KR20110030336A - 감광성 조성물, 감광성 필름, 감광성 적층체, 영구패턴 형성방법, 및 프린트 기판 - Google Patents

감광성 조성물, 감광성 필름, 감광성 적층체, 영구패턴 형성방법, 및 프린트 기판 Download PDF

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Publication number
KR20110030336A
KR20110030336A KR1020100088643A KR20100088643A KR20110030336A KR 20110030336 A KR20110030336 A KR 20110030336A KR 1020100088643 A KR1020100088643 A KR 1020100088643A KR 20100088643 A KR20100088643 A KR 20100088643A KR 20110030336 A KR20110030336 A KR 20110030336A
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KR
South Korea
Prior art keywords
group
compound
photosensitive
preferable
bismuth
Prior art date
Application number
KR1020100088643A
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English (en)
Korean (ko)
Inventor
히데키 토미자와
히로시 카미카와
Original Assignee
후지필름 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 후지필름 가부시키가이샤 filed Critical 후지필름 가부시키가이샤
Publication of KR20110030336A publication Critical patent/KR20110030336A/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
KR1020100088643A 2009-09-17 2010-09-10 감광성 조성물, 감광성 필름, 감광성 적층체, 영구패턴 형성방법, 및 프린트 기판 KR20110030336A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2009216080 2009-09-17
JPJP-P-2009-216080 2009-09-17
JP2010006027 2010-01-14
JPJP-P-2010-006027 2010-01-14

Publications (1)

Publication Number Publication Date
KR20110030336A true KR20110030336A (ko) 2011-03-23

Family

ID=43936058

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020100088643A KR20110030336A (ko) 2009-09-17 2010-09-10 감광성 조성물, 감광성 필름, 감광성 적층체, 영구패턴 형성방법, 및 프린트 기판

Country Status (3)

Country Link
JP (1) JP2011164570A (ja)
KR (1) KR20110030336A (ja)
TW (1) TW201128311A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013027646A1 (ja) * 2011-08-19 2013-02-28 富士フイルム株式会社 感光性樹脂組成物、並びにこれを用いた感光性フイルム、感光性積層体、永久パターン形成方法およびプリント基板
KR20140018311A (ko) * 2011-03-25 2014-02-12 후지필름 가부시키가이샤 감광성 조성물, 감광성 필름, 감광성 적층체, 영구 패턴 형성 방법, 및 프린트 기판
KR20180100336A (ko) * 2016-01-12 2018-09-10 히타치가세이가부시끼가이샤 감광성 수지 조성물, 그것을 사용한 드라이 필름, 프린트 배선판, 및 프린트 배선판의 제조 방법

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5865725B2 (ja) * 2012-02-16 2016-02-17 富士フイルム株式会社 パターン形成方法、感活性光線性又は感放射線性樹脂組成物及びレジスト膜、並びにこれらを用いた電子デバイスの製造方法
JP5933340B2 (ja) * 2012-05-24 2016-06-08 株式会社日本触媒 耐水透湿性樹脂フィルム
JP6029506B2 (ja) * 2013-03-26 2016-11-24 富士フイルム株式会社 インプリント用下層膜形成組成物およびパターン形成方法
JP6234317B2 (ja) * 2013-05-28 2017-11-22 株式会社タムラ製作所 感光性樹脂組成物
JP5872650B2 (ja) * 2013-09-30 2016-03-01 株式会社タムラ製作所 感光性樹脂組成物
JP5981505B2 (ja) * 2013-09-30 2016-08-31 株式会社タムラ製作所 感光性樹脂組成物

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140018311A (ko) * 2011-03-25 2014-02-12 후지필름 가부시키가이샤 감광성 조성물, 감광성 필름, 감광성 적층체, 영구 패턴 형성 방법, 및 프린트 기판
WO2013027646A1 (ja) * 2011-08-19 2013-02-28 富士フイルム株式会社 感光性樹脂組成物、並びにこれを用いた感光性フイルム、感光性積層体、永久パターン形成方法およびプリント基板
JP2013061639A (ja) * 2011-08-19 2013-04-04 Fujifilm Corp 感光性樹脂組成物、並びにこれを用いた感光性フイルム、感光性積層体、永久パターン形成方法およびプリント基板
KR20180100336A (ko) * 2016-01-12 2018-09-10 히타치가세이가부시끼가이샤 감광성 수지 조성물, 그것을 사용한 드라이 필름, 프린트 배선판, 및 프린트 배선판의 제조 방법

Also Published As

Publication number Publication date
TW201128311A (en) 2011-08-16
JP2011164570A (ja) 2011-08-25

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