캐리어에 의해 지지되는 기판 상에 하나 또는 그 초과의 층들을 증착하기 위한 시스템 및 그러한 시스템을 사용하는 방법

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023018600A1 (en) 2021-08-12 2023-02-16 Applied Materials, Inc. Evaporator for effective surface area evaporation
WO2024233688A1 (en) * 2023-05-11 2024-11-14 Applied Materials, Inc. Spinning disk centripetal coater

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2665226A (en) * 1950-04-27 1954-01-05 Nat Res Corp Method and apparatus for vapor coating
US2969448A (en) * 1959-03-03 1961-01-24 Continental Can Co Heater vaporizer element support
DE3046564A1 (de) * 1979-12-10 1981-09-17 Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa "verfahren und vorrichtung zur vakuum-bedampfung"
US4403002A (en) * 1979-12-10 1983-09-06 Fuji Photo Film Co., Ltd. Vacuum evaporating apparatus
JPS6053745B2 (ja) * 1981-07-31 1985-11-27 アルバツク成膜株式会社 二元蒸着によつて不均質光学的薄膜を形成する方法
JPH01264632A (ja) * 1988-04-15 1989-10-20 Konica Corp 磁気記録媒体の製造方法および製造装置
US5122389A (en) * 1990-03-02 1992-06-16 Fuji Photo Film Co., Ltd. Vacuum evaporation method and apparatus
IT1269042B (it) * 1994-03-18 1997-03-18 Galileo Vacuum Tec Spa Impianto continuo di metallizzazione sotto vuoto del tipo con due rulli delimitanti una zona di trattamento (configurazione free-span)
US6082296A (en) * 1999-09-22 2000-07-04 Xerox Corporation Thin film deposition chamber
JP4704605B2 (ja) * 2001-05-23 2011-06-15 淳二 城戸 連続蒸着装置、蒸着装置及び蒸着方法
JP3608529B2 (ja) * 2001-06-08 2005-01-12 松下電器産業株式会社 両面蒸着ポリプロピレンフィルムの製造方法およびそれを用いたコンデンサ
EP2157589B1 (en) * 2001-06-08 2012-06-27 Panasonic Corporation Method of manufacturing double surface metallized film.
US8808457B2 (en) * 2002-04-15 2014-08-19 Samsung Display Co., Ltd. Apparatus for depositing a multilayer coating on discrete sheets
US7169232B2 (en) * 2004-06-01 2007-01-30 Eastman Kodak Company Producing repetitive coatings on a flexible substrate
DE102004047938B4 (de) * 2004-10-01 2008-10-23 Leybold Optics Gmbh Vorrichtung für die Verdampferbeschichtung eines bandförmigen Substrates
CN2910966Y (zh) * 2006-03-24 2007-06-13 潘旭祥 高速卷绕多层电容薄膜镀膜机

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160102059A (ko) * 2013-12-23 2016-08-26 어플라이드 머티어리얼스, 인코포레이티드 진공 프로세스 동안 기판을 유지하기 위한 유지 배열체, 기판 상에 층을 증착시키기 위한 장치, 및 유지 배열체를 컨베잉하기 위한 방법
KR20160118251A (ko) * 2014-02-04 2016-10-11 어플라이드 머티어리얼스, 인코포레이티드 캐리어에 의해 지지되는 기판 상에 하나 또는 그 초과의 층들을 증착하기 위한 시스템 및 그러한 시스템을 사용하는 방법
KR20170081714A (ko) * 2014-02-04 2017-07-12 어플라이드 머티어리얼스, 인코포레이티드 인-라인 증착 시스템 및 유기 재료를 위한 증발 소스를 작동시키기 위한 방법

Also Published As

Publication number Publication date
WO2012072132A1 (en) 2012-06-07
US20140030435A1 (en) 2014-01-30
CN103249861A (zh) 2013-08-14
JP2013544322A (ja) 2013-12-12
KR20180002912A (ko) 2018-01-08
CN103249861B (zh) 2017-03-15
EP2646594A1 (en) 2013-10-09

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