JP2009505124A - 像投影システム、特に、マイクロリソグラフィ投影露光装置の投影対物レンズ - Google Patents

像投影システム、特に、マイクロリソグラフィ投影露光装置の投影対物レンズ Download PDF

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Publication number
JP2009505124A
JP2009505124A JP2008525556A JP2008525556A JP2009505124A JP 2009505124 A JP2009505124 A JP 2009505124A JP 2008525556 A JP2008525556 A JP 2008525556A JP 2008525556 A JP2008525556 A JP 2008525556A JP 2009505124 A JP2009505124 A JP 2009505124A
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Japan
Prior art keywords
projection system
image projection
image
refractive index
exposure apparatus
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JP2008525556A
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English (en)
Japanese (ja)
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JP2009505124A5 (enExample
Inventor
シュスター，カール・ハインツ
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カール・ツァイス・エスエムティー・アーゲー
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Publication of JP2009505124A publication Critical patent/JP2009505124A/ja
Publication of JP2009505124A5 publication Critical patent/JP2009505124A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
JP2008525556A 2005-08-10 2006-08-04 像投影システム、特に、マイクロリソグラフィ投影露光装置の投影対物レンズ Pending JP2009505124A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70690305P 2005-08-10 2005-08-10
PCT/EP2006/065070 WO2007017473A1 (de) 2005-08-10 2006-08-04 Abbildungssystem, insbesondere projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage

Publications (2)

Publication Number Publication Date
JP2009505124A true JP2009505124A (ja) 2009-02-05
JP2009505124A5 JP2009505124A5 (enExample) 2009-07-16

Family

ID=37188852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008525556A Pending JP2009505124A (ja) 2005-08-10 2006-08-04 像投影システム、特に、マイクロリソグラフィ投影露光装置の投影対物レンズ

Country Status (7)

Country Link
US (1) US20080182210A1 (enExample)
EP (1) EP1913445B1 (enExample)
JP (1) JP2009505124A (enExample)
KR (1) KR20080028429A (enExample)
CN (1) CN101243359B (enExample)
AT (1) ATE511124T1 (enExample)
WO (1) WO2007017473A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008001800A1 (de) * 2007-05-25 2008-11-27 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie, Mikrolithographie-Projektionsbelichtungsanlage mit einem derartigen Projektionsobjektiv, mikrolithographisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
CN114326075B (zh) * 2021-12-10 2023-12-19 肯维捷斯（武汉）科技有限公司 一种生物样品的数字显微成像系统及镜检方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000235146A (ja) * 1998-11-30 2000-08-29 Carl Zeiss:Fa マイクロリソグラフィーの結晶レンズと投影形露光装置とを具備した対物レンズ
WO2003009015A1 (en) * 2001-07-18 2003-01-30 Nikon Corporation Optical element having lanthanum fluoride film
WO2005059645A2 (en) * 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
WO2005059617A2 (en) * 2003-12-15 2005-06-30 Carl Zeiss Smt Ag Projection objective having a high aperture and a planar end surface
JP2006113533A (ja) * 2004-08-03 2006-04-27 Nikon Corp 投影光学系、露光装置、および露光方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
WO2002093209A2 (de) * 2001-05-15 2002-11-21 Carl Zeiss Objektiv mit fluorid-kristall-linsen
JP2003021619A (ja) * 2001-07-05 2003-01-24 Canon Inc 蛍石及びその分析法、製造法、光学特性評価法
US7092069B2 (en) * 2002-03-08 2006-08-15 Carl Zeiss Smt Ag Projection exposure method and projection exposure system
AU2002364974A1 (en) * 2002-09-03 2004-03-29 Carl Zeiss Smt Ag Objective with birefringent lenses
JP4835155B2 (ja) * 2003-07-09 2011-12-14 株式会社ニコン 露光装置及びデバイス製造方法
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000235146A (ja) * 1998-11-30 2000-08-29 Carl Zeiss:Fa マイクロリソグラフィーの結晶レンズと投影形露光装置とを具備した対物レンズ
WO2003009015A1 (en) * 2001-07-18 2003-01-30 Nikon Corporation Optical element having lanthanum fluoride film
WO2005059617A2 (en) * 2003-12-15 2005-06-30 Carl Zeiss Smt Ag Projection objective having a high aperture and a planar end surface
WO2005059645A2 (en) * 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
JP2006113533A (ja) * 2004-08-03 2006-04-27 Nikon Corp 投影光学系、露光装置、および露光方法

Also Published As

Publication number Publication date
US20080182210A1 (en) 2008-07-31
ATE511124T1 (de) 2011-06-15
WO2007017473A1 (de) 2007-02-15
EP1913445A1 (de) 2008-04-23
KR20080028429A (ko) 2008-03-31
EP1913445B1 (de) 2011-05-25
CN101243359A (zh) 2008-08-13
CN101243359B (zh) 2011-04-06

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