KR20110102202A - 성막 장치 - Google Patents

성막 장치 Download PDF

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Publication number
KR20110102202A
KR20110102202A KR1020110020175A KR20110020175A KR20110102202A KR 20110102202 A KR20110102202 A KR 20110102202A KR 1020110020175 A KR1020110020175 A KR 1020110020175A KR 20110020175 A KR20110020175 A KR 20110020175A KR 20110102202 A KR20110102202 A KR 20110102202A
Authority
KR
South Korea
Prior art keywords
film
sheet
target
forming apparatus
film forming
Prior art date
Application number
KR1020110020175A
Other languages
English (en)
Korean (ko)
Inventor
켄지 다테
히로요시 쿠로키
아키히데 키타바타케
Original Assignee
산요신쿠고교 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 산요신쿠고교 가부시키가이샤 filed Critical 산요신쿠고교 가부시키가이샤
Publication of KR20110102202A publication Critical patent/KR20110102202A/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0068—Reactive sputtering characterised by means for confinement of gases or sputtered material, e.g. screens, baffles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3421—Cathode assembly for sputtering apparatus, e.g. Target using heated targets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
KR1020110020175A 2010-03-08 2011-03-08 성막 장치 KR20110102202A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2010050960A JP4574739B1 (ja) 2010-03-08 2010-03-08 成膜装置
JPJP-P-2010-050960 2010-03-08

Publications (1)

Publication Number Publication Date
KR20110102202A true KR20110102202A (ko) 2011-09-16

Family

ID=43319595

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110020175A KR20110102202A (ko) 2010-03-08 2011-03-08 성막 장치

Country Status (3)

Country Link
JP (1) JP4574739B1 (ja)
KR (1) KR20110102202A (ja)
TW (1) TW201144471A (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5718767B2 (ja) * 2011-08-30 2015-05-13 株式会社アルバック スパッタリング装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5935580Y2 (ja) * 1982-07-30 1984-10-01 株式会社徳田製作所 スパツタリング装置
JPS61266571A (ja) * 1985-05-21 1986-11-26 Toyoda Gosei Co Ltd スパツタリング装置
DE69027004T2 (de) * 1989-11-13 1996-11-14 Optical Coating Laboratory Inc Geometrie und Gestaltungen eines Geräts zum Magnetronzerstäuben
JPH10287977A (ja) * 1997-04-14 1998-10-27 Ricoh Co Ltd スパッタ装置
JP2002309371A (ja) * 2001-04-11 2002-10-23 Sanyo Shinku Kogyo Kk フィルム基板への成膜方法とその装置
JP2004197139A (ja) * 2002-12-17 2004-07-15 Asahi Glass Co Ltd スパッタリング装置
JP4591080B2 (ja) * 2004-12-27 2010-12-01 富士電機システムズ株式会社 薄膜形成装置
JP2006213963A (ja) * 2005-02-03 2006-08-17 Tomonobu Hata 低温スパッタリング方法及び装置

Also Published As

Publication number Publication date
JP4574739B1 (ja) 2010-11-04
JP2011184733A (ja) 2011-09-22
TW201144471A (en) 2011-12-16

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NORF Unpaid initial registration fee