KR20080028429A - 이미지 투영 시스템, 특히 마이크로리소그래피 투영 노광장치의 투영 대물렌즈 - Google Patents

이미지 투영 시스템, 특히 마이크로리소그래피 투영 노광장치의 투영 대물렌즈 Download PDF

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Publication number
KR20080028429A
KR20080028429A KR1020087001045A KR20087001045A KR20080028429A KR 20080028429 A KR20080028429 A KR 20080028429A KR 1020087001045 A KR1020087001045 A KR 1020087001045A KR 20087001045 A KR20087001045 A KR 20087001045A KR 20080028429 A KR20080028429 A KR 20080028429A
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KR
South Korea
Prior art keywords
projection system
image
refractive index
image projection
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020087001045A
Other languages
English (en)
Korean (ko)
Inventor
칼-하인쯔 슈스터
Original Assignee
칼 짜이스 에스엠테 아게
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 칼 짜이스 에스엠테 아게 filed Critical 칼 짜이스 에스엠테 아게
Publication of KR20080028429A publication Critical patent/KR20080028429A/ko
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
KR1020087001045A 2005-08-10 2006-08-04 이미지 투영 시스템, 특히 마이크로리소그래피 투영 노광장치의 투영 대물렌즈 Ceased KR20080028429A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70690305P 2005-08-10 2005-08-10
US60/706,903 2005-08-10

Publications (1)

Publication Number Publication Date
KR20080028429A true KR20080028429A (ko) 2008-03-31

Family

ID=37188852

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087001045A Ceased KR20080028429A (ko) 2005-08-10 2006-08-04 이미지 투영 시스템, 특히 마이크로리소그래피 투영 노광장치의 투영 대물렌즈

Country Status (7)

Country Link
US (1) US20080182210A1 (enExample)
EP (1) EP1913445B1 (enExample)
JP (1) JP2009505124A (enExample)
KR (1) KR20080028429A (enExample)
CN (1) CN101243359B (enExample)
AT (1) ATE511124T1 (enExample)
WO (1) WO2007017473A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008001800A1 (de) * 2007-05-25 2008-11-27 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie, Mikrolithographie-Projektionsbelichtungsanlage mit einem derartigen Projektionsobjektiv, mikrolithographisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
CN114326075B (zh) * 2021-12-10 2023-12-19 肯维捷斯（武汉）科技有限公司 一种生物样品的数字显微成像系统及镜检方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000034967A (ko) * 1998-11-30 2000-06-26 헨켈 카르스텐 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
JP2004526331A (ja) * 2001-05-15 2004-08-26 カール・ツアイス・エスエムテイ・アーゲー フッ化物結晶レンズを含む対物レンズ
JP2003021619A (ja) * 2001-07-05 2003-01-24 Canon Inc 蛍石及びその分析法、製造法、光学特性評価法
JPWO2003009015A1 (ja) * 2001-07-18 2004-11-11 株式会社ニコン フッ化ランタン膜を備えた光学素子
US7092069B2 (en) * 2002-03-08 2006-08-15 Carl Zeiss Smt Ag Projection exposure method and projection exposure system
JP2005537512A (ja) * 2002-09-03 2005-12-08 カール・ツアイス・エスエムテイ・アーゲー 複屈折レンズを伴う対物レンズ
KR101211451B1 (ko) * 2003-07-09 2012-12-12 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
EP1697798A2 (en) 2003-12-15 2006-09-06 Carl Zeiss SMT AG Projection objective having a high aperture and a planar end surface
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
WO2005059645A2 (en) * 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
JP2006113533A (ja) * 2004-08-03 2006-04-27 Nikon Corp 投影光学系、露光装置、および露光方法

Also Published As

Publication number Publication date
CN101243359B (zh) 2011-04-06
EP1913445A1 (de) 2008-04-23
EP1913445B1 (de) 2011-05-25
JP2009505124A (ja) 2009-02-05
US20080182210A1 (en) 2008-07-31
WO2007017473A1 (de) 2007-02-15
CN101243359A (zh) 2008-08-13
ATE511124T1 (de) 2011-06-15

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