KR20100054727A - 경화성 수지 조성물 - Google Patents

경화성 수지 조성물 Download PDF

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Publication number
KR20100054727A
KR20100054727A KR1020090108412A KR20090108412A KR20100054727A KR 20100054727 A KR20100054727 A KR 20100054727A KR 1020090108412 A KR1020090108412 A KR 1020090108412A KR 20090108412 A KR20090108412 A KR 20090108412A KR 20100054727 A KR20100054727 A KR 20100054727A
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KR
South Korea
Prior art keywords
group
resin composition
compound
curable resin
formula
Prior art date
Application number
KR1020090108412A
Other languages
English (en)
Korean (ko)
Inventor
가즈오 다케베
기범 백
Original Assignee
스미또모 가가꾸 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 스미또모 가가꾸 가부시끼가이샤 filed Critical 스미또모 가가꾸 가부시끼가이샤
Publication of KR20100054727A publication Critical patent/KR20100054727A/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/02—Homopolymers or copolymers of acids; Metal or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/10—Esters; Ether-esters
    • C08K5/11—Esters; Ether-esters of acyclic polycarboxylic acids
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1334—Constructional arrangements; Manufacturing methods based on polymer dispersed liquid crystals, e.g. microencapsulated liquid crystals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Nonlinear Science (AREA)
  • Dispersion Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Optics & Photonics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Printing Methods (AREA)
  • Epoxy Resins (AREA)
  • Paints Or Removers (AREA)
  • Materials For Photolithography (AREA)
KR1020090108412A 2008-11-14 2009-11-11 경화성 수지 조성물 KR20100054727A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2008-291785 2008-11-14
JP2008291785 2008-11-14

Publications (1)

Publication Number Publication Date
KR20100054727A true KR20100054727A (ko) 2010-05-25

Family

ID=42279405

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020090108412A KR20100054727A (ko) 2008-11-14 2009-11-11 경화성 수지 조성물

Country Status (4)

Country Link
JP (1) JP2010138386A (zh)
KR (1) KR20100054727A (zh)
CN (1) CN101735400A (zh)
TW (1) TWI464189B (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011137075A (ja) * 2009-12-28 2011-07-14 Daicel Chemical Industries Ltd 感光性樹脂組成物及びその硬化物
TWI525113B (zh) * 2010-07-30 2016-03-11 Sumitomo Chemical Co Hardened resin composition
JP2012058728A (ja) * 2010-08-10 2012-03-22 Sumitomo Chemical Co Ltd 感光性樹脂組成物
JP6047885B2 (ja) * 2011-03-08 2016-12-21 住友化学株式会社 着色感光性樹脂組成物
JP6019774B2 (ja) * 2011-06-29 2016-11-02 住友化学株式会社 硬化性樹脂組成物
JP5949097B2 (ja) * 2012-04-25 2016-07-06 Jsr株式会社 熱硬化性樹脂組成物、表示素子用保護膜及び表示素子用保護膜の形成方法
TWI579330B (zh) * 2012-05-23 2017-04-21 Sumitomo Chemical Co 硬化性樹脂組成物
JP5956590B2 (ja) * 2012-09-20 2016-07-27 富士フイルム株式会社 光重合方法、インクセット、画像形成方法、インク組成物並びにこれらに用いる光重合開始剤および水溶性ビイミダゾール
CN103242706B (zh) * 2013-04-25 2015-01-21 深圳市美丽华油墨涂料有限公司 一种丝印油墨及其应用
WO2017145823A1 (ja) * 2016-02-24 2017-08-31 旭硝子株式会社 塗布液組成物およびこれを用いた膜付き物品の製造方法
JP6630754B2 (ja) * 2017-02-16 2020-01-15 住友化学株式会社 硬化性樹脂組成物、硬化膜及び表示装置
CN112920378B (zh) * 2021-01-28 2023-06-13 深圳市宝安区新材料研究院 一种羟基树脂及其制备方法和应用

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3391780B1 (ja) * 2001-09-28 2003-03-31 昭和高分子株式会社 感光性樹脂組成物
JP4313550B2 (ja) * 2002-08-02 2009-08-12 ザ・インクテック株式会社 微小着色パターン欠陥修正用インキ、その修正方法、及び、カラーフィルター
JP4781083B2 (ja) * 2004-12-14 2011-09-28 ダイセル化学工業株式会社 ３，４−エポキシトリシクロ［５．２．１．０２，６］デカン環を有する構造単位を含む共重合体とその製造法
JP4501665B2 (ja) * 2004-12-14 2010-07-14 住友化学株式会社 感光性樹脂組成物
JP2008031248A (ja) * 2006-07-27 2008-02-14 Daicel Chem Ind Ltd 硬化性樹脂組成物及び硬化塗膜の形成方法

Also Published As

Publication number Publication date
CN101735400A (zh) 2010-06-16
TW201022320A (en) 2010-06-16
TWI464189B (zh) 2014-12-11
JP2010138386A (ja) 2010-06-24

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E902 Notification of reason for refusal
E601 Decision to refuse application