KR20110137205A - Grip apparatus for substrate - Google Patents

Abstract

PURPOSE: A substrate grip apparatus is provided to reduce the generation of a particle due to friction with a tray which supports a substrate by preventing a pace down phenomenon in a gravity direction. CONSTITUTION: A rotation arm(200) is prepared in the center part of a gripper main body(100). The rotation arm comprises 4 cancers(210). A gripping unit(300) grips or lifts a substrate by being connected with a rotational motion of the rotation arm. The gripping unit comprises an LM guide(310) and a plurality of grippers(320) which are connected with a first link(330). The LM guide comprises an LM block which is connected to the first link and an LM rail which guides so that the LM block straightly drives. The grippers comprises a grip bar(321) which is connected to a second link(340) and a guide bar(322) which supports a rotary shaft.

Description

Board Grip Device {GRIP APPARATUS FOR SUBSTRATE}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate grip device, and more particularly, because the substrate can be gripped by standing up, unlike in the prior art, the substrate can be prevented from face down in the direction of gravity, and thus, in the process. It is relatively advantageous to ensure the accuracy of the substrate, and can reduce the generation of particles by friction with the tray supporting the substrate, as well as the substrate grip device that can reduce the foot print to the device. It is about.

Substrates are flat panel displays (FPDs) such as plasma displays (PDPs), liquid crystal displays (LCDs) and organic light emitting displays (OLEDs). The semiconductor wafer, the glass for the photomask, and the like will be described below, but the organic light emitting display device (OLED) will be described as a substrate.

The OLED includes an anode and a cathode, and organic layers interposed between the anode and the cathode. The organic layers may include at least a light emitting layer, and may further include a hole injection layer, a hole transport layer, an electron transport layer, and an electron injection layer in addition to the light emitting layer.

OLEDs may be classified into high molecular organic light emitting diodes and low molecular organic light emitting diodes, depending on the organic layer, in particular, the light emitting layer. In order to realize full color, the light emitting layer needs to be patterned. In order to manufacture a large OLED, a direct patterning method using a fine metal mask (FMM) and a laser induced thermal imaging (LITI) method are used. There is a method applied, a method using a color filter.

On the other hand, when manufacturing a large size OLED by applying a mask method, a so-called horizontal upward deposition method in which a substrate and a patterned mask are horizontally disposed in a chamber and then deposited is applied. The horizontal upward deposition method is a method of aligning a substrate and a mask disposed horizontally with respect to a bottom surface of a chamber or the like, bonding them together, and depositing organic material on a large substrate in a horizontal state.

However, as OLEDs become larger in size, masks are becoming larger and larger in weight, and in this case, face down of the mask occurs in the direction of gravity, making it difficult to closely adhere the mask to the substrate. There is a problem that it is difficult to secure the precision.

In addition, when transporting the substrate and the mask, in particular, the substrate in a horizontal direction, the generation of particles due to the wide contact friction between the horizontal tray supporting the horizontal substrate and the substrate is severe, Since only the substrate can be transferred, it is difficult to reduce the tact time.

In view of such a problem, the process is performed by rotating the substrate disposed in the horizontal direction with respect to the bottom surface of the chamber and standing in the vertical direction or vertical tilting direction (hereinafter, referred to as vertical direction in total) of about 80 to 90 degrees. In this case, since the conventional technology loads the substrate on a horizontal stage, a separate grip device is not required at the time of loading, but the vertically aligned substrate is aligned. A separate grip device is required for the process.

The object of the present invention is that, unlike the prior art, since the substrate can be gripped upright, it is possible to prevent the substrate from falling down in the direction of gravity, which is relatively advantageous for securing accuracy in the process. It is to provide a substrate grip device that can reduce the generation of particles by friction with the tray supporting the support, as well as reduce the foot print to the device.

The above object, according to the present invention, the grip device main body; A rotation arm having one or more arms provided in the grip device body and rotating; And a gripping unit for gripping and releasing the substrate in conjunction with the rotational movement of the rotation arm.

Here, the gripping unit may include: one or more LM guides connected to the rotation arm by a first link; And a plurality of grippers connected to the LM guide by a second link and gripping the substrate.

The LM guide may include an LM block to which the first link is connected; And an LM rail for guiding the LM block to linearly move.

The LM block includes an LM block body; And a coupling bracket to which the second link is connected.

Both ends of the first link may be hinged to the rotation arm and the LM guide, respectively.

Both ends of the second link may be hinged to the LM guide and the gripper, respectively.

The gripper may include a grip bar connected to the second link; And a pair of guide bars fixedly installed at both sides of the grip bar and supporting a rotation axis of the grip bar.

The grip bar may be provided with fluorine rubber or NBR (Nitrile Butadiene Rubber) at the end of gripping the substrate.

Bearings may be installed in the first link and the second link connection.

The rotation arm is provided with four arms radially, and the LM guides are provided to correspond to the four arms, respectively, and the LM guides are simultaneously moved in accordance with the rotation of the rotation arm, thereby simultaneously allowing the plurality of grippers to move simultaneously. The substrate can be gripped and ungripped.

According to the present invention, since the substrate can be gripped by standing up, unlike the related art, it is possible to prevent the substrate from falling down in the direction of gravity, which is relatively advantageous for securing precision in the process. Not only can the particle generated by friction with the supporting trays be reduced, but also the foot print on the device can be reduced.

1 is a schematic structural diagram of a thin film deposition apparatus for manufacturing an OLED to which a substrate grip apparatus according to an embodiment of the present invention may be applied.
2 is a perspective view of a substrate grip apparatus according to an embodiment of the present invention.
3 is an enlarged cross-sectional view of part A of FIG. 2.
4 is an enlarged cross-sectional view when the gripper grips the substrate.
5 is a front view before the substrate is gripped to the substrate grip device.
6 is a front view after the substrate is gripped by the substrate grip device.

In order to fully understand the present invention, the operational advantages of the present invention, and the objects achieved by the practice of the present invention, reference should be made to the accompanying drawings which illustrate preferred embodiments of the present invention and the contents described in the accompanying drawings.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. Like reference numerals in the drawings denote like elements.

Prior to the drawing description, a substrate is a flat panel display device (FPD) such as a plasma display panel (PDP), a liquid crystal display (LCD), and an organic light emitting display (OLED). , Flat panel display, semiconductor wafer, photo mask glass, etc. Hereinafter, a large area OLED among organic light emitting display devices (OLEDs) will be referred to as a substrate.

1 is a schematic structural diagram of a thin film deposition apparatus for manufacturing an OLED to which a substrate grip device according to an embodiment of the present invention can be applied, FIG. 2 is a perspective view of a substrate grip device according to an embodiment of the present invention, and FIG. 2 is an enlarged cross-sectional view of the portion A of FIG. 2, FIG. 4 is an enlarged cross-sectional view when the gripper grips the substrate, FIG. 5 is a front view before the substrate is gripped on the substrate grip device, and FIG. 6 is a substrate on the substrate grip device. This is a front view after being gripped.

As shown in these figures, the substrate gripping apparatus 1 according to one embodiment of the present invention may be used to grip the substrate 2 in the thin film deposition apparatus for manufacturing OLED shown in FIG. . Referring to Figure 1 briefly described for a thin film deposition apparatus for manufacturing an OLED as follows.

The thin film deposition apparatus for manufacturing an OLED includes a chamber 3, an alignment reference unit 10 provided in the chamber 3 along a direction crossing the bottom surface of the chamber 3, an alignment reference unit 10, The mask 20 disposed in parallel and selectively contacted with the alignment reference part 10, and disposed opposite to the mask 20 with respect to the alignment reference part 10 and arranged in parallel with the mask 20. The substrate holding alignment unit 30 which aligns the substrate 2 with respect to the mask 20 on the basis of the alignment reference unit 10 while the substrate 2 is held.

The chamber 3 forms a place where the deposition process for the substrate 2 proceeds. The alignment reference unit 10 forms an alignment reference of the mask 20 to serve as a medium for the deposition process to be performed while both the mask 20 and the substrate 2 are perpendicular to each other in the chamber 3. . The mask 20 is contacted and supported on the surface of the substrate 2 in order to proceed with deposition in a predetermined pattern on the surface of the substrate 2. At this time, since the substrate 2 should be gripped in a vertical state, the substrate grip device 1 is provided.

As shown in FIGS. 2 to 6, the substrate grip device 1 of the present embodiment has a grip device main body 100 and one or more arms 210 and is provided on the grip device main body 100 to rotate. A rotation arm 200 and a gripping unit 300 for gripping and releasing the substrate 2 in association with the rotational movement of the rotation arm 200.

When the shape of the grip device main body 100 is determined according to the size and shape of the substrate 2 in this embodiment is provided in a square shape according to the shape of the general substrate.

A rotation arm 200 having a rotation axis in a central portion of the grip device main body 100 is provided at the rear of the grip device main body 100 to provide power to the substrate grip device 1.

The rotation arm 200 is provided radially with four arms 210 and each arm is connected to four LM guides 310 provided to correspond to each corner of the grip device body 100. ) Is connected.

In the present embodiment, the rotation arm 200 has four arms 210 and is configured to correspond to four LM guides 310, but the scope of the present invention is not limited thereto, and the arm 210 of the rotation arm 200 is not limited thereto. ) Or the number of LM guides 310 corresponding thereto may be adjusted as necessary.

The gripping unit 300 is connected to the rotation arm 200 by one or more LM guides 310 connected to the first link 330, the LM guide 310 and the second link 340, and the substrate 2. A plurality of grippers 320 for gripping the.

First, referring to the LM guide 310, as shown in FIGS. 2 and 3, the LM guide 310 is connected to a first link 330 to receive power from the rotation arm 200. LM block) and an LM rail 312 (LM rail) that guides the LM block 311 to linearly move.

The LM block 311 includes an LM block body 311a and a coupling bracket 311b to which the second link 340 is connected. The LM block body 311a is provided in a rectangular shape in accordance with the length of each surface of the grip device main body 100, one end is hinged to the first link 330. In addition, the LM block body 311a is fitted and coupled to the LM rail 312 to be movable only along the LM rail 312.

A plurality of coupling brackets 311b are provided at opposite ends of one end connected to the first link 330 of the LM block body 311a in accordance with the number of grippers 320. Coupling bracket 311b is provided in accordance with the position of each of the gripper 320, the hinge is coupled to the second link (340).

Next, the gripper 320, the gripper 320 is fixed to both sides of the grip bar 321 and the grip bar 321 connected to the second link 340, as shown in FIGS. 2 to 4. It is installed and includes a pair of guide bar 322 for supporting the rotation axis of the grip bar (321).

The grip bar 321 is provided in a shape in which two 'a' letters are connected and have a rotation axis in the center thereof. One end of the grip bar 321 is hinged to the second link 340, and the other end is a part for gripping the substrate 2, and a fluorinated rubber, typically VITON, in a portion where the substrate 2 is contacted. ) Or NBR (Nitrile butadiene rubber) to prevent damage or cracking of the substrate (2).

The guide bar 322 supports the rotation axis of the grip bar 321 on both sides of the grip bar 321.

The first link 330 has a predetermined length such that the sum of the arms 210 and the length of the rotation arm 200 can move the LM guide 310 to the edge of the grip device body 100. One end of the 330 is hinged to one end of the arm 210 of the rotation arm 200 and the other end of the first link 330 is hinged to the center of one end of the LM block 311. The hinge coupling of the first link 330 is coupled so that the first link 330 is rotatable on the same plane as the plane on which the rotation arm 200 rotates.

One end of the second link 340 is hinged to the coupling bracket 311b of the LM block 311, and the other end is hinged to one end of the grip bar 321. The hinge coupling of the second link 340 is coupled so that the second link 340 is rotatable on a plane intersecting with a plane on which the rotation arm 200 rotates.

Bearings are installed at the hinge coupling portions of the first link 330 and the second link 340 to facilitate rotation of each link, and minimize contamination by particle generation.

The operation of the substrate grip device 1 having such a configuration will be described below.

First, referring to FIG. 2, when each arm 210 of the rotation arm 200 is rotated in a clockwise direction at the center of each corner of the grip device main body 100, the first link 330 is moved by the first link 330. The LM block 311 moves in the direction of the center of the grip device body 100, and the grip bar 321 is opened by the second link 340 connected to the LM block 311.

4 is a view illustrating a state in which the rotation arm 200 rotates so that the grip bar 321 grips the substrate 2, and FIGS. 5 and 6 show the substrate on the front surface of the substrate grip device 1. Figure 2 shows the state before and after mounting (2). Referring to these drawings in conjunction with FIGS. 2 and 3, after the substrate 2 is mounted on the front surface of the grip device body 100 when the grip bar 321 is open as shown in FIGS. 2 and 3. When the rotation arm 200 rotates counterclockwise, the first link 330 transmits power to the LM block 311 so that the LM block 311 moves along the LM rail 312 of the grip device body 100. It moves in the edge direction. As a result, the second link 340 connected to the LM block 311 transmits power to the grip bar 321, and the grip bar 321 rotates by the rotation shaft to the front of the grip device main body 100. The mounted substrate 2 is gripped.

That is, the rotational motion of the rotation arm 200 is converted into linear motion by the first link 330 and the LM guide 310, and the rotational motion of the rotation arm 200 is rotated by the rotation axis of the second link 340 and the grip bar 321. It converts into motion and transmits power.

As a result, a plurality of grip bars 321 can simultaneously grip the substrate 2 at each edge portion of the substrate grip device 1, thereby stably gripping the substrate 2 to vertically log the substrate 2. This reduces the tact time, improves productivity, and significantly reduces the machine's foot print.

As described above, according to the substrate grip device 1 of the present invention, since the substrate can be gripped by standing up, unlike the conventional method, the substrate can be prevented from face down in the direction of gravity, and thus It is relatively advantageous to ensure accuracy and can reduce the generation of particles by friction with the tray supporting the substrate, as well as reduce the foot print for the device.

As described above, the present invention is not limited to the described embodiments, and various modifications and changes can be made without departing from the spirit and scope of the present invention, which will be apparent to those skilled in the art. Accordingly, such modifications or variations are intended to fall within the scope of the appended claims.

1: substrate grip device
100: grip device main body 200: rotation arm
210: arm 300: gripping unit
310: LM Guide 311: LM Block
311a: LM block body 311b: coupling bracket
312: LM rail 320: gripper
321: grip bar 322: guide bar
330: first link 340: second link

Claims (10)

Grip device body;
A rotation arm having one or more arms provided in the grip device body and rotating; And
And a gripping unit for gripping and releasing the substrate in conjunction with a rotational movement of the rotation arm. The method of claim 1,
The gripping unit,
One or more LM guides connected to the rotation arm by a first link; And
And a plurality of grippers connected to the LM guide by a second link to grip the substrate. The method of claim 2,
The LM guide,
An LM block to which the first link is connected; And
And an LM rail for guiding the linear motion of the LM block. The method of claim 3,
The LM block,
LM block body; And
And a coupling bracket to which the second link is connected. The method of claim 2,
And the first link has both ends hingedly coupled to the rotation arm and the LM guide, respectively. The method of claim 2,
And the second link has both ends hingedly coupled to the LM guide and the gripper, respectively. The method of claim 2,
The gripper is,
A grip bar connected to the second link; And
And a pair of guide bars fixedly installed at both sides of the grip bar and supporting a rotation axis of the grip bar. The method of claim 7, wherein
The grip bar is a substrate grip device, characterized in that fluorine rubber or NBR (Nitrile Butadiene Rubber) is provided at the end for gripping the substrate. The method of claim 2,
Substrate grip device, characterized in that the bearing is installed on the first link and the second link connection. The method of claim 2,
The rotation arm is provided with four arms radially, and the LM guides are provided to correspond to the four arms, respectively, and the LM guides are simultaneously moved in accordance with the rotation of the rotation arm, thereby simultaneously allowing the plurality of grippers to move simultaneously. A substrate gripping apparatus comprising gripping and ungripping a substrate.

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