KR20070106683A - 가요성 나노-임프린팅 스탬프 - Google Patents

가요성 나노-임프린팅 스탬프 Download PDF

Info

Publication number
KR20070106683A
KR20070106683A KR1020077008103A KR20077008103A KR20070106683A KR 20070106683 A KR20070106683 A KR 20070106683A KR 1020077008103 A KR1020077008103 A KR 1020077008103A KR 20077008103 A KR20077008103 A KR 20077008103A KR 20070106683 A KR20070106683 A KR 20070106683A
Authority
KR
South Korea
Prior art keywords
imprinting
stamp
nano
sections
imprinting stamp
Prior art date
Application number
KR1020077008103A
Other languages
English (en)
Korean (ko)
Inventor
테어도어 닐센
안데어스 크리스텐센
올레 한센
Original Assignee
닐 테크놀로지 에이피에스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 닐 테크놀로지 에이피에스 filed Critical 닐 테크놀로지 에이피에스
Publication of KR20070106683A publication Critical patent/KR20070106683A/ko

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
    • B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/887—Nanoimprint lithography, i.e. nanostamp

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Electroluminescent Light Sources (AREA)
  • Printing Methods (AREA)
KR1020077008103A 2004-09-08 2005-09-07 가요성 나노-임프린팅 스탬프 KR20070106683A (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DKPA200401354 2004-09-08
DKPA200401354 2004-09-08
US61252004P 2004-09-24 2004-09-24
US60/612,520 2004-09-24

Publications (1)

Publication Number Publication Date
KR20070106683A true KR20070106683A (ko) 2007-11-05

Family

ID=39062428

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077008103A KR20070106683A (ko) 2004-09-08 2005-09-07 가요성 나노-임프린팅 스탬프

Country Status (6)

Country Link
KR (1) KR20070106683A (pt)
AT (1) ATE472749T1 (pt)
BR (1) BRPI0515058A (pt)
DE (1) DE602005022084D1 (pt)
IL (1) IL181718A (pt)
RU (1) RU2365960C2 (pt)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150073645A (ko) * 2013-12-23 2015-07-01 (재)한국나노기술원 비대칭형 금속 또는 금속산화물 나노구조체의 형성방법
KR20150141915A (ko) * 2015-11-20 2015-12-21 (재)한국나노기술원 가변형 임프린트용 스탬프를 이용한 비대칭형 금속 또는 금속산화물 나노구조체

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2476917C1 (ru) * 2011-08-12 2013-02-27 Открытое акционерное общество "НИИ молекулярной электроники и завод "Микрон" Способ изготовления штампа для наноимпринт литографии
TWI665078B (zh) * 2013-07-22 2019-07-11 皇家飛利浦有限公司 製造圖案化印模以圖案化輪廓表面之方法、供在壓印微影製程中使用之圖案化印模、壓印微影方法、包括圖案化輪廓表面之物件及圖案化印模用於壓印微影之用法
WO2016045961A1 (en) * 2014-09-22 2016-03-31 Koninklijke Philips N.V. Transfer method and apparatus and computer program product
CN109313386B (zh) * 2016-04-06 2022-06-28 皇家飞利浦有限公司 压印光刻印模的制作和使用方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150073645A (ko) * 2013-12-23 2015-07-01 (재)한국나노기술원 비대칭형 금속 또는 금속산화물 나노구조체의 형성방법
KR20150141915A (ko) * 2015-11-20 2015-12-21 (재)한국나노기술원 가변형 임프린트용 스탬프를 이용한 비대칭형 금속 또는 금속산화물 나노구조체

Also Published As

Publication number Publication date
DE602005022084D1 (de) 2010-08-12
IL181718A0 (en) 2007-07-04
RU2007112511A (ru) 2008-10-20
BRPI0515058A (pt) 2008-07-01
IL181718A (en) 2011-09-27
RU2365960C2 (ru) 2009-08-27
ATE472749T1 (de) 2010-07-15

Similar Documents

Publication Publication Date Title
US8075298B2 (en) Flexible nano-imprint stamp
US6964793B2 (en) Method for fabricating nanoscale patterns in light curable compositions using an electric field
TWI396621B (zh) 用於半導體元件之乾式轉印之補強複合模板
JP4533358B2 (ja) インプリント方法、インプリント装置およびチップの製造方法
US8377361B2 (en) Imprint lithography with improved substrate/mold separation
KR100806231B1 (ko) 가공장치, 가공방법 및 칩의 제조방법
KR20070106683A (ko) 가요성 나노-임프린팅 스탬프
KR20060034694A (ko) 임프린트 리소그래피 공정을 위한 확대 및 뒤틀림 보정용시스템
KR20080059547A (ko) 콘택트 리쏘그래피 장치, 시스템 및 방법
JP2010507230A (ja) コンタクトリソグラフィ装置、システム及び方法
US10018909B2 (en) Imprint apparatus and method of manufacturing article
CN102508410A (zh) 一种三明治结构复合纳米压印模板及其制备方法
EP1512048B1 (en) Method for fabricating nanoscale patterns in light curable compositions using an electric field
CN101114120A (zh) 压模、制造该压模的方法及利用该压模的基底的压印工艺
KR100934239B1 (ko) 임프린트용 대면적 스탬프 제작방법
KR100504080B1 (ko) 선택적 부가압력을 이용한 ｕｖ 나노임프린트 리소그래피공정
KR100544603B1 (ko) 임프린팅 기판지지장치 및 임프린팅 장치
KR20090095107A (ko) 진동부가를 통한 패턴제작방법
Jakeway et al. Transition of MEMS technology to nanofabrication
Pelzer et al. Nanoimprint lithography: full wafer replication of nanometer features
KR101551772B1 (ko) Scil 공정용 레플리카 스탬프 및 이의 제조방법
TW202206253A (zh) 製造微結構及/或奈米結構之方法及裝置
TW567133B (en) Method for micro hot embossing by pressurized gas
Pelzer et al. Plasma Activated Bonding and Imprinting of Polymer by Hot Embossing for Packaging Applications
KR20050025545A (ko) 전기장을 사용하여 광 중합 화합물내에 나노스케일의패턴을 생성하기 위한 방법 및 시스템

Legal Events

Date Code Title Description
A201 Request for examination
E601 Decision to refuse application