KR20120116909A - 진공 척 - Google Patents
진공 척 Download PDFInfo
- Publication number
- KR20120116909A KR20120116909A KR1020127011341A KR20127011341A KR20120116909A KR 20120116909 A KR20120116909 A KR 20120116909A KR 1020127011341 A KR1020127011341 A KR 1020127011341A KR 20127011341 A KR20127011341 A KR 20127011341A KR 20120116909 A KR20120116909 A KR 20120116909A
- Authority
- KR
- South Korea
- Prior art keywords
- adsorption
- vacuum chuck
- adsorbed
- pad
- holes
- Prior art date
Links
- 238000001179 sorption measurement Methods 0.000 claims abstract description 77
- 239000000126 substance Substances 0.000 claims abstract description 21
- 239000000758 substrate Substances 0.000 claims description 13
- 239000000919 ceramic Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 description 28
- 239000002156 adsorbate Substances 0.000 description 5
- 230000006837 decompression Effects 0.000 description 5
- 239000011148 porous material Substances 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manipulator (AREA)
Abstract
Fmin≤n?(P1-Pu)?Se/(Se+C)
Description
도 2는 흡착 패드(2)로 피흡착물(W)을 얹어 설치하여 흡인하고 있는 상태의 진공 척(1)을 도시한 설명도이다.
2 : 흡착 패드
3 : 감압실
5 : 진공 펌프
6 : 유량계
Claims (3)
- 측면 전체가 밀폐되고, 표면측과 배면측이 대략 등밀도로 형성된 다수의 관통 구멍에 의해 연통하는 다공성 기판의 흡착 패드를 구비하고, 밀폐된 배면측을 진공 펌프로 감압하며, 표면상에 얹어 설치되는 피흡착물을 피흡착물로 덮인 복수의 관통 구멍을 통해 흡착하는 진공 척에 있어서,
대기압을 "P1", 피흡착물의 유지에 필요한 단위 면적당 최저 흡착력을 "Fmin"으로 하고,
도달 압력이 "Pu", 배기 효율이 "Se"인 진공 펌프로 배면측이 흡인되는 흡착 패드는,
흡착 패드의 단위 표면적과 상기 단위 표면적 내에 노출되는 관통 구멍의 총 개구 면적의 비인 개구율(n)과, 다수의 관통 구멍에 의한 흡착 패드 전체의 컨덕턴스(C)가,
[수학식 7]
를 만족하는, 진공 척. - 제 1 항에 있어서,
흡착 패드의 관통 구멍의 내부 직경은 1㎛ 내지 20㎛인, 진공 척. - 제 1 항 또는 제 2 항에 있어서,
흡착 패드는 개구율(n)이 20% 이상의 다공질 세라믹 기판인, 진공 척.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2009-271134 | 2009-11-30 | ||
JP2009271134A JP2011114253A (ja) | 2009-11-30 | 2009-11-30 | 真空チャック |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20120116909A true KR20120116909A (ko) | 2012-10-23 |
Family
ID=44066126
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020127011341A KR20120116909A (ko) | 2009-11-30 | 2010-11-29 | 진공 척 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2011114253A (ko) |
KR (1) | KR20120116909A (ko) |
CN (1) | CN102668059B (ko) |
WO (1) | WO2011065021A1 (ko) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016103626A (ja) * | 2014-11-13 | 2016-06-02 | 株式会社ナノテム | 搬送用パッドおよびそれを用いる搬送装置、搬送方法 |
JPWO2017154085A1 (ja) * | 2016-03-08 | 2018-11-22 | 株式会社ナノテム | 搬送用パッドおよびそれを用いる搬送装置、搬送方法 |
JP6815138B2 (ja) * | 2016-09-06 | 2021-01-20 | 株式会社ディスコ | 吸引保持システム |
CN110098143B (zh) * | 2018-01-31 | 2021-06-04 | 上海微电子装备(集团)股份有限公司 | 一种芯片吸附装置及芯片键合系统 |
CN109051771B (zh) * | 2018-07-05 | 2020-10-02 | 珠海格力电器股份有限公司 | 表针放料系统、方法和装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4316175Y1 (ko) * | 1965-07-21 | 1968-07-05 | ||
JP2693720B2 (ja) * | 1994-05-25 | 1997-12-24 | シーケーディ株式会社 | 真空チャックにおける被吸着物の吸着方法 |
CN2892771Y (zh) * | 2005-12-29 | 2007-04-25 | 袁建中 | 排气吸盘 |
JP5231064B2 (ja) * | 2008-03-28 | 2013-07-10 | 太平洋セメント株式会社 | 真空吸着装置及びその製造方法 |
JP2009253247A (ja) * | 2008-04-11 | 2009-10-29 | Ariake Materials Co Ltd | 真空吸着装置用吸着体及び真空吸着装置 |
-
2009
- 2009-11-30 JP JP2009271134A patent/JP2011114253A/ja active Pending
-
2010
- 2010-11-29 KR KR1020127011341A patent/KR20120116909A/ko not_active Application Discontinuation
- 2010-11-29 CN CN201080054148.3A patent/CN102668059B/zh not_active Expired - Fee Related
- 2010-11-29 WO PCT/JP2010/006942 patent/WO2011065021A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
CN102668059B (zh) | 2015-09-16 |
CN102668059A (zh) | 2012-09-12 |
JP2011114253A (ja) | 2011-06-09 |
WO2011065021A1 (ja) | 2011-06-03 |
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