KR20100131978A - 필라멘트 전기 방전 이온 소스 - Google Patents

필라멘트 전기 방전 이온 소스 Download PDF

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Publication number
KR20100131978A
KR20100131978A KR1020107017761A KR20107017761A KR20100131978A KR 20100131978 A KR20100131978 A KR 20100131978A KR 1020107017761 A KR1020107017761 A KR 1020107017761A KR 20107017761 A KR20107017761 A KR 20107017761A KR 20100131978 A KR20100131978 A KR 20100131978A
Authority
KR
South Korea
Prior art keywords
filament
filaments
ionization chamber
wall
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020107017761A
Other languages
English (en)
Korean (ko)
Inventor
막심 마카로프
마르끄 메스트레
Original Assignee
엑싸이코 그룹
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=39431164&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=KR20100131978(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by 엑싸이코 그룹 filed Critical 엑싸이코 그룹
Publication of KR20100131978A publication Critical patent/KR20100131978A/ko
Ceased legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
KR1020107017761A 2008-01-11 2009-01-08 필라멘트 전기 방전 이온 소스 Ceased KR20100131978A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP08290027.5 2008-01-11
EP08290027A EP2079096B1 (fr) 2008-01-11 2008-01-11 Source d'ions à décharge électrique par filament

Publications (1)

Publication Number Publication Date
KR20100131978A true KR20100131978A (ko) 2010-12-16

Family

ID=39431164

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107017761A Ceased KR20100131978A (ko) 2008-01-11 2009-01-08 필라멘트 전기 방전 이온 소스

Country Status (5)

Country Link
EP (1) EP2079096B1 (https=)
JP (1) JP5340308B2 (https=)
KR (1) KR20100131978A (https=)
AT (1) ATE554497T1 (https=)
TW (1) TWI445036B (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0921791D0 (en) * 2009-12-14 2010-01-27 Aviza Technologies Ltd Ion beam source
JP6219594B2 (ja) * 2013-05-15 2017-10-25 Hoya株式会社 薄膜形成装置、及び薄膜形成方法
JP2019067488A (ja) * 2017-09-28 2019-04-25 日新イオン機器株式会社 イオン源およびイオン注入装置
CN114959551B (zh) * 2022-04-29 2023-12-19 超微中程纳米科技（苏州）有限公司 模具钢刀具离子氮化工艺

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3156842A (en) 1962-10-08 1964-11-10 Gordon W Mcclure Gas ionizer
US3970892A (en) 1975-05-19 1976-07-20 Hughes Aircraft Company Ion plasma electron gun
US4025818A (en) 1976-04-20 1977-05-24 Hughes Aircraft Company Wire ion plasma electron gun
US4412153A (en) * 1980-03-03 1983-10-25 Varian Associates, Inc. Dual filament ion source
US4694222A (en) 1984-04-02 1987-09-15 Rpc Industries Ion plasma electron gun
US4642522A (en) 1984-06-18 1987-02-10 Hughes Aircraft Company Wire-ion-plasma electron gun employing auxiliary grid
US4608513A (en) 1984-09-13 1986-08-26 Varian Associates, Inc. Dual filament ion source with improved beam characteristics
FR2591035B1 (fr) 1985-11-29 1988-02-26 Onera (Off Nat Aerospatiale) Canon a electrons operant par emission secondaire sous bombardement ionique
FR2596580A1 (fr) * 1986-03-26 1987-10-02 Centre Nat Rech Scient Generateur de plasma
US4910435A (en) 1988-07-20 1990-03-20 American International Technologies, Inc. Remote ion source plasma electron gun
JPH065219A (ja) * 1992-06-22 1994-01-14 Nissin Electric Co Ltd イオン源装置
JP3968874B2 (ja) 1998-06-22 2007-08-29 日新イオン機器株式会社 三相交流を用いたプラズマ発生装置
WO2006047609A2 (en) * 2004-10-25 2006-05-04 Epion Corporation Ionizer and method for gas-cluster ion-beam formation

Also Published As

Publication number Publication date
TWI445036B (zh) 2014-07-11
EP2079096B1 (fr) 2012-04-18
TW200941535A (en) 2009-10-01
JP5340308B2 (ja) 2013-11-13
JP2011509511A (ja) 2011-03-24
ATE554497T1 (de) 2012-05-15
EP2079096A1 (fr) 2009-07-15

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PA0105 International application

Patent event date: 20100810

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
A201 Request for examination
PA0201 Request for examination

Patent event code: PA02012R01D

Patent event date: 20140106

Comment text: Request for Examination of Application

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Patent event date: 20141224

Patent event code: PE09021S01D

E601 Decision to refuse application
PE0601 Decision on rejection of patent

Patent event date: 20150226

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Patent event date: 20141224

Comment text: Notification of reason for refusal

Patent event code: PE06011S01I