KR20100071231A - 반도체 소자 픽업 유닛의 높이 설정 방법 - Google Patents
반도체 소자 픽업 유닛의 높이 설정 방법 Download PDFInfo
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- KR20100071231A KR20100071231A KR1020080129870A KR20080129870A KR20100071231A KR 20100071231 A KR20100071231 A KR 20100071231A KR 1020080129870 A KR1020080129870 A KR 1020080129870A KR 20080129870 A KR20080129870 A KR 20080129870A KR 20100071231 A KR20100071231 A KR 20100071231A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67144—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames
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- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (3)
- 소잉 공정을 통해 개별화된 반도체 소자들을 픽업하기 위한 픽업 유닛을 펠릿 테이블 상부 표면을 향하여 하강시키면서 상기 하강하는 픽업 유닛에 진공압을 제공하고 상기 픽업 유닛 내부의 진공압을 측정하는 단계;상기 측정되는 진공압이 변화한 후 일정하게 되는 지점에서 상기 픽업 유닛을 정지시키는 단계; 및상기 진공압이 일정하게 되는 지점에서의 높이를 반도체 소자의 픽업 및 플레이싱 높이로 설정하는 단계를 포함하는 픽업 유닛의 높이 설정 방법.
- 제1항에 있어서, 상기 픽업 유닛을 펠릿 테이블 상부 표면을 향하여 하강시키면서 상기 하강하는 픽업 유닛에 진공압을 제공하고 상기 픽업 유닛 내부의 진공압을 측정하는 단계는상기 측정되는 진공압이 일정한 제1 하강 구간;상기 측정되는 진공압이 변화하는 구간을 포함하는 제2 하강 구간; 및상기 측정되는 진공압이 일정한 제3 하강 구간을 거치는 것을 특징으로하는 픽업 유닛의 높이 설정 방법.
- 제 1항에 있어서, 상기 픽업 및 플레이싱 높이로 설정하는 단계는상기 정지시킨 픽업 유닛을 수직 방향으로 기 설정된 높이로 상승시키는 단 계;상기 상승된 픽업 유닛 내부의 진공압을 측정하는 단계;상기 픽업 유닛을 기 설정된 간격만큼 하강시키는 단계;상기 하강된 픽업 유닛 내부의 진공압을 측정하는 단계; 및상기 픽업 유닛의 하강 단계와 상기 진공압 측정 단계를 반복적으로 수행하는 단계를 포함하며,상기 측정된 진공압들 중 최대 진공압이 측정된 높이를 상기 픽업 및 플레이싱 높이로 설정하는 것을 특징으로 하는 픽업 유닛의 높이 설정 방법.
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Application Number | Priority Date | Filing Date | Title |
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KR1020080129870A KR101007936B1 (ko) | 2008-12-19 | 2008-12-19 | 반도체 소자 픽업 유닛의 높이 설정 방법 |
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KR1020080129870A KR101007936B1 (ko) | 2008-12-19 | 2008-12-19 | 반도체 소자 픽업 유닛의 높이 설정 방법 |
Publications (2)
Publication Number | Publication Date |
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KR20100071231A true KR20100071231A (ko) | 2010-06-29 |
KR101007936B1 KR101007936B1 (ko) | 2011-01-14 |
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KR1020080129870A KR101007936B1 (ko) | 2008-12-19 | 2008-12-19 | 반도체 소자 픽업 유닛의 높이 설정 방법 |
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KR100239579B1 (ko) * | 1997-12-31 | 2000-01-15 | 윤종용 | 공압을 이용한 거리측정장치 |
KR20010111713A (ko) * | 2000-06-13 | 2001-12-20 | 서정길 | 웨이퍼 이송장치 |
KR100451586B1 (ko) * | 2002-03-13 | 2004-10-08 | 미래산업 주식회사 | 반도체 소자 테스트 핸들러의 소자 이송장치의 작업 높이인식장치 및 이를 이용한 작업 높이 인식방법 |
KR20050041735A (ko) * | 2003-10-31 | 2005-05-04 | 미래산업 주식회사 | 마이크로칩 감지 시스템 |
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