KR20110102404A - 듀얼 스핀 토크 기준층들을 갖는 자기 랜덤 액세스 메모리 - Google Patents
듀얼 스핀 토크 기준층들을 갖는 자기 랜덤 액세스 메모리 Download PDFInfo
- Publication number
- KR20110102404A KR20110102404A KR1020117015470A KR20117015470A KR20110102404A KR 20110102404 A KR20110102404 A KR 20110102404A KR 1020117015470 A KR1020117015470 A KR 1020117015470A KR 20117015470 A KR20117015470 A KR 20117015470A KR 20110102404 A KR20110102404 A KR 20110102404A
- Authority
- KR
- South Korea
- Prior art keywords
- magnetic layer
- magnetic
- pinned
- layer
- magnetization direction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 464
- 230000009977 dual effect Effects 0.000 title abstract description 12
- 230000005415 magnetization Effects 0.000 claims abstract description 184
- 210000004027 cell Anatomy 0.000 claims abstract description 120
- 238000013500 data storage Methods 0.000 claims abstract description 72
- 210000000352 storage cell Anatomy 0.000 claims abstract description 45
- 239000010410 layer Substances 0.000 claims description 402
- 238000000034 method Methods 0.000 claims description 41
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 239000004020 conductor Substances 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 239000003302 ferromagnetic material Substances 0.000 claims description 5
- 239000012777 electrically insulating material Substances 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 230000004888 barrier function Effects 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 239000011810 insulating material Substances 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 230000004044 response Effects 0.000 claims description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910052796 boron Inorganic materials 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910001291 heusler alloy Inorganic materials 0.000 claims description 2
- 239000011229 interlayer Substances 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- 239000011777 magnesium Substances 0.000 claims description 2
- 229910000889 permalloy Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 229910052779 Neodymium Inorganic materials 0.000 claims 1
- 229910052772 Samarium Inorganic materials 0.000 claims 1
- 229910052747 lanthanoid Inorganic materials 0.000 claims 1
- 150000002602 lanthanoids Chemical class 0.000 claims 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 claims 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 claims 1
- 230000008569 process Effects 0.000 description 12
- 230000008859 change Effects 0.000 description 7
- 230000006870 function Effects 0.000 description 7
- 230000000295 complement effect Effects 0.000 description 6
- 239000000047 product Substances 0.000 description 5
- 230000005641 tunneling Effects 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 230000000875 corresponding effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- -1 for example Substances 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000002918 waste heat Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/165—Auxiliary circuits
- G11C11/1675—Writing or programming circuits or methods
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/165—Auxiliary circuits
- G11C11/1673—Reading or sensing circuits or methods
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C5/00—Details of stores covered by group G11C11/00
- G11C5/02—Disposition of storage elements, e.g. in the form of a matrix array
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Hall/Mr Elements (AREA)
- Mram Or Spin Memory Techniques (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/327,184 US7859892B2 (en) | 2008-12-03 | 2008-12-03 | Magnetic random access memory with dual spin torque reference layers |
| US12/327,184 | 2008-12-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20110102404A true KR20110102404A (ko) | 2011-09-16 |
Family
ID=42126026
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020117015470A Ceased KR20110102404A (ko) | 2008-12-03 | 2009-12-03 | 듀얼 스핀 토크 기준층들을 갖는 자기 랜덤 액세스 메모리 |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US7859892B2 (enExample) |
| EP (1) | EP2374130B1 (enExample) |
| JP (1) | JP2012510731A (enExample) |
| KR (1) | KR20110102404A (enExample) |
| CN (1) | CN102272845A (enExample) |
| WO (1) | WO2010065753A1 (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8144425B2 (en) * | 2003-12-15 | 2012-03-27 | Seagate Technology Llc | Magnetic recording head with compact yoke |
| JP5142923B2 (ja) * | 2008-09-30 | 2013-02-13 | 株式会社東芝 | 磁性発振素子、磁気センサ及び磁気記録再生装置 |
| JP5644198B2 (ja) * | 2010-06-15 | 2014-12-24 | ソニー株式会社 | 記憶装置 |
| JP4951095B2 (ja) | 2010-06-30 | 2012-06-13 | 株式会社東芝 | 磁気記録ヘッド及び磁気記録装置 |
| DE112012000271B4 (de) | 2011-02-16 | 2022-01-05 | International Business Machines Corporation | Ferromagnetische Einheit, die hohe Domänenwandgeschwindigkeiten gewährleistet |
| JP5542856B2 (ja) * | 2012-03-21 | 2014-07-09 | 株式会社東芝 | 磁気抵抗効果素子及び磁気メモリ |
| US8941196B2 (en) * | 2012-07-10 | 2015-01-27 | New York University | Precessional reversal in orthogonal spin transfer magnetic RAM devices |
| US8982613B2 (en) | 2013-06-17 | 2015-03-17 | New York University | Scalable orthogonal spin transfer magnetic random access memory devices with reduced write error rates |
| CN106030840B (zh) * | 2014-03-25 | 2019-03-01 | 英特尔公司 | 磁畴壁逻辑器件及互连 |
| EP3304741A4 (en) * | 2015-05-28 | 2019-05-01 | INTEL Corporation | EXCLUSIVE OR LOGICAL DEVICE WITH SPIN-ORBIT TORQUE EFFECT |
| CN107636850B (zh) | 2015-06-26 | 2022-07-05 | 英特尔公司 | 低杂散场磁性存储器 |
| US10832749B2 (en) | 2015-06-26 | 2020-11-10 | Intel Corporation | Perpendicular magnetic memory with symmetric fixed layers |
| US9911483B1 (en) * | 2017-03-21 | 2018-03-06 | International Business Machines Corporation | Thermally-assisted spin transfer torque memory with improved bit error rate performance |
| US10720570B2 (en) * | 2017-06-12 | 2020-07-21 | Western Digital Technologies, Inc. | Magnetic sensor using spin hall effect |
| US10770649B1 (en) | 2019-02-21 | 2020-09-08 | International Business Machines Corporation | Lattice matched tunnel barriers for perpendicularly magnetized Heusler alloys |
| US11386320B2 (en) * | 2019-03-06 | 2022-07-12 | International Business Machines Corporation | Magnetic domain wall-based non-volatile, linear and bi-directional synaptic weight element |
| CN115443548A (zh) * | 2020-07-30 | 2022-12-06 | 华为技术有限公司 | 一种磁性隧道结及存储单元 |
| US11917835B2 (en) | 2020-12-21 | 2024-02-27 | International Business Machines Corporation | Three-dimensional funnel-like spin transfer torque MRAM cell with a non-uniform thicknesses in each layer |
Family Cites Families (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7035138B2 (en) * | 2000-09-27 | 2006-04-25 | Canon Kabushiki Kaisha | Magnetic random access memory having perpendicular magnetic films switched by magnetic fields from a plurality of directions |
| US6714444B2 (en) * | 2002-08-06 | 2004-03-30 | Grandis, Inc. | Magnetic element utilizing spin transfer and an MRAM device using the magnetic element |
| US6888742B1 (en) * | 2002-08-28 | 2005-05-03 | Grandis, Inc. | Off-axis pinned layer magnetic element utilizing spin transfer and an MRAM device using the magnetic element |
| US6838740B2 (en) * | 2002-09-27 | 2005-01-04 | Grandis, Inc. | Thermally stable magnetic elements utilizing spin transfer and an MRAM device using the magnetic element |
| US6958927B1 (en) * | 2002-10-09 | 2005-10-25 | Grandis Inc. | Magnetic element utilizing spin-transfer and half-metals and an MRAM device using the magnetic element |
| US7190611B2 (en) * | 2003-01-07 | 2007-03-13 | Grandis, Inc. | Spin-transfer multilayer stack containing magnetic layers with resettable magnetization |
| US6829161B2 (en) * | 2003-01-10 | 2004-12-07 | Grandis, Inc. | Magnetostatically coupled magnetic elements utilizing spin transfer and an MRAM device using the magnetic element |
| US6847547B2 (en) * | 2003-02-28 | 2005-01-25 | Grandis, Inc. | Magnetostatically coupled magnetic elements utilizing spin transfer and an MRAM device using the magnetic element |
| US6933155B2 (en) * | 2003-05-21 | 2005-08-23 | Grandis, Inc. | Methods for providing a sub .15 micron magnetic memory structure |
| US6980469B2 (en) * | 2003-08-19 | 2005-12-27 | New York University | High speed low power magnetic devices based on current induced spin-momentum transfer |
| US7245462B2 (en) * | 2003-08-21 | 2007-07-17 | Grandis, Inc. | Magnetoresistive element having reduced spin transfer induced noise |
| US6985385B2 (en) * | 2003-08-26 | 2006-01-10 | Grandis, Inc. | Magnetic memory element utilizing spin transfer switching and storing multiple bits |
| US7161829B2 (en) * | 2003-09-19 | 2007-01-09 | Grandis, Inc. | Current confined pass layer for magnetic elements utilizing spin-transfer and an MRAM device using such magnetic elements |
| US20050136600A1 (en) * | 2003-12-22 | 2005-06-23 | Yiming Huai | Magnetic elements with ballistic magnetoresistance utilizing spin-transfer and an MRAM device using such magnetic elements |
| US7110287B2 (en) * | 2004-02-13 | 2006-09-19 | Grandis, Inc. | Method and system for providing heat assisted switching of a magnetic element utilizing spin transfer |
| US7242045B2 (en) * | 2004-02-19 | 2007-07-10 | Grandis, Inc. | Spin transfer magnetic element having low saturation magnetization free layers |
| US6967863B2 (en) * | 2004-02-25 | 2005-11-22 | Grandis, Inc. | Perpendicular magnetization magnetic element utilizing spin transfer |
| US6992359B2 (en) * | 2004-02-26 | 2006-01-31 | Grandis, Inc. | Spin transfer magnetic element with free layers having high perpendicular anisotropy and in-plane equilibrium magnetization |
| US7233039B2 (en) * | 2004-04-21 | 2007-06-19 | Grandis, Inc. | Spin transfer magnetic elements with spin depolarization layers |
| US7057921B2 (en) * | 2004-05-11 | 2006-06-06 | Grandis, Inc. | Spin barrier enhanced dual magnetoresistance effect element and magnetic memory using the same |
| US7088609B2 (en) * | 2004-05-11 | 2006-08-08 | Grandis, Inc. | Spin barrier enhanced magnetoresistance effect element and magnetic memory using the same |
| US7120048B2 (en) * | 2004-06-21 | 2006-10-10 | Honeywell International Inc. | Nonvolatile memory vertical ring bit and write-read structure |
| US7576956B2 (en) * | 2004-07-26 | 2009-08-18 | Grandis Inc. | Magnetic tunnel junction having diffusion stop layer |
| US7369427B2 (en) * | 2004-09-09 | 2008-05-06 | Grandis, Inc. | Magnetic elements with spin engineered insertion layers and MRAM devices using the magnetic elements |
| US7126202B2 (en) * | 2004-11-16 | 2006-10-24 | Grandis, Inc. | Spin scattering and heat assisted switching of a magnetic element |
| US7313013B2 (en) * | 2004-11-18 | 2007-12-25 | International Business Machines Corporation | Spin-current switchable magnetic memory element and method of fabricating the memory element |
| US7241631B2 (en) * | 2004-12-29 | 2007-07-10 | Grandis, Inc. | MTJ elements with high spin polarization layers configured for spin-transfer switching and spintronics devices using the magnetic elements |
| JP4575181B2 (ja) * | 2005-01-28 | 2010-11-04 | 株式会社東芝 | スピン注入磁気ランダムアクセスメモリ |
| JP4877575B2 (ja) * | 2005-05-19 | 2012-02-15 | 日本電気株式会社 | 磁気ランダムアクセスメモリ |
| JP4516483B2 (ja) | 2005-06-07 | 2010-08-04 | 富士通セミコンダクター株式会社 | 半導体記憶装置及び情報処理システム |
| US7518835B2 (en) * | 2005-07-01 | 2009-04-14 | Grandis, Inc. | Magnetic elements having a bias field and magnetic memory devices using the magnetic elements |
| US7230845B1 (en) * | 2005-07-29 | 2007-06-12 | Grandis, Inc. | Magnetic devices having a hard bias field and magnetic memory devices using the magnetic devices |
| US7489541B2 (en) * | 2005-08-23 | 2009-02-10 | Grandis, Inc. | Spin-transfer switching magnetic elements using ferrimagnets and magnetic memories using the magnetic elements |
| US7973349B2 (en) * | 2005-09-20 | 2011-07-05 | Grandis Inc. | Magnetic device having multilayered free ferromagnetic layer |
| US7430135B2 (en) * | 2005-12-23 | 2008-09-30 | Grandis Inc. | Current-switched spin-transfer magnetic devices with reduced spin-transfer switching current density |
| US20070297220A1 (en) * | 2006-06-22 | 2007-12-27 | Masatoshi Yoshikawa | Magnetoresistive element and magnetic memory |
| JP2008028362A (ja) * | 2006-06-22 | 2008-02-07 | Toshiba Corp | 磁気抵抗素子及び磁気メモリ |
| US7486551B1 (en) * | 2007-04-03 | 2009-02-03 | Grandis, Inc. | Method and system for providing domain wall assisted switching of magnetic elements and magnetic memories using such magnetic elements |
| US7605437B2 (en) * | 2007-04-18 | 2009-10-20 | Everspin Technologies, Inc. | Spin-transfer MRAM structure and methods |
| US7486552B2 (en) * | 2007-05-21 | 2009-02-03 | Grandis, Inc. | Method and system for providing a spin transfer device with improved switching characteristics |
| US7982275B2 (en) * | 2007-08-22 | 2011-07-19 | Grandis Inc. | Magnetic element having low saturation magnetization |
| US20090302403A1 (en) * | 2008-06-05 | 2009-12-10 | Nguyen Paul P | Spin torque transfer magnetic memory cell |
-
2008
- 2008-12-03 US US12/327,184 patent/US7859892B2/en active Active
-
2009
- 2009-12-03 KR KR1020117015470A patent/KR20110102404A/ko not_active Ceased
- 2009-12-03 WO PCT/US2009/066602 patent/WO2010065753A1/en not_active Ceased
- 2009-12-03 EP EP09775420.4A patent/EP2374130B1/en not_active Not-in-force
- 2009-12-03 CN CN2009801542264A patent/CN102272845A/zh active Pending
- 2009-12-03 JP JP2011539702A patent/JP2012510731A/ja active Pending
-
2010
- 2010-11-19 US US12/949,871 patent/US8023317B2/en not_active Expired - Fee Related
-
2011
- 2011-08-16 US US13/210,448 patent/US8199565B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012510731A (ja) | 2012-05-10 |
| US7859892B2 (en) | 2010-12-28 |
| US8023317B2 (en) | 2011-09-20 |
| US20110298069A1 (en) | 2011-12-08 |
| EP2374130B1 (en) | 2013-09-18 |
| CN102272845A (zh) | 2011-12-07 |
| US20110069535A1 (en) | 2011-03-24 |
| US8199565B2 (en) | 2012-06-12 |
| EP2374130A1 (en) | 2011-10-12 |
| WO2010065753A1 (en) | 2010-06-10 |
| US20100134923A1 (en) | 2010-06-03 |
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