TWI270660B - Method and system of inspecting MURA-DEFECT and method of fabricating photomask - Google Patents
Method and system of inspecting MURA-DEFECT and method of fabricating photomask Download PDFInfo
- Publication number
- TWI270660B TWI270660B TW094143904A TW94143904A TWI270660B TW I270660 B TWI270660 B TW I270660B TW 094143904 A TW094143904 A TW 094143904A TW 94143904 A TW94143904 A TW 94143904A TW I270660 B TWI270660 B TW I270660B
- Authority
- TW
- Taiwan
- Prior art keywords
- inspection
- pattern
- moiré
- image
- light
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 17
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 238000007689 inspection Methods 0.000 claims abstract description 129
- 239000013589 supplement Substances 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 11
- 239000010408 film Substances 0.000 description 12
- 238000001514 detection method Methods 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 230000003252 repetitive effect Effects 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000011179 visual inspection Methods 0.000 description 2
- 239000002023 wood Substances 0.000 description 2
- 238000001467 acupuncture Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N2021/95676—Masks, reticles, shadow masks
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Pathology (AREA)
- Analytical Chemistry (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004360196A JP4583155B2 (ja) | 2004-12-13 | 2004-12-13 | 欠陥検査方法及びシステム、並びにフォトマスクの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200628758A TW200628758A (en) | 2006-08-16 |
| TWI270660B true TWI270660B (en) | 2007-01-11 |
Family
ID=36671596
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094143904A TWI270660B (en) | 2004-12-13 | 2005-12-12 | Method and system of inspecting MURA-DEFECT and method of fabricating photomask |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20060158643A1 (enExample) |
| JP (1) | JP4583155B2 (enExample) |
| KR (1) | KR20060066658A (enExample) |
| CN (1) | CN1983023A (enExample) |
| TW (1) | TWI270660B (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080002874A1 (en) * | 2006-06-29 | 2008-01-03 | Peter Fiekowsky | Distinguishing reference image errors in optical inspections |
| JP4946306B2 (ja) * | 2006-09-22 | 2012-06-06 | 凸版印刷株式会社 | 欠陥検査装置における照明角度設定方法 |
| KR101702887B1 (ko) | 2007-04-18 | 2017-02-06 | 마이크로닉 마이데이타 에이비 | 무라 검출 및 계측을 위한 방법 및 장치 |
| SG149763A1 (en) * | 2007-07-12 | 2009-02-27 | Applied Materials Israel Ltd | Method and system for evaluating an object that has a repetitive pattern |
| US20090199152A1 (en) * | 2008-02-06 | 2009-08-06 | Micronic Laser Systems Ab | Methods and apparatuses for reducing mura effects in generated patterns |
| CN101655614B (zh) * | 2008-08-19 | 2011-04-13 | 京东方科技集团股份有限公司 | 液晶显示面板云纹缺陷的检测方法和检测装置 |
| DE102008060293B4 (de) * | 2008-12-03 | 2015-07-30 | Carl Zeiss Sms Gmbh | Verfahren und Vorrichtung zur Messung des relativen lokalen Lagefehlers eines der Abschnitte eines abschnittsweise belichteten Objektes |
| JP5895350B2 (ja) * | 2011-03-16 | 2016-03-30 | 凸版印刷株式会社 | むら検査装置及びむら検査方法 |
| CN102679931B (zh) * | 2012-05-10 | 2015-05-06 | 上海大学 | 原位测量疲劳裂纹扩展长度的新方法 |
| EP2972589B1 (en) | 2013-03-12 | 2017-05-03 | Micronic Mydata AB | Mechanically produced alignment fiducial method and alignment system |
| WO2014140047A2 (en) | 2013-03-12 | 2014-09-18 | Micronic Mydata AB | Method and device for writing photomasks with reduced mura errors |
| JP6442154B2 (ja) * | 2014-04-23 | 2018-12-19 | 浜松ホトニクス株式会社 | 画像取得装置及び画像取得方法 |
| CN104914133B (zh) * | 2015-06-19 | 2017-12-22 | 合肥京东方光电科技有限公司 | 摩擦缺陷检测装置 |
| US10890540B2 (en) | 2017-03-21 | 2021-01-12 | Asml Netherlands B.V. | Object identification and comparison |
| US10755133B2 (en) * | 2018-02-22 | 2020-08-25 | Samsung Display Co., Ltd. | System and method for line Mura detection with preprocessing |
| CN110723478A (zh) * | 2019-09-27 | 2020-01-24 | 苏州精濑光电有限公司 | 一种显示面板检修装置 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04345163A (ja) * | 1991-05-23 | 1992-12-01 | Nikon Corp | フォトマスクの欠陥検査装置 |
| US5764209A (en) * | 1992-03-16 | 1998-06-09 | Photon Dynamics, Inc. | Flat panel display inspection system |
| JP3343444B2 (ja) * | 1994-07-14 | 2002-11-11 | 株式会社アドバンテスト | Ｌｃｄパネル画質検査装置及びｌｃｄ画像プリサンプリング方法 |
| US6154561A (en) * | 1997-04-07 | 2000-11-28 | Photon Dynamics, Inc. | Method and apparatus for detecting Mura defects |
| JPH10325805A (ja) * | 1997-05-23 | 1998-12-08 | Nikon Corp | 半導体ウエハの自動検査装置 |
| US6621571B1 (en) * | 1999-10-29 | 2003-09-16 | Hitachi, Ltd. | Method and apparatus for inspecting defects in a patterned specimen |
| US6797975B2 (en) * | 2000-09-21 | 2004-09-28 | Hitachi, Ltd. | Method and its apparatus for inspecting particles or defects of a semiconductor device |
| JP4126189B2 (ja) * | 2002-04-10 | 2008-07-30 | 株式会社日立ハイテクノロジーズ | 検査条件設定プログラム、検査装置および検査システム |
| JP3668215B2 (ja) * | 2002-08-21 | 2005-07-06 | 株式会社東芝 | パターン検査装置 |
| JP2005291874A (ja) * | 2004-03-31 | 2005-10-20 | Hoya Corp | パターンのムラ欠陥検査方法及び装置 |
| JP4480002B2 (ja) * | 2004-05-28 | 2010-06-16 | Ｈｏｙａ株式会社 | ムラ欠陥検査方法及び装置、並びにフォトマスクの製造方法 |
| JP4480001B2 (ja) * | 2004-05-28 | 2010-06-16 | Ｈｏｙａ株式会社 | ムラ欠陥検査マスク、ムラ欠陥検査装置及び方法、並びにフォトマスクの製造方法 |
-
2004
- 2004-12-13 JP JP2004360196A patent/JP4583155B2/ja not_active Expired - Fee Related
-
2005
- 2005-12-12 TW TW094143904A patent/TWI270660B/zh not_active IP Right Cessation
- 2005-12-13 US US11/299,832 patent/US20060158643A1/en not_active Abandoned
- 2005-12-13 CN CNA2005101346578A patent/CN1983023A/zh active Pending
- 2005-12-13 KR KR1020050122423A patent/KR20060066658A/ko not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| KR20060066658A (ko) | 2006-06-16 |
| US20060158643A1 (en) | 2006-07-20 |
| TW200628758A (en) | 2006-08-16 |
| JP4583155B2 (ja) | 2010-11-17 |
| CN1983023A (zh) | 2007-06-20 |
| JP2006170664A (ja) | 2006-06-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI270660B (en) | Method and system of inspecting MURA-DEFECT and method of fabricating photomask | |
| CN100557424C (zh) | 图像检查方法及装置 | |
| US7911599B2 (en) | Reticle defect inspection apparatus and reticle defect inspection method | |
| CN102621160B (zh) | 平板玻璃异物检测装置及检测方法 | |
| JP5553716B2 (ja) | 欠陥検査方法及びその装置 | |
| TWI266861B (en) | Apparatus and method of inspecting mura-defect and method of fabricating photomask | |
| TWI480542B (zh) | A defect detection method and apparatus therefor, and a defect observation method and apparatus therefor | |
| EP2198279B1 (en) | Apparatus and method for detecting semiconductor substrate anomalies | |
| TW200804797A (en) | Pattern defect inspection method, photomask manufacturing method, and display device substrate manufacturing method | |
| TW200423279A (en) | Defect inspection apparatus, defect inspection method and inspection method of window pattern | |
| TWI477766B (zh) | 檢測裝置以及檢測方法 | |
| JP2013083672A (ja) | 観察装置、検査装置および検査方法 | |
| TW201033606A (en) | Pattern inspection method, pattern inspection device, photomask manufacturing method, and pattern transfer method | |
| CN102203589A (zh) | 评估装置及评估方法 | |
| JP2006003364A (ja) | ウエハ検査方法及びシステム | |
| KR101237583B1 (ko) | 촬영 화상에 기초한 검사 방법 및 검사 장치 | |
| KR101320183B1 (ko) | 패턴 결함 검사 방법, 패턴 결함 검사 장치, 포토마스크의 제조 방법, 및 표시 디바이스용 기판의 제조 방법 | |
| JP2006170664A5 (enExample) | ||
| JP2013539866A (ja) | 焦点補正値汚染検査 | |
| TWI276794B (en) | Method of inspecting unevenness defect of pattern and device thereof | |
| JP3332096B2 (ja) | 欠陥検査方法および装置 | |
| JP2001124538A (ja) | 物体表面の欠陥検査方法および欠陥検査装置 | |
| JP2004240523A (ja) | パターン観察装置およびマスク検査装置 | |
| JP4427980B2 (ja) | マーク位置検出方法 | |
| JP4518704B2 (ja) | 位相シフトマスク検査装置及び位相シフトマスク検査方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |