CN101437644B - 涂覆方法 - Google Patents

涂覆方法 Download PDF

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Publication number
CN101437644B
CN101437644B CN200780013897.XA CN200780013897A CN101437644B CN 101437644 B CN101437644 B CN 101437644B CN 200780013897 A CN200780013897 A CN 200780013897A CN 101437644 B CN101437644 B CN 101437644B
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CN
China
Prior art keywords
coated
coating
laser
target
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CN200780013897.XA
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English (en)
Chinese (zh)
Other versions
CN101437644A (zh
Inventor
J·卢图
R·拉帕莱纳恩
V·梅里马吉
L·普里
J·马吉塔罗
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Picodeon Ltd Oy
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Picodeon Ltd Oy
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Publication of CN101437644A publication Critical patent/CN101437644A/zh
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Publication of CN101437644B publication Critical patent/CN101437644B/zh
Expired - Fee Related legal-status Critical Current
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605—Carbon
    • C23C14/0611—Diamond
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/087—Oxides of copper or solid solutions thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laser Beam Processing (AREA)
CN200780013897.XA 2006-02-23 2007-02-23 涂覆方法 Expired - Fee Related CN101437644B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FI20060178A FI20060178A7 (fi) 2006-02-23 2006-02-23 Pinnoitusmenetelmä
FI20060178 2006-02-23
PCT/FI2007/000049 WO2007096464A2 (en) 2006-02-23 2007-02-23 Coating method

Publications (2)

Publication Number Publication Date
CN101437644A CN101437644A (zh) 2009-05-20
CN101437644B true CN101437644B (zh) 2012-07-04

Family

ID=35953642

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200780013897.XA Expired - Fee Related CN101437644B (zh) 2006-02-23 2007-02-23 涂覆方法

Country Status (7)

Country Link
US (1) US20090302503A1 (https=)
EP (1) EP1991387A2 (https=)
JP (1) JP5203226B2 (https=)
KR (1) KR20090004884A (https=)
CN (1) CN101437644B (https=)
FI (1) FI20060178A7 (https=)
WO (1) WO2007096464A2 (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101565099B1 (ko) 2007-02-23 2015-11-03 피코데온 리미티드 오와이 타겟의 광자 융발을 위한 방법 및 장치
DE102007043650A1 (de) 2007-09-13 2009-04-02 Siemens Ag Verfahren zur Verbesserung der Eigenschaften von Beschichtungen
KR101706517B1 (ko) * 2011-01-13 2017-02-13 타마랙 사이언티픽 컴퍼니 인코포레이티드 전도성 시드 레이어를 레이저 제거하는 방법 및 장치
FI123883B (fi) * 2011-09-16 2013-11-29 Picodeon Ltd Oy Kohtiomateriaali, pinnoite ja pinnoitettu esine
CN103031555B (zh) * 2011-10-10 2016-12-07 深圳富泰宏精密工业有限公司 壳体的制备方法及该方法所制备的壳体
DE102011122510A1 (de) * 2011-12-29 2013-07-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Beschichtung von optischen Wellenleitern
ITMI20130952A1 (it) * 2013-06-10 2014-12-11 Green Engineering S R L Componenti di un apparato di distillazione, metodo per la loro produzione e loro usi derivati
US10029421B2 (en) * 2014-09-18 2018-07-24 3Dm Digital Manufacturing Ltd Device and a method for 3D printing and manufacturing of materials using quantum cascade lasers
FI126659B (fi) * 2014-09-24 2017-03-31 Picodeon Ltd Oy Menetelmä Li-akkujen separaattorikalvojen pinnoittamiseksi ja pinnoitettu separaattorikalvo
CA3021686A1 (en) * 2016-05-31 2017-12-07 Edgewell Personal Care Brands, Llc Pulsed laser deposition of fluorocarbon polymers on razor blade cutting edges
WO2020206435A1 (en) * 2019-04-04 2020-10-08 Lunar Resources, Inc. Method and system for vacuum vapor deposition of functional materials in space
US12612690B1 (en) 2021-04-26 2026-04-28 Lunar Resources, Inc. Method and system for vacuum vapor deposition of functional thin film coatings onto an elongate substrate in space
GB202203879D0 (en) * 2022-03-21 2022-05-04 Rolls Royce Plc Apparatus and method for coating substrate

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CN1298962A (zh) * 1999-12-08 2001-06-13 中国科学院物理研究所 一种制备具有有序表面结构的镧钙锰氧薄膜的方法
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EP0931620A1 (en) * 1998-01-21 1999-07-28 The Institute Of Physical & Chemical Research Laser machining method and apparatus
CN1298962A (zh) * 1999-12-08 2001-06-13 中国科学院物理研究所 一种制备具有有序表面结构的镧钙锰氧薄膜的方法
CN1726300A (zh) * 2002-11-08 2006-01-25 独立行政法人产业技术综合研究所 衬底上薄膜的制作方法
WO2005081657A3 (en) * 2004-02-11 2007-03-01 Olin Corp Laser ablation resistant copper foil
CN1696332A (zh) * 2004-05-14 2005-11-16 中国科学院半导体研究所 低能氧离子束辅助脉冲激光沉积氧化物薄膜的方法

Also Published As

Publication number Publication date
KR20090004884A (ko) 2009-01-12
EP1991387A2 (en) 2008-11-19
FI20060178A0 (fi) 2006-02-23
US20090302503A1 (en) 2009-12-10
JP2009527644A (ja) 2009-07-30
JP5203226B2 (ja) 2013-06-05
WO2007096464A3 (en) 2007-10-11
FI20060178L (fi) 2007-08-24
FI20060178A7 (fi) 2007-08-24
WO2007096464A2 (en) 2007-08-30
CN101437644A (zh) 2009-05-20

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