KR20060066658A - 얼룩 결함 검사 방법과 시스템, 및 포토 마스크의 제조방법 - Google Patents

얼룩 결함 검사 방법과 시스템, 및 포토 마스크의 제조방법 Download PDF

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Publication number
KR20060066658A
KR20060066658A KR1020050122423A KR20050122423A KR20060066658A KR 20060066658 A KR20060066658 A KR 20060066658A KR 1020050122423 A KR1020050122423 A KR 1020050122423A KR 20050122423 A KR20050122423 A KR 20050122423A KR 20060066658 A KR20060066658 A KR 20060066658A
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KR
South Korea
Prior art keywords
pattern
inspection
defect inspection
photomask
spot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020050122423A
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English (en)
Korean (ko)
Inventor
테루아키 요시다
Original Assignee
호야 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 호야 가부시키가이샤 filed Critical 호야 가부시키가이샤
Publication of KR20060066658A publication Critical patent/KR20060066658A/ko
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020050122423A 2004-12-13 2005-12-13 얼룩 결함 검사 방법과 시스템, 및 포토 마스크의 제조방법 Ceased KR20060066658A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004360196A JP4583155B2 (ja) 2004-12-13 2004-12-13 欠陥検査方法及びシステム、並びにフォトマスクの製造方法
JPJP-P-2004-00360196 2004-12-13

Publications (1)

Publication Number Publication Date
KR20060066658A true KR20060066658A (ko) 2006-06-16

Family

ID=36671596

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050122423A Ceased KR20060066658A (ko) 2004-12-13 2005-12-13 얼룩 결함 검사 방법과 시스템, 및 포토 마스크의 제조방법

Country Status (5)

Country Link
US (1) US20060158643A1 (enExample)
JP (1) JP4583155B2 (enExample)
KR (1) KR20060066658A (enExample)
CN (1) CN1983023A (enExample)
TW (1) TWI270660B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160146827A (ko) * 2014-04-23 2016-12-21 하마마츠 포토닉스 가부시키가이샤 화상 취득 장치 및 화상 취득 방법

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080002874A1 (en) * 2006-06-29 2008-01-03 Peter Fiekowsky Distinguishing reference image errors in optical inspections
JP4946306B2 (ja) * 2006-09-22 2012-06-06 凸版印刷株式会社 欠陥検査装置における照明角度設定方法
KR101702887B1 (ko) 2007-04-18 2017-02-06 마이크로닉 마이데이타 에이비 무라 검출 및 계측을 위한 방법 및 장치
SG149763A1 (en) * 2007-07-12 2009-02-27 Applied Materials Israel Ltd Method and system for evaluating an object that has a repetitive pattern
US20090199152A1 (en) * 2008-02-06 2009-08-06 Micronic Laser Systems Ab Methods and apparatuses for reducing mura effects in generated patterns
CN101655614B (zh) * 2008-08-19 2011-04-13 京东方科技集团股份有限公司 液晶显示面板云纹缺陷的检测方法和检测装置
DE102008060293B4 (de) * 2008-12-03 2015-07-30 Carl Zeiss Sms Gmbh Verfahren und Vorrichtung zur Messung des relativen lokalen Lagefehlers eines der Abschnitte eines abschnittsweise belichteten Objektes
JP5895350B2 (ja) * 2011-03-16 2016-03-30 凸版印刷株式会社 むら検査装置及びむら検査方法
CN102679931B (zh) * 2012-05-10 2015-05-06 上海大学 原位测量疲劳裂纹扩展长度的新方法
EP2972589B1 (en) 2013-03-12 2017-05-03 Micronic Mydata AB Mechanically produced alignment fiducial method and alignment system
WO2014140047A2 (en) 2013-03-12 2014-09-18 Micronic Mydata AB Method and device for writing photomasks with reduced mura errors
CN104914133B (zh) * 2015-06-19 2017-12-22 合肥京东方光电科技有限公司 摩擦缺陷检测装置
US10890540B2 (en) 2017-03-21 2021-01-12 Asml Netherlands B.V. Object identification and comparison
US10755133B2 (en) * 2018-02-22 2020-08-25 Samsung Display Co., Ltd. System and method for line Mura detection with preprocessing
CN110723478A (zh) * 2019-09-27 2020-01-24 苏州精濑光电有限公司 一种显示面板检修装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04345163A (ja) * 1991-05-23 1992-12-01 Nikon Corp フォトマスクの欠陥検査装置
US5764209A (en) * 1992-03-16 1998-06-09 Photon Dynamics, Inc. Flat panel display inspection system
JP3343444B2 (ja) * 1994-07-14 2002-11-11 株式会社アドバンテスト Ｌｃｄパネル画質検査装置及びｌｃｄ画像プリサンプリング方法
US6154561A (en) * 1997-04-07 2000-11-28 Photon Dynamics, Inc. Method and apparatus for detecting Mura defects
JPH10325805A (ja) * 1997-05-23 1998-12-08 Nikon Corp 半導体ウエハの自動検査装置
US6621571B1 (en) * 1999-10-29 2003-09-16 Hitachi, Ltd. Method and apparatus for inspecting defects in a patterned specimen
US6797975B2 (en) * 2000-09-21 2004-09-28 Hitachi, Ltd. Method and its apparatus for inspecting particles or defects of a semiconductor device
JP4126189B2 (ja) * 2002-04-10 2008-07-30 株式会社日立ハイテクノロジーズ 検査条件設定プログラム、検査装置および検査システム
JP3668215B2 (ja) * 2002-08-21 2005-07-06 株式会社東芝 パターン検査装置
JP2005291874A (ja) * 2004-03-31 2005-10-20 Hoya Corp パターンのムラ欠陥検査方法及び装置
JP4480002B2 (ja) * 2004-05-28 2010-06-16 Ｈｏｙａ株式会社 ムラ欠陥検査方法及び装置、並びにフォトマスクの製造方法
JP4480001B2 (ja) * 2004-05-28 2010-06-16 Ｈｏｙａ株式会社 ムラ欠陥検査マスク、ムラ欠陥検査装置及び方法、並びにフォトマスクの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160146827A (ko) * 2014-04-23 2016-12-21 하마마츠 포토닉스 가부시키가이샤 화상 취득 장치 및 화상 취득 방법

Also Published As

Publication number Publication date
US20060158643A1 (en) 2006-07-20
TW200628758A (en) 2006-08-16
TWI270660B (en) 2007-01-11
JP4583155B2 (ja) 2010-11-17
CN1983023A (zh) 2007-06-20
JP2006170664A (ja) 2006-06-29

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