DE602005022084D1 - Flexibler nano-druckstempel - Google Patents

Flexibler nano-druckstempel

Info

Publication number
DE602005022084D1
DE602005022084D1 DE602005022084T DE602005022084T DE602005022084D1 DE 602005022084 D1 DE602005022084 D1 DE 602005022084D1 DE 602005022084 T DE602005022084 T DE 602005022084T DE 602005022084 T DE602005022084 T DE 602005022084T DE 602005022084 D1 DE602005022084 D1 DE 602005022084D1
Authority
DE
Germany
Prior art keywords
imprinting
stamp
sections
imperfections
printing stamp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005022084T
Other languages
German (de)
English (en)
Inventor
Theodor Nielsen
Anders Kristensen
Ole Hansen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nil Tech APS
Original Assignee
Nil Tech APS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nil Tech APS filed Critical Nil Tech APS
Priority claimed from PCT/DK2005/000570 external-priority patent/WO2006026993A1/en
Publication of DE602005022084D1 publication Critical patent/DE602005022084D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00444Surface micromachining, i.e. structuring layers on the substrate
    • B81C1/0046Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/84Manufacture, treatment, or detection of nanostructure
    • Y10S977/887Nanoimprint lithography, i.e. nanostamp

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Electroluminescent Light Sources (AREA)
  • Printing Methods (AREA)
DE602005022084T 2004-09-08 2005-09-07 Flexibler nano-druckstempel Active DE602005022084D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DKPA200401354 2004-09-08
US61252004P 2004-09-24 2004-09-24
PCT/DK2005/000570 WO2006026993A1 (en) 2004-09-08 2005-09-07 A flexible nano-imprint stamp

Publications (1)

Publication Number Publication Date
DE602005022084D1 true DE602005022084D1 (de) 2010-08-12

Family

ID=39062428

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005022084T Active DE602005022084D1 (de) 2004-09-08 2005-09-07 Flexibler nano-druckstempel

Country Status (6)

Country Link
KR (1) KR20070106683A (pt)
AT (1) ATE472749T1 (pt)
BR (1) BRPI0515058A (pt)
DE (1) DE602005022084D1 (pt)
IL (1) IL181718A (pt)
RU (1) RU2365960C2 (pt)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2476917C1 (ru) * 2011-08-12 2013-02-27 Открытое акционерное общество "НИИ молекулярной электроники и завод "Микрон" Способ изготовления штампа для наноимпринт литографии
TWI665078B (zh) * 2013-07-22 2019-07-11 皇家飛利浦有限公司 製造圖案化印模以圖案化輪廓表面之方法、供在壓印微影製程中使用之圖案化印模、壓印微影方法、包括圖案化輪廓表面之物件及圖案化印模用於壓印微影之用法
KR101581437B1 (ko) * 2013-12-23 2015-12-30 (재)한국나노기술원 비대칭형 금속 또는 금속산화물 나노구조체의 형성방법
WO2016045961A1 (en) * 2014-09-22 2016-03-31 Koninklijke Philips N.V. Transfer method and apparatus and computer program product
KR101663629B1 (ko) * 2015-11-20 2016-10-10 (재)한국나노기술원 가변형 임프린트용 스탬프를 이용한 비대칭형 금속 또는 금속산화물 나노구조체
CN109313386B (zh) * 2016-04-06 2022-06-28 皇家飞利浦有限公司 压印光刻印模的制作和使用方法

Also Published As

Publication number Publication date
IL181718A0 (en) 2007-07-04
RU2007112511A (ru) 2008-10-20
BRPI0515058A (pt) 2008-07-01
IL181718A (en) 2011-09-27
RU2365960C2 (ru) 2009-08-27
KR20070106683A (ko) 2007-11-05
ATE472749T1 (de) 2010-07-15

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