KR20090004884A - 코팅 방법 - Google Patents

코팅 방법 Download PDF

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Publication number
KR20090004884A
KR20090004884A KR1020087023269A KR20087023269A KR20090004884A KR 20090004884 A KR20090004884 A KR 20090004884A KR 1020087023269 A KR1020087023269 A KR 1020087023269A KR 20087023269 A KR20087023269 A KR 20087023269A KR 20090004884 A KR20090004884 A KR 20090004884A
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KR
South Korea
Prior art keywords
target
laser
coating
high quality
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020087023269A
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English (en)
Korean (ko)
Inventor
야리 루투
레이요 라팔라이넌
베사 뮈뤼메키
라세 풀리
유하 메키탈로
Original Assignee
피코데온 리미티드 오와이
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 피코데온 리미티드 오와이 filed Critical 피코데온 리미티드 오와이
Publication of KR20090004884A publication Critical patent/KR20090004884A/ko
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C23C14/0611—Diamond
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/087—Oxides of copper or solid solutions thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laser Beam Processing (AREA)
KR1020087023269A 2006-02-23 2007-02-23 코팅 방법 Ceased KR20090004884A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20060178A FI20060178A7 (fi) 2006-02-23 2006-02-23 Pinnoitusmenetelmä
FI20060178 2006-02-23

Publications (1)

Publication Number Publication Date
KR20090004884A true KR20090004884A (ko) 2009-01-12

Family

ID=35953642

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087023269A Ceased KR20090004884A (ko) 2006-02-23 2007-02-23 코팅 방법

Country Status (7)

Country Link
US (1) US20090302503A1 (https=)
EP (1) EP1991387A2 (https=)
JP (1) JP5203226B2 (https=)
KR (1) KR20090004884A (https=)
CN (1) CN101437644B (https=)
FI (1) FI20060178A7 (https=)
WO (1) WO2007096464A2 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101565099B1 (ko) 2007-02-23 2015-11-03 피코데온 리미티드 오와이 타겟의 광자 융발을 위한 방법 및 장치
DE102007043650A1 (de) 2007-09-13 2009-04-02 Siemens Ag Verfahren zur Verbesserung der Eigenschaften von Beschichtungen
KR101706517B1 (ko) * 2011-01-13 2017-02-13 타마랙 사이언티픽 컴퍼니 인코포레이티드 전도성 시드 레이어를 레이저 제거하는 방법 및 장치
FI123883B (fi) * 2011-09-16 2013-11-29 Picodeon Ltd Oy Kohtiomateriaali, pinnoite ja pinnoitettu esine
CN103031555B (zh) * 2011-10-10 2016-12-07 深圳富泰宏精密工业有限公司 壳体的制备方法及该方法所制备的壳体
DE102011122510A1 (de) * 2011-12-29 2013-07-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Beschichtung von optischen Wellenleitern
ITMI20130952A1 (it) * 2013-06-10 2014-12-11 Green Engineering S R L Componenti di un apparato di distillazione, metodo per la loro produzione e loro usi derivati
US10029421B2 (en) * 2014-09-18 2018-07-24 3Dm Digital Manufacturing Ltd Device and a method for 3D printing and manufacturing of materials using quantum cascade lasers
FI126659B (fi) * 2014-09-24 2017-03-31 Picodeon Ltd Oy Menetelmä Li-akkujen separaattorikalvojen pinnoittamiseksi ja pinnoitettu separaattorikalvo
CA3021686A1 (en) * 2016-05-31 2017-12-07 Edgewell Personal Care Brands, Llc Pulsed laser deposition of fluorocarbon polymers on razor blade cutting edges
WO2020206435A1 (en) * 2019-04-04 2020-10-08 Lunar Resources, Inc. Method and system for vacuum vapor deposition of functional materials in space
US12612690B1 (en) 2021-04-26 2026-04-28 Lunar Resources, Inc. Method and system for vacuum vapor deposition of functional thin film coatings onto an elongate substrate in space
GB202203879D0 (en) * 2022-03-21 2022-05-04 Rolls Royce Plc Apparatus and method for coating substrate

Family Cites Families (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4099830A (en) * 1976-12-15 1978-07-11 A. J. Bingley Limited Optical systems including polygonal mirrors rotatable about two axes
DE2918283C2 (de) * 1979-05-07 1983-04-21 Carl Baasel, Lasertechnik KG, 8000 München Gerät zur Substratbehandlung mit einem Drehspiegel od. dgl.
US4701592A (en) * 1980-11-17 1987-10-20 Rockwell International Corporation Laser assisted deposition and annealing
US4394236A (en) * 1982-02-16 1983-07-19 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
US4686128A (en) * 1985-07-01 1987-08-11 Raytheon Company Laser hardened missile casing
JPS62174370A (ja) * 1986-01-28 1987-07-31 Mitsubishi Electric Corp セラミツクスコ−テイング装置
US5411797A (en) * 1988-04-18 1995-05-02 Board Of Regents, The University Of Texas System Nanophase diamond films
US5098737A (en) * 1988-04-18 1992-03-24 Board Of Regents The University Of Texas System Amorphic diamond material produced by laser plasma deposition
JP3016806B2 (ja) * 1990-01-24 2000-03-06 株式会社リコー 微小光学素子形成方法及び形成装置
JPH05804A (ja) * 1990-08-01 1993-01-08 Sumitomo Electric Ind Ltd 大面積複合酸化物超電導薄膜の成膜装置
JP3101636B2 (ja) * 1991-11-21 2000-10-23 日本たばこ産業株式会社 帯状シートの穿孔装置
FR2696441B1 (fr) * 1992-10-02 1994-12-16 Saint Gobain Vitrage Int Désalcalinisation de feuilles de verre à faible teneur en alcalins.
JP3255469B2 (ja) * 1992-11-30 2002-02-12 三菱電機株式会社 レーザ薄膜形成装置
US5578229A (en) * 1994-10-18 1996-11-26 Michigan State University Method and apparatus for cutting boards using opposing convergent laser beams
US5683601A (en) * 1994-10-24 1997-11-04 Panasonic Technologies, Inc. Laser ablation forward metal deposition with electrostatic assisted bonding
JPH08325714A (ja) * 1995-05-26 1996-12-10 Mitsubishi Electric Corp 蒸着装置
US6063455A (en) 1995-10-09 2000-05-16 Institute For Advanced Engineering Apparatus for manufacturing diamond film having a large area and method thereof
JPH09118589A (ja) * 1995-10-26 1997-05-06 International Superconductivity Technology Center 酸化物薄膜生成法
JPH1032166A (ja) * 1996-07-16 1998-02-03 Toyota Motor Corp レーザーアブレーション法による結晶薄膜の形成方法
US5742028A (en) * 1996-07-24 1998-04-21 General Electric Company Preloaded laser shock peening
US6683783B1 (en) * 1997-03-07 2004-01-27 William Marsh Rice University Carbon fibers formed from single-wall carbon nanotubes
US5880552A (en) * 1997-05-27 1999-03-09 The United States Of America As Represented By The Secretary Of The Navy Diamond or diamond like carbon coated chemical sensors and a method of making same
AUPO912797A0 (en) * 1997-09-11 1997-10-02 Australian National University, The Ultrafast laser deposition method
US5858478A (en) * 1997-12-02 1999-01-12 The Aerospace Corporation Magnetic field pulsed laser deposition of thin films
JPH11189472A (ja) * 1997-12-25 1999-07-13 Hamamatsu Photonics Kk 窒化炭素の合成方法
JP3401425B2 (ja) * 1998-01-21 2003-04-28 理化学研究所 レーザー加工方法およびレーザー加工装置
US6159832A (en) * 1998-03-18 2000-12-12 Mayer; Frederick J. Precision laser metallization
US6198069B1 (en) * 1998-08-13 2001-03-06 The Regents Of The University Of California Laser beam temporal and spatial tailoring for laser shock processing
AU6431199A (en) * 1998-10-12 2000-05-01 Regents Of The University Of California, The Laser deposition of thin films
KR20000026066A (ko) * 1998-10-17 2000-05-06 윤종용 회전반사경 조립체 및 이를 채용한 인쇄장치
JP4480809B2 (ja) * 1999-03-30 2010-06-16 Ｈｏｙａ株式会社 酸化インジウム薄膜及びその製造方法
CN1120898C (zh) * 1999-12-08 2003-09-10 中国科学院物理研究所 一种制备具有有序表面结构的镧钙锰氧薄膜的方法
JP3531865B2 (ja) * 2000-07-06 2004-05-31 独立行政法人 科学技術振興機構 超平坦透明導電膜およびその製造方法
AUPR026100A0 (en) * 2000-09-20 2000-10-12 Tamanyan, Astghik Deposition of thin films by laser ablation
US6676811B1 (en) * 2001-08-13 2004-01-13 The United States Of America As Represented By The Secretary Of The Air Force Method of depositing nanoparticles for flux pinning into a superconducting material
US6884328B2 (en) * 2001-11-29 2005-04-26 Seagate Technology Llc Selective annealing of magnetic recording films
US6677552B1 (en) * 2001-11-30 2004-01-13 Positive Light, Inc. System and method for laser micro-machining
US20030145681A1 (en) * 2002-02-05 2003-08-07 El-Shall M. Samy Copper and/or zinc alloy nanopowders made by laser vaporization and condensation
JP2003303771A (ja) * 2002-04-11 2003-10-24 Kumamoto Technology & Industry Foundation 真空蒸着方法および装置
US6809291B1 (en) * 2002-08-30 2004-10-26 Southeastern Universities Research Assn., Inc. Process for laser machining and surface treatment
KR100565051B1 (ko) * 2002-09-16 2006-03-30 삼성전자주식회사 광주사유닛 및 이를 채용한 전자사진방식 화상형성장치
US20040250769A1 (en) * 2002-10-28 2004-12-16 Finisar Corporation Pulsed laser deposition for mass production
KR100821810B1 (ko) * 2002-11-08 2008-04-11 도꾸리쯔교세이호진 상교기쥬쯔 소고겡뀨죠 기판상의 막형성 방법
US20040175582A1 (en) * 2002-12-05 2004-09-09 Olin Corporation, A Corporation Of The Commonwealth Of Virginia Laser ablation resistant copper foil
US7397592B2 (en) * 2003-04-21 2008-07-08 Semiconductor Energy Laboratory Co., Ltd. Beam irradiation apparatus, beam irradiation method, and method for manufacturing a thin film transistor
JP4515136B2 (ja) * 2003-04-21 2010-07-28 株式会社半導体エネルギー研究所 レーザビーム照射装置、薄膜トランジスタの作製方法
US20050061779A1 (en) * 2003-08-06 2005-03-24 Walter Blumenfeld Laser ablation feedback spectroscopy
JP4141933B2 (ja) * 2003-10-10 2008-08-27 独立行政法人科学技術振興機構 微粒子捕捉用の穴状回転フィルター板を有する成膜装置及び成膜方法
US7049543B2 (en) * 2003-11-07 2006-05-23 The Regents Of The University Of California Method of defining features on materials with a femtosecond laser
CN1332062C (zh) * 2004-05-14 2007-08-15 中国科学院半导体研究所 低能氧离子束辅助脉冲激光沉积氧化物薄膜的方法
US7879410B2 (en) * 2004-06-09 2011-02-01 Imra America, Inc. Method of fabricating an electrochemical device using ultrafast pulsed laser deposition
US7527824B2 (en) * 2004-06-25 2009-05-05 Becker Michael F Methods for producing coated nanoparticles from microparticles

Also Published As

Publication number Publication date
EP1991387A2 (en) 2008-11-19
FI20060178A0 (fi) 2006-02-23
US20090302503A1 (en) 2009-12-10
CN101437644B (zh) 2012-07-04
JP2009527644A (ja) 2009-07-30
JP5203226B2 (ja) 2013-06-05
WO2007096464A3 (en) 2007-10-11
FI20060178L (fi) 2007-08-24
FI20060178A7 (fi) 2007-08-24
WO2007096464A2 (en) 2007-08-30
CN101437644A (zh) 2009-05-20

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