CN101243359B - 成像系统、特别是显微光刻投影曝光设备的投影物镜 - Google Patents

成像系统、特别是显微光刻投影曝光设备的投影物镜 Download PDF

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Publication number
CN101243359B
CN101243359B CN2006800296095A CN200680029609A CN101243359B CN 101243359 B CN101243359 B CN 101243359B CN 2006800296095 A CN2006800296095 A CN 2006800296095A CN 200680029609 A CN200680029609 A CN 200680029609A CN 101243359 B CN101243359 B CN 101243359B
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CN
China
Prior art keywords
imaging system
refractive index
sub
numerical aperture
crystal
Prior art date
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Expired - Fee Related
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CN2006800296095A
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English (en)
Chinese (zh)
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CN101243359A (zh
Inventor
K·-H·舒斯特
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Publication of CN101243359A publication Critical patent/CN101243359A/zh
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Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
CN2006800296095A 2005-08-10 2006-08-04 成像系统、特别是显微光刻投影曝光设备的投影物镜 Expired - Fee Related CN101243359B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US70690305P 2005-08-10 2005-08-10
US60/706,903 2005-08-10
PCT/EP2006/065070 WO2007017473A1 (de) 2005-08-10 2006-08-04 Abbildungssystem, insbesondere projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage

Publications (2)

Publication Number Publication Date
CN101243359A CN101243359A (zh) 2008-08-13
CN101243359B true CN101243359B (zh) 2011-04-06

Family

ID=37188852

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2006800296095A Expired - Fee Related CN101243359B (zh) 2005-08-10 2006-08-04 成像系统、特别是显微光刻投影曝光设备的投影物镜

Country Status (7)

Country Link
US (1) US20080182210A1 (enExample)
EP (1) EP1913445B1 (enExample)
JP (1) JP2009505124A (enExample)
KR (1) KR20080028429A (enExample)
CN (1) CN101243359B (enExample)
AT (1) ATE511124T1 (enExample)
WO (1) WO2007017473A1 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008001800A1 (de) * 2007-05-25 2008-11-27 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie, Mikrolithographie-Projektionsbelichtungsanlage mit einem derartigen Projektionsobjektiv, mikrolithographisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
CN114326075B (zh) * 2021-12-10 2023-12-19 肯维捷斯（武汉）科技有限公司 一种生物样品的数字显微成像系统及镜检方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20000034967A (ko) * 1998-11-30 2000-06-26 헨켈 카르스텐 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
US6995930B2 (en) * 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
JP2004526331A (ja) * 2001-05-15 2004-08-26 カール・ツアイス・エスエムテイ・アーゲー フッ化物結晶レンズを含む対物レンズ
JP2003021619A (ja) * 2001-07-05 2003-01-24 Canon Inc 蛍石及びその分析法、製造法、光学特性評価法
JPWO2003009015A1 (ja) * 2001-07-18 2004-11-11 株式会社ニコン フッ化ランタン膜を備えた光学素子
US7092069B2 (en) * 2002-03-08 2006-08-15 Carl Zeiss Smt Ag Projection exposure method and projection exposure system
JP2005537512A (ja) * 2002-09-03 2005-12-08 カール・ツアイス・エスエムテイ・アーゲー 複屈折レンズを伴う対物レンズ
KR101211451B1 (ko) * 2003-07-09 2012-12-12 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
EP1697798A2 (en) 2003-12-15 2006-09-06 Carl Zeiss SMT AG Projection objective having a high aperture and a planar end surface
US7466489B2 (en) * 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
WO2005059645A2 (en) * 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
JP2006113533A (ja) * 2004-08-03 2006-04-27 Nikon Corp 投影光学系、露光装置、および露光方法

Also Published As

Publication number Publication date
KR20080028429A (ko) 2008-03-31
EP1913445A1 (de) 2008-04-23
EP1913445B1 (de) 2011-05-25
JP2009505124A (ja) 2009-02-05
US20080182210A1 (en) 2008-07-31
WO2007017473A1 (de) 2007-02-15
CN101243359A (zh) 2008-08-13
ATE511124T1 (de) 2011-06-15

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Granted publication date: 20110406

Termination date: 20180804